A business form comprises a first portion and a second portion adhesively secured to the first portion via a control bond adhesive. The control bond adhesive is a mixture comprising: between about 1 kg and 2 kg of a flexible adhesive; between about 1 kg and 2 kg of water; between about 12 g and 16 g gypsum, and between about 13 g and 23 g fumed silica.

A business form comprises a first portion and a second portion adhesively secured to the first portion via a control bond adhesive. The control bond adhesive is a mixture comprising: between about 1 kg and 2 kg of a flexible adhesive; between about 1 kg and 2 kg of water; between about 12 g and 16 g gypsum, and between about 13 g and 23 g fumed silica.

Disclosed are silicon and carbon containing film forming compositions comprising a polycarbosilazane polymer or oligomer formulation that consists of silazane-bridged carbosilane monomers, the carbosilane containing at least two —SiH.sub.2— moieties, either as terminal groups (—SiH.sub.3R) or embedded in a carbosilane cyclic compound, wherein R is H, a C.sub.1-C.sub.6 linear, branched, or cyclic alkyl- group, a C.sub.1-C.sub.6 linear, branched, or cyclic alkenyl- group, or combination thereof. Also disclosed are methods of forming a silicon and carbon containing film comprising forming a solution comprising a polycarbosilazane polymer or oligomer formulation and contacting the solution with the substrate via a spin-on coating, spray coating, dip coating, or slit coating technique to form the silicon and carbon containing film.

Disclosed herein is are methods and apparatuses for synthesizing deposited films of compounds (e.g., organic compounds such as a pharmaceutical active ingredient or a new chemical entity) on or in a variety of substrates, where such deposited compounds the desired stability under storage conditions, ease of handling, and yet enhanced dissolution properties when used in various assays. The disclosure further relates to methods of coating substrates, such as medical or diagnostic devices, with deposited films of organic compounds, as well as film-coated substrates.

The present application discloses forming self-assembled monolayers (SAMs) by exposing the substrate at least twice to SAM precursors with intervening cooling of a substrate.

Urea (multi)-(meth)acrylate (multi)-silane precursor compounds, synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds, either neat or in a solvent, and optionally with a catalyst, such as a tin compound, to accelerate the reaction. Also described are articles including a substrate, a base (co)polymer layer on a major surface of the substrate, an oxide layer on the base (co)polymer layer; and a protective (co)polymer layer on the oxide layer, the protective (co)polymer layer including the reaction product of at least one urea (multi)-(meth)acrylate (multi)-silane precursor compound synthesized by reaction of (meth)acrylated materials having isocyanate functionality with aminosilane compounds. The substrate may be a (co)polymer film or an electronic device such as an organic light emitting device, electrophoretic light emitting device, liquid crystal display, thin film transistor, or combination thereof. Methods of making the urea (multi)-(meth)acrylate (multi)-silanes and their use in composite films and electronic devices are described.

The present application discloses forming self-assembled monolayers (SAMs) by exposing the substrate at least twice to SAM precursors with intervening cooling of a substrate.

An embodiment includes a system comprising: a monolithic shape memory polymer (SMP) foam having first and second states; wherein the SMP foam includes: (a) polyurethane, (b) an inner half portion having inner reticulated cells defined by inner struts, (c) an outer half portion, having outer reticulated cells defined by outer struts, surrounding the inner portion in a plane that provides a cross-section of the SMP foam, (d) hydroxyl groups chemically bound to outer surfaces of both the inner and outer struts. Other embodiments are discussed herein.

A manufacturing method of an indium tin oxide (ITO) thin film based on a solution method is disclosed. The manufacturing method includes: a step of providing an array substrate; a step of obtaining a dispersion solution by mixing ITO grains, an organic small molecule phase transfer agent, and an N-chlorosuccinimide (NCs) solution; a step of obtaining uniformly assembled ITO grains by coating the dispersion solution onto a passivation layer and baking to remove the organic small molecule phase transfer agent; and a step of obtaining the ITO thin film by annealing at an inert atmosphere to refine the ITO grains.

A substrate treatment method for treating a substrate, includes: (a) applying a coating solution to a front surface of the substrate by a spin coating method to form a coating film; (b) supplying a solvent for the coating solution to a projection of the coating film formed at a front surface peripheral edge of the substrate at (a); and (c) rotating the substrate in a state where the supply of the solvent is stopped, to move a top of the projection to an outside in a radial direction of the substrate. (b) and (c) are repeatedly performed. The projection is a buildup of the coating solution protruding from the coating film.