METHOD AND APPARATUS FOR MANUFACTURING A MAGNETIC SENSOR DEVICE, AND CORRESPONDING MAGNETIC SENSOR DEVICE
20170328963 · 2017-11-16
Inventors
- Jochen Schmitt (Biedenkopf, DE)
- Johannes Paul (Mainz, DE)
- Ronald LEHNDORFF (Mainz, DE)
- Jürgen Wahrhusen (Nieder-Hilbersheim, DE)
- Claudia Glenske (Leun, DE)
Cpc classification
H10B61/00
ELECTRICITY
H10N59/00
ELECTRICITY
G01R33/098
PHYSICS
G01R33/093
PHYSICS
International classification
Abstract
A method and an apparatus are for the permanent magnetisation of at least one ferromagnetic layer in a magnetic field sensor device deposited on a chip substrate. The method includes production of at least one resistance element on a chip substrate, deposition of at least one soft magnetic structuring element on the chip substrate; heating of the resistance element to above the blocking temperature and coupling of a preconditioning magnetic field; cooling of the resistance element to below the blocking temperature; and removal of the preconditioning magnetic field. The soft magnetic structuring element is arranged such that the coupled preconditioning magnetic field penetrates the structuring element substantially perpendicular to the chip surface and, at the location of the resistance element, generates magnetic field components parallel to the chip surface which penetrate the ferromagnetic layer of the resistance element at least in some areas.
Claims
1. Method for permanent magnetisation of at least one ferromagnetic layer in a magnetic field sensor device deposited on a chip substrate comprising the following steps: producing a magnetoresistive resistance element on a chip substrate which comprises at least one ferromagnetic layer and at least one antiferromagnetic layer, wherein an exchange coupling, which disappears on reaching a blocking temperature, acts between the at least one ferromagnetic layer and the at least one antiferromagnetic layer; depositing at least one soft magnetic structuring element on the chip substrate adjacent to or partially overlapping the resistance element; heating the resistance element to above the blocking temperature of the material of the antiferromagnetic layer and coupling of a preconditioning magnetic field; cooling the resistance element to below the blocking temperature; removing the preconditioning magnetic field, wherein the soft magnetic structuring element is arranged such that the coupled preconditioning magnetic field penetrates the structuring element substantially perpendicular to a chip surface and, at a location of the resistance element, generates magnetic field components parallel to the chip surface which penetrate the at least one ferromagnetic layer of the resistance element at least in some areas.
2. Method according to claim 1, wherein two or more resistance elements are associated with the soft magnetic structuring element to carry out a permanent magnetisation of the at least one ferromagnetic layer of the resistance elements in the direction parallel to the chip surface.
3. Method according to claim 1, wherein two or more resistance elements are associated with the soft magnetic structuring element in order to carry out a permanent magnetisation of the at least one ferromagnetic layer of the resistance elements in different directions parallel to the chip substrate surface.
4. Method according to claim 3, wherein magnetisation directions of the ferromagnetic layers of the resistance elements lie either parallel or nonparallel to one another.
5. Method according to claim 1, wherein at least two or more resistance elements can be used to form at least one upper or lower bridge arm of a Wheatstone measuring bridge.
6. Method according to claim 1, characterized wherein the resistance elements comprise GMR layer systems and/or TMR layer systems.
7. Method according to claim 1, wherein at least one boundary edge of the soft magnetic structuring element runs substantially parallel or tangential to a boundary edge of a resistance element, wherein the resistance element is overlapped in some areas by the soft magnetic structuring element, and wherein the overlapping has a magnitude of 5 μm or less.
8. Method according to claim 1, wherein the structuring element is formed in such a way that flux density of the emerging magnetic stray fields is guided and amplified by salient pole shoes or flux guiding cut-outs in the structuring element.
9. Method according to claim 1, wherein the resistance elements are insulated from the soft magnetic structuring element by an insulation layer comprising a layer of SiN or Al.sub.2O.sub.3 with a thickness of 30 nm to 5 μm.
10. Method according to claim 1, wherein the soft magnetic structuring element is produced by depositing or building up a layer of soft magnetic material on the chip substrate comprising NiFe with a layer thickness of 1,000 nm to 20 μm, by an electrogalvanic deposition method and a lithographic structuring method for structuring individual soft magnetic structuring elements.
