A cleaning assembly may include a chuck. The cleaning assembly may include a plurality of lift pins positioned proximate to the chuck. The plurality of lift pins may be configured to engage a cleaning substrate and translate the cleaning substrate to allow the cleaning substrate to capture one or more particles from the surface of the chuck via at least one of electrostatic attraction or mechanical trapping when the cleaning substrate is positioned in the second position. The cleaning assembly may include a replaceable top skin coupled to the chuck and configured to capture the one or more particles.

A cleaning assembly may include a chuck. The cleaning assembly may include a plurality of lift pins positioned proximate to the chuck. The plurality of lift pins may be configured to engage a cleaning substrate and translate the cleaning substrate to allow the cleaning substrate to capture one or more particles from the surface of the chuck via at least one of electrostatic attraction or mechanical trapping when the cleaning substrate is positioned in the second position. The cleaning assembly may include a replaceable top skin coupled to the chuck and configured to capture the one or more particles.

The device includes a substantially cylindrical, oblong, rigid, extension pole having a distal end upon which is formed an articulatable jaw structure head which can be actuated between open and closed positions by the pull of either a medial handle or knob located at the proximal end. A collector sock made from a pliable sheet material can be mounted upon the jaw structure so that the sock enwraps the entire item to be dusted such as a ceiling fan blade. The inner surface of the sock surrounding its open end maw can include asperities and electrostatic, dust adhering fibers to help scrape off and capture fine particles of dust and other debris from the item being dusted. The head can include a pair of parallely separatable cantelevered beams engaging the sock.

The device includes a substantially cylindrical, oblong, rigid, extension pole having a distal end upon which is formed an articulatable jaw structure head which can be actuated between open and closed positions by the pull of either a medial handle or knob located at the proximal end. A collector sock made from a pliable sheet material can be mounted upon the jaw structure so that the sock enwraps the entire item to be dusted such as a ceiling fan blade. The inner surface of the sock surrounding its open end maw can include asperities and electrostatic, dust adhering fibers to help scrape off and capture fine particles of dust and other debris from the item being dusted. The head can include a pair of parallely separatable cantelevered beams engaging the sock.

The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.

The inventive concept provides a nozzle for dispensing a treatment liquid in which plasma is generated. The nozzle includes a body having an interior space, a liquid supply unit that supplies the treatment liquid into the interior space, and electrodes that generate the plasma in the interior space. The liquid supply unit supplies the treatment liquid in a bubbling state into the interior space, or causes the treatment liquid to bubble in the interior space.

Disclosed is a wafer processing system, a load lock system, a chamber system, and methods of neutralizing static charges and dislodging particles from a wafer. The chamber system (e.g., load lock system) may comprise a chamber (e.g., load lock chamber), at least one ionizer to ionize inert gas supplied to the chamber (e.g., load lock chamber), at least one bottom nozzle to flow ionized inert gas to a bottom surface of a wafer, at least one top nozzle to flow ionized inert gas to a top surface of a wafer, and at least one exhaust vent to remove the ionized inert gas and any neutralized particles dislodged from the wafer. The chamber may include a single wafer or multiple wafers. The chamber system may further comprise at least one nozzle to flow an inert gas curtain proximate to an exit and/or entry into the chamber.

Disclosed is a wafer processing system, a load lock system, a chamber system, and methods of neutralizing static charges and dislodging particles from a wafer. The chamber system (e.g., load lock system) may comprise a chamber (e.g., load lock chamber), at least one ionizer to ionize inert gas supplied to the chamber (e.g., load lock chamber), at least one bottom nozzle to flow ionized inert gas to a bottom surface of a wafer, at least one top nozzle to flow ionized inert gas to a top surface of a wafer, and at least one exhaust vent to remove the ionized inert gas and any neutralized particles dislodged from the wafer. The chamber may include a single wafer or multiple wafers. The chamber system may further comprise at least one nozzle to flow an inert gas curtain proximate to an exit and/or entry into the chamber.

A foreign object removal apparatus removes a foreign object attached on a can body by rinsing the can body. The foreign object removal apparatus includes a conveyance line configured to convey the can body, a destaticizing air blower configured to blow a destaticizing air to the conveyed can body, and a rinser configured to rinse the can body after blowing the destaticizing air using the destaticizing air blower.

A multi-angle wash system for cleaning carcass, wherein the wash system comprises a multi-angle fluid distribution unit; a rotating unit; a spray unit fluidly and operably coupled to the multi-angle fluid distribution unit; and a guiding unit operably coupled to the spray unit or the multi-angle fluid distribution unit. The multi-angle fluid distribution unit comprises a connecting element that is configured to operably couple with the spray unit such that the spray unit oscillates in correspondence to the rotation of the rotating unit. The spray unit comprises a guiding element and nozzle sprays. The guiding unit comprises a co-guiding element that has a reciprocate structure to the guiding element of the spray unit such that the guiding unit facilitates the oscillation of the spray unit in correspondence to the rotation of the rotating unit.