The present invention is directed to a novel mechanical device containing a liquid solution recirculating inside the device in the form of programmed oriented movements which achieve to trap the contaminants resulting from carburant combustion processes, such as particulate material, smoke, soot, fly ashes, greenhouse type gases in order to remove them from the air and to achieve its neutralization thus providing a clean air and suitable to be reinserted into the environment and the substance obtained by the device is reinserted into the production chain as a raw material applicable to a plurality of industries.

A device evacuates a chamber and purifies the gas extracted from said chamber of any foreign substances. The device comprises a dry-condensing vacuum pump having an input connected to the chamber to be evacuated and is suitable for maintaining the input pressure at a constant level at the output despite variable conditions. An intermediate line which connects to the output of the dry-condensing vacuum pump and a liquid ring vacuum pump, the input of which is connected to the intermediate line, are additionally provided. A corresponding method makes it possible to purify the gas of any foreign substances reliably and effectively.

A device evacuates a chamber and purifies the gas extracted from said chamber of any foreign substances. The device comprises a dry-condensing vacuum pump having an input connected to the chamber to be evacuated and is suitable for maintaining the input pressure at a constant level at the output despite variable conditions. An intermediate line which connects to the output of the dry-condensing vacuum pump and a liquid ring vacuum pump, the input of which is connected to the intermediate line, are additionally provided. A corresponding method makes it possible to purify the gas of any foreign substances reliably and effectively.

The present invention provides a method for treating a gas, comprising: step (A): collecting a gas comprising carbon dioxide and fine particulate matter; step (B): rinsing the gas with water to obtain a rinsed gas; and step (C): contacting the rinsed gas with a basic solution in a way of co-current flow to absorb the carbon dioxide in the rinsed gas by the basic solution to obtain a treated gas and a weak basic solution; wherein the pH value of the basic solution is between 9 and 14, and the pH value of the weak basic solution is between 8 and 8.5. The method can reduce the content of both fine particulate matter and carbon dioxide.

The present invention provides a method for treating a gas, comprising: step (A): collecting a gas comprising carbon dioxide and fine particulate matter; step (B): rinsing the gas with water to obtain a rinsed gas; and step (C): contacting the rinsed gas with a basic solution in a way of co-current flow to absorb the carbon dioxide in the rinsed gas by the basic solution to obtain a treated gas and a weak basic solution; wherein the pH value of the basic solution is between 9 and 14, and the pH value of the weak basic solution is between 8 and 8.5. The method can reduce the content of both fine particulate matter and carbon dioxide.

A gas sensor assembly includes a housing; an inlet assembly configured to carry a gaseous composition having a volatile organic compound into the housing; and an outlet assembly configured to carry the gaseous composition from the housing. The gas sensor assembly also includes an ultraviolet light source disposed within the housing and a gas sensor disposed within the housing and configured to sense an amount of the volatile organic compound.

A substrate processing apparatus according to an aspect of the present disclosure includes a substrate rotating unit, a gas-liquid separator, and an exhaust route. The substrate rotating unit is configured to hold and rotate a substrate. The gas-liquid separator is provided so as to surround an outer circumference of the substrate rotating unit to separate gas and liquid droplets. The exhaust route is provided so as to surround an outer circumference of the gas-liquid separator and discharges the gas separated by the gas-liquid separator.

A substrate processing apparatus according to an aspect of the present disclosure includes a substrate rotating unit, a gas-liquid separator, and an exhaust route. The substrate rotating unit is configured to hold and rotate a substrate. The gas-liquid separator is provided so as to surround an outer circumference of the substrate rotating unit to separate gas and liquid droplets. The exhaust route is provided so as to surround an outer circumference of the gas-liquid separator and discharges the gas separated by the gas-liquid separator.

An exhaust configuration for a wet scrubber. The exhaust configuration includes a diffuser that is attached to the wet scrubber and which defining an outlet for discharging scrubbed air and paint laden water from the wet scrubber. Attached on lateral sides of the diffuser are wings. The wings extend away from the outlet.

An exhaust configuration for a wet scrubber. The exhaust configuration includes a diffuser that is attached to the wet scrubber and which defining an outlet for discharging scrubbed air and paint laden water from the wet scrubber. Attached on lateral sides of the diffuser are wings. The wings extend away from the outlet.