11. Method according to claim 1, wherein, on completion of the pinning process, the soft magnetic structuring element(s) are removable from the chip substrate.
12. Magnetic field preconditioning apparatus for magnetic preconditioning of resistance elements of a field sensor device deposited on a chip substrate, wherein the magnetic field preconditioning apparatus comprises an oven and a magnetic field generating device having a pole and an opposite pole surface in an interior of the oven, wherein at least one chip substrate with at least one soft magnetic structuring element can be placed between pole and opposite pole surface in order to achieve a magnetic preconditioning of resistance elements arranged on the chip substrate by a preconditioning magnetic field which is aligned perpendicular to a chip substrate surface.
13. Magnetic field preconditioning apparatus according to claim 12, wherein the magnetic field generating device comprises a permanent magnet which is arranged in the oven, wherein a strength of the preconditioning magnetic field can be set by an adjustable air gap between the permanent magnet and the pole and opposite pole surface by an air gap adjustment device.
14. Magnetic field sensor device for detecting at least one component of an external magnetic field, comprising a magnetoresistive resistance, wherein the magnetic field sensor device is produced in accordance with a method according to claim 1.
Description
DRAWINGS
[0042] Further advantages can be seen from the presented descriptions of the drawings. Exemplary embodiments of the invention are shown in the drawings. The drawings, the description and the claims contain numerous characteristics in combination. Expediently, the person skilled in the art will also consider the features singly and combine them to form meaningful further combinations.
[0043] In the drawings:
[0044]
[0045]
[0046]
[0047]
[0048]
[0049]
[0050]
[0051]
[0052]
[0053]
[0054] In the figures, the same elements are numbered with the same references.
[0055] A perspective, schematic diagram for pinning resistance elements 14 of a magnetic field sensor device 10 is shown in
[0056]
[0057] Different further embodiments of possible soft magnetic structuring elements 18 are shown in perspective in
[0058] The production of two complex Wheatstone measuring bridges for measuring two orthogonal magnetic field components X and Y of a magnetic field sensor device 10 is shown in
[0059] A circuit diagram of one of the two Wheatstone measuring bridges of the magnetic field sensor device according to
[0060]
[0061] The two Wheatstone measuring bridges shown for a 2D magnetic field sensor device can be used for an angle sensor. By coupling the preconditioning magnetic field 38 out-of-plane, i.e. perpendicular to the chip substrate surface 36, complex pinning directions can be preset. With a 360°-rotation of an external magnetic field in-plane, the two Wheatstone measuring bridges produce a si-nusoidal output signal. As a result of the different pinning directions, sine and cosine signals, phase-shifted by 90°, are generated in the two measuring bridges 24x and 24y. As shown in
[0062] Examples of layer stacks of a resistance element 14, the layer structure of which is suitable particularly for the setting according to the invention of the magnetisation direction of the so-called simple-spin-valve reference layer, are shown in
[0063] In order to set the magnetisation direction, the layer stack of the resistance element 14 is heated to above the blocking temperature at which the exchange coupling between the antiferromagnetic layer 86 and the reference layer 92 disappears, and the layer stack is subjected to an external preconditioning magnetic field. As a result of the structuring elements 18 (not shown here), magnetic field components, which set the required magnetisation in the reference layer 92, are generated parallel to the layer planes. After cooling the layer stack to below the blocking temperature, the coupling of the reference layer 92 with the antiferromagnetic layer 86 is reinstated, and a stable magnetisation is retained in the reference layer 92 even after the preconditioning magnetic field has been switched off. The pinning serves to set the magnetisation of the reference layer 92.
[0064] A magnetic field preconditioning apparatus 50, which comprises an oven 52 and a magnetic field generating device 66, is shown in
[0065] An exemplary embodiment of a magnetic field preconditioning apparatus 50 shown schematically in
[0066] In
[0067] In
[0068] Finally, the structuring element 18 is structured in a complex manner in
[0069] An exemplary embodiment of a production method according to the invention is shown in a sectional view in
[0070] The effective pinning magnetic field at the location of the reference layer can only have a low strength of typically 100 mT or less, which, however, is sufficient for pinning a simple-spin-valve layer structure. However, a synthetic antiferromagnet of this kind in the reference layer usually requires considerably higher fields for pinning and cannot be pinned by weak fields of this kind. A synthetic antiferromagnet is understood to mean a layer structure in which 2 or more ferromagnetic layers are separated by a thin non-magnetic intermediate layer, wherein an exchange coupling for aligning the magnetisation in the ferromagnetic layers acts between the ferromagnetic layers. A synthetic antiferromagnet therefore comprises a series of at least two thin layers of magnetic and non-magnetic conducting material, e.g. Co and Cu, the thin magnetic layers of which are magnetised in an alternating manner and therefore do not generate a resulting external magnetic field. However, by using a non-balanced, i.e. having different ferromagnetic layer thicknesses, synthetic antiferromagnet in the reference layer, a layer structure of this kind can be pinned, even with these low field strengths, at temperatures above the blocking-temperature.
[0071] The structuring element 18 can be deposited by a plating method and is usually between 1 μm and 20 μm high. A NiFe structure in particular, for example made of NiFe 8020, is used for this purpose. The resistance element 14 to be pinned is closely adjacent to the boundary edge 20 of the structuring element 18. Areas of approx. 5 μm can be pinned, wherein the areas to be pinned can be partially covered by the structuring element 18. Oppositely pinned resistance elements 14 can be arranged very closely adjacent to one another. In doing so, the resistance elements 14 have identical material characteristics, such as barrier resistance and TMR-effects for example. This enables parallel Wheatstone bridge branches with different pinning directions to be structured identically in order to achieve an optimised offset value. The insulation layer can be made from SiN or Al.sub.2O.sub.3, for example, with a layer thickness of 30 nm to 5000 nm. After depositing a seed layer, the soft magnetic structuring element 18 can be built up by means of an electrogalvanic method. The structuring element 18 can be formed by a structuring method and subjected to a perpendicular preconditioning magnetic field in order to carry out pinning. After removing the soft magnetic structuring element 14, the insulating layer 76 can be selectively opened in order to enable electrical contact to be made with the resistance elements 14. In contrast to classic pinning devices, in which magnetic fields are applied parallel to the chip surface in-plane, with the help of the proposed magnetic field preconditioning apparatus 50, pinning can be carried out by means of a magnetic field 38 aligned perpendicular to the chip surface 36. The strength of the preconditioning magnetic field can be adjusted by means of an adjustable air gap 34.
REFERENCE SIGNS
[0072] 10 Magnetic field sensor device
[0073] 12 Chip substrate
[0074] 14 Resistance element
[0075] 18 Soft magnetic structuring element
[0076] 20 Soft magnetic boundary edge
[0077] 22 Boundary edge of resistance element
[0078] 24 Wheatstone measuring bridge
[0079] 26 Bridge resistance
[0080] 28 Lower bridge arm
[0081] 30 Upper bridge arm
[0082] 32
[0083] 34 Adjustable air gap
[0084] 36 Chip substrate surface
[0085] 38 Preconditioning magnetic field
[0086] 40 Measuring bridge contact surface
[0087] 42 Chip substrate underside
[0088] 44 Soft magnetic structuring layer surface
[0089] 46 Boundary edge stray field
[0090] 48
[0091] 50 Magnetic field preconditioning apparatus
[0092] 52 Oven
[0093] 54 Heating device
[0094] 56 Pole surface
[0095] 58 Opposite pole surface
[0096] 60 Air gap adjustment device
[0097] 62 Chip substrate retaining device
[0098] 64 Pole spacing adjustment device
[0099] 66 Magnetic field generating device
[0100] 68 Permanent magnet
[0101] 70 Oven door
[0102] 72 Pole shoe
[0103] 74 Flux guiding cut-outs
[0104] 76 Insulation layer
[0105] 78 Guided magnetic flux
[0106] 80 Iron yoke
[0107] 82 Ferromagnetic layer
[0108] 84 Intermediate layer
[0109] 86 Antiferromagnetic layer/Antiferromagnet
[0110] 88 Contact layer
[0111] 90 Protective layer/Insulating layer
[0112] 92 Reference layer
[0113] 94 Detection layer