A power contact electrode plasma therapy circuit includes a pair of terminals adapted to be connected to a set of switchable contact electrodes of a power contact. A plasma ignition detector is configured to detect an electrical parameter over the switchable contact electrodes indicative of the formation of plasma between the switchable contact electrodes and output a plasma ignition signal based on the electrical parameter as detected. A plasma burn memory is configured to receive and store the plasma ignition signal. A controller circuit is configured to receive from the plasma burn memory the plasma ignition signal, start a time based on receipt of the plasma ignition signal, and upon the timer meeting a time requirement, output a plasma extinguish command. A plasma extinguishing circuit, configured to bypass the pair of terminals upon receiving the trigger signal to extinguish the plasma between the switchable contact electrodes.

A motorized apparatus for use in maintaining a pipe having a sidewall is provided. The motorized apparatus includes a body assembly sized to fit within and to travel along an interior cavity of the pipe. The body assembly includes a first end and a second end and extending along a longitudinal axis. The body assembly also includes a plurality of leg assemblies coupled circumferentially around the body assembly. Each leg assembly includes a telescoping portion, a bias member coupled to the telescoping portion, and a drive mechanism configured to interact with the sidewall as the body assembly travels along the pipe. The body assembly also includes at least one sensor configured to collect data associated with a force between the sidewall and the drive mechanism, and an actuator assembly coupled to each leg assembly and configured to independently actuate each the leg assembly.

A plasma system and a filter device are provided. In the system, an area surrounded by a dielectric window is configured as a first chamber for accommodating plasma. A first adapter is arranged under the dielectric window. An area surrounded by the first adapter is configured as a second chamber. A lower electrode platform is placed in the second chamber to carry a workpiece. A filter member of the filter device is placed at an intersection of the first chamber and the second chamber. The filter member includes through-holes configured to filter ions from the plasma. A first extension member extends from the filter member in a first direction and is placed over the first adapter. A second extension member extends from a position of the filter member adjacent to the first extension member to an inner side of the first adapter.

The substrate processing device according to one embodiment may comprise: a chamber unit provided with a processing space therein and comprising an inclined chamber surface having an opening; a door unit comprising an inclined door surface, which corresponds to the inclined chamber surface, and capable of being coupled to the chamber unit; and a door driving unit for driving the door unit so as to open/close the processing space.

An exemplary embodiment of the present disclosure provides solvent-free cleaning systems and methods, the systems and methods comprise a polymer substrate having a crosslinked matrix positioned on at least one surface of the polymer substrate, wherein the crosslinked matrix is configured to absorb particulates from a surface of a material when placed in direct contact.

An exemplary embodiment of the present disclosure provides solvent-free cleaning systems and methods, the systems and methods comprise a polymer substrate having a crosslinked matrix positioned on at least one surface of the polymer substrate, wherein the crosslinked matrix is configured to absorb particulates from a surface of a material when placed in direct contact.

An oral care device (8) adapted to generate an RF field for performing an oral cleaning function. The device includes a cleaning unit (10) for receipt in the mouth which includes a conductor arrangement (18, 19) which is driven with a drive signal to generate an RF field which cleans surfaces in the mouth. Means is further provided for sensing an electrical or electromagnetic signal arising from interaction of the RF energy with bodies in the mouth, for performing a sensing function with the same RF system components used for generating the RF field for cleaning or treatment.

An oral care device (8) adapted to generate an RF field for performing an oral cleaning function. The device includes a cleaning unit (10) for receipt in the mouth which includes a conductor arrangement (18, 19) which is driven with a drive signal to generate an RF field which cleans surfaces in the mouth. Means is further provided for sensing an electrical or electromagnetic signal arising from interaction of the RF energy with bodies in the mouth, for performing a sensing function with the same RF system components used for generating the RF field for cleaning or treatment.

A cover plate bearing device, a cover plate cleaning device, and a cover plate cleaning method. The cover plate bearing device includes a main body and a gas channel provided on the main body; the main body includes two side walls separated in a first direction, a bottom wall connected with the side walls, and a receiving cavity enclosed and formed by the side walls and the bottom wall; the shape of the receiving cavity matches that of the curved cover plate; at least one gas outlet of the gas channel are provided on the side wall; and the gas channel being adapted for blowing gas with a preset angle towards a side of the side wall facing away from the bottom wall, to prevent a moving fluid from eroding the functional coating of the curved cover plate.

A plasma processing apparatus for cleaning a peripheral portion of a substrate by plasma and comprising a depressurizable processing container accommodating a substrate is disclosed. The processing container includes a substrate support for supporting a substrate and including a central electrode facing a central portion of the supported substrate supported by the substrate support; a lower ring electrode formed in a ring shape to face a lower surface of a peripheral portion of the substrate supported by the substrate support; and an upper ring electrode disposed to face an upper surface of the peripheral portion of the substrate supported by the substrate support. The central electrode is grounded, a radio frequency (RF) power is supplied to each of the upper and lower ring electrodes, and the RF power is supplied to at least one of the upper and lower ring electrodes via a phase adjuster configured to adjust the phase of the RF power.