A molecular adhesive system for reversibly joining two surfaces, comprising: an anionic coating on a first of two surfaces to be joined; a conductive polymer nanotube array on a second of the two surfaces to be joined; wherein said conductive polymer nanotube array is functionalized with metal nanoparticles; and an electric potential applied across said two surfaces.