A device for realizing surface cleaning of an optical element by ion wind and electrostatic coupling, comprising a fixing support, an optical element, an ion wind system, an electrostatic adsorption system, and a particle contaminant storage box; the ion wind system comprises an air knife, an ion bar, an ion bar support, a connecting sheet, and a three-degree-of-freedom combined displacement stage; the electrostatic adsorption system comprises rod-shaped electrodes, electrode fixing supports and a manual displacement stage; the particle contaminant storage box is connected to a working surface by means of storage box supports, and an included angle between the particle contaminant storage box and the storage box supports is 135 degrees.

A backlight source packaging device is provided in the present disclosure, which belongs to the technical field of displays. The backlight source packaging device includes a bracket, a feeding mechanism, a cleaning mechanism, a cutting mechanism and a rotating mechanism, where the feeding mechanism is fixed to the bracket, which is configured to arrange a winding film; the cleaning mechanism is fixed to the bracket, which is configured to clean the winding film; the cutting mechanism is fixed to the bracket, which is configured to cut the winding film; the rotating mechanism is fixed to the bracket, which is configured to drive the backlight source to rotate so that the winding film winds around the backlight source, where the winding film can reach the rotating mechanism from the feeding mechanism successively through the cleaning mechanism and the cutting mechanism.

Systems and methods for cleaning a showerhead are described. One of the systems includes a support section and a press plate located above the support section to be supported by the support section. The system further includes a cleaning layer located above the press plate. The cleaning layer moves to clean a showerhead. The support section contacts an arm of a spindle assembly for movement with movement of the arm.

Systems and methods for cleaning a showerhead are described. One of the systems includes a support section and a press plate located above the support section to be supported by the support section. The system further includes a cleaning layer located above the press plate. The cleaning layer moves to clean a showerhead. The support section contacts an arm of a spindle assembly for movement with movement of the arm.

Systems and methods for self-cleaning a surface of an object where an electrodynamic shield is mounted to a surface of the object. The electrodynamic shield includes one or more sets of electrodes atop a substrate, at least one or more sets of electrodes being covered in a protective film. A coating is applied to the top surface of the protection film. A signal pulse generator is connected to the one or more sets of electrodes. The signal pulse generator generates a pulse signal that causes the one or more sets of electrodes to generate an electric field. The pulse signal comprises a plurality of different pulse signals which have phase differences between consecutive signals, and the electric field causes a particle atop the coating to experience an electrostatic force and be repelled away from the coating. These pulse signals (including shapes, amplitudes, shifts, and frequencies) can be tuned to increase efficiency of removal depending on dust type and relative humidity.

Systems and methods for self-cleaning a surface of an object where an electrodynamic shield is mounted to a surface of the object. The electrodynamic shield includes one or more sets of electrodes atop a substrate, at least one or more sets of electrodes being covered in a protective film. A coating is applied to the top surface of the protection film. A signal pulse generator is connected to the one or more sets of electrodes. The signal pulse generator generates a pulse signal that causes the one or more sets of electrodes to generate an electric field. The pulse signal comprises a plurality of different pulse signals which have phase differences between consecutive signals, and the electric field causes a particle atop the coating to experience an electrostatic force and be repelled away from the coating. These pulse signals (including shapes, amplitudes, shifts, and frequencies) can be tuned to increase efficiency of removal depending on dust type and relative humidity.

A substrate cleaning system include a chamber and a substrate stage positioned within the chamber. The substrate stage is configured to secure a substrate for cleaning with a cleaning head. The substrate cleaning system includes a robot configured to transfer the substrate between a storage receptable and the substrate stage. The cleaning head includes a disposable electrode ribbon loaded on a roller assembly. The disposable electrode ribbon includes a positive electrode and a negative electrode and is configured to electrostatically clean the substrate by electrostatically removing particles from the substrate. The roller assembly is configured to advance the disposable electrode ribbon following cleaning of the substrate.

A substrate cleaning system include a chamber and a substrate stage positioned within the chamber. The substrate stage is configured to secure a substrate for cleaning with a cleaning head. The substrate cleaning system includes a robot configured to transfer the substrate between a storage receptable and the substrate stage. The cleaning head includes a disposable electrode ribbon loaded on a roller assembly. The disposable electrode ribbon includes a positive electrode and a negative electrode and is configured to electrostatically clean the substrate by electrostatically removing particles from the substrate. The roller assembly is configured to advance the disposable electrode ribbon following cleaning of the substrate.

An EFEM includes a circulation path including a transfer chamber configured to form a transfer space where a substrate is transferred and a return path configured to return a gas flowing from one side to the other side of the transfer chamber, the EFEM including: a capture part provided in the return path and configured to electrically capture particles contained in the gas flowing through the return path, wherein the return path and the transfer chamber are provided such that a partition wall is interposed therebetween, and a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the return path becomes higher than a pressure on the side of the transfer chamber in a state in which the gas circulates through the circulation path.

An EFEM includes a circulation path including a transfer chamber configured to form a transfer space where a substrate is transferred and a return path configured to return a gas flowing from one side to the other side of the transfer chamber, the EFEM including: a capture part provided in the return path and configured to electrically capture particles contained in the gas flowing through the return path, wherein the return path and the transfer chamber are provided such that a partition wall is interposed therebetween, and a differential pressure is generated on both sides of the partition wall such that a pressure on the side of the return path becomes higher than a pressure on the side of the transfer chamber in a state in which the gas circulates through the circulation path.