A cleaning device includes a supporting mechanism, a clamping mechanism arranged on the supporting mechanism and used to clamp a spray head, a heating mechanism, an adjusting mechanism, and a cleaning mechanism. The heating mechanism, the adjusting mechanism, and the cleaning mechanism are arranged on the supporting mechanism. The heating mechanism is used to heat the spray head clamped by the clamping mechanism. The cleaning mechanism is used to inject cleaning liquid into the spray head, dredge the spray head, and detect the spray head. The adjusting mechanism is used to rotate and adjust a position of the cleaning mechanism to complete different tasks on the spray head.

A mask plate and a method for manufacturing the same are provided. The mask plate comprises a first sub-mask plate and a second sub-mask plate stacked with each other, the first sub-mask plate is provided with at least one first opening therein, a size and a shape of the first opening correspond to those of a target display panel; the second sub-mask plate is provided with a second opening region, which covers at least one of the at least one first opening and includes a plurality of second openings. Since it is only required to ensure that the sizes and shapes of the first openings are the same as those of the target display panels respectively, and it is unnecessary to further manufacture openings for forming pixel patterns, comparing with the existing mask plate, the manufacturing process of the present disclosure is more simple and the manufacturing cost is lower.

A mask frame assembly includes: a mask frame; at least one mask sheet arranged on the mask frame; a plurality of first support sticks extending in a first direction; and a plurality of second support sticks extending in a second direction, wherein a mask frame transformation index is within a range from about −1000 to about +1000 based on mask frame transformation index=Σ (tensile force of first support sticks/tensile rate of first support sticks)−Σ (tensile force of second support sticks/tensile rate of second support sticks), where tensile force of respective first or second support stick is given by thickness (T)×width (W)×elastic coefficient (E)×tensile rate (δ/L.sub.0), δ is a transformed amount (L.sub.f−L.sub.0) corresponding to tension, L.sub.0 is an initial length of respective first or second support stick, and L.sub.f is a final length of respective first or second support stick.

Systems for applying a masking material to a substrate, the system comprising: a source feed for delivering a quantity of masking material to a substrate, a waste deposit for receiving masking material when removed from the substrate, a spray nozzle moveable relative to the substrate and a controller for controlling movement of the nozzle relative to the substrate and the speed of delivery of the masking material from the source feed, wherein the speed of movement of the spray nozzle relative to the substrate is substantially equal to the speed of delivery of the masking material from the source feed.

A mask and a method of manufacturing a mask assembly, the mask including a body, and the body including one end and another end facing each other in a length direction and having a first surface and a second surface facing each other in a thickness direction; and a pattern region between the one end and the other end, the pattern region including a plurality of pattern holes and a plurality of ribs between the plurality of pattern holes, wherein a curl value of the mask, which is defined as a shortest distance from a plane tangent to a center of the body to the one end or the other end of the body, is 1,000 μm to 4,000 μm.

A method includes masking at least one hole of an article with a paste, wherein the hole opens onto a surface of the article, applying a coating to the surface of the article, and removing the paste including contacting the paste with water, leaving at least one open hole in the surface of the coated article. The paste includes about 40-80 wt % of a filler material, about 0.5-20 wt % of an inorganic binder, about 0.5-15 wt % of a polyhydroxy compound and about 5-25 wt % of water. The filler material includes a first material which includes alkali metal doped alumina, zirconium oxide, titanium oxide, silicon dioxide, or a combination thereof and a second material which includes a silicate. A weight ratio between the first and second materials is in a range of about 1-10.

A mask plate includes a plurality of first supporting and shielding strips, and a plurality of second supporting and shielding strips. The second supporting and shielding strips and the first supporting and shielding strips perpendicularly intersect. The first supporting and shielding strips and the second supporting and shielding strips are provided with at least one objective supporting and shielding strip, and an edge of a predetermined surface of the objective supporting and shielding strip parallel to an extending direction of the objective supporting and shielding strip is provided with a thinned area; the thinned area extends in the extending direction of the objective supporting and shielding strip, and has a thickness smaller than a thickness of other areas except the thinned area; and the predetermined surface is a surface of the objective supporting and shielding strip facing a deposition material when a mask evaporation is performed through the mask plate.

Apparatuses and methods related to a high pressure fluid processing device having a dual check valve setup that can be quickly and easily maintained with replacement parts are disclosed herein. In a general example embodiment, a high pressure processing device includes a body including a first surface having a first recess, a second surface having a second recess, and a third surface having a third recess, a first subassembly at least partially inserted into the first recess of the body, the first subassembly including a first check valve, a second subassembly at least partially inserted into the second recess of the body, the second subassembly including a second check valve, and a third subassembly at least partially inserted into the third recess of the body, the third subassembly coupling the body to a fluid driving mechanism, wherein the first subassembly, second subassembly and third subassembly are configured to be independently attachable to and detachable from the first recess, second recess and third recess, respectively.

Apparatuses and methods related to a high pressure fluid processing device having a dual check valve setup that can be quickly and easily maintained with replacement parts are disclosed herein. In a general example embodiment, a high pressure processing device includes a body including a first surface having a first recess, a second surface having a second recess, and a third surface having a third recess, a first subassembly at least partially inserted into the first recess of the body, the first subassembly including a first check valve, a second subassembly at least partially inserted into the second recess of the body, the second subassembly including a second check valve, and a third subassembly at least partially inserted into the third recess of the body, the third subassembly coupling the body to a fluid driving mechanism, wherein the first subassembly, second subassembly and third subassembly are configured to be independently attachable to and detachable from the first recess, second recess and third recess, respectively.

A device and a system for a lacquer transfer with a frame, transfer roller with a circumferential lateral wall, a drive unit, a slit nozzle, the slit nozzle at least indirectly connected to the frame, an outside contact surface of the lateral wall including depressions, the transfer roller mounted rotatably about an axis of rotation at the frame, the drive unit configured to drive the transfer roller for the transfer roller to rotate about the axis of rotation. The slit nozzle includes a supply connection, nozzle-cavity, slit-shaped nozzle-channel and at least one limiter, the supply connection coupled to the nozzle-cavity for supplying lacquer to the nozzle-cavity, the nozzle-channel extending from the nozzle-cavity to a muzzle end formed by the slit nozzle at the end of the nozzle-channel for dispensing lacquer, the slit nozzle configured by the limiter to adjust a cross-section in a restriction area of the nozzle-channel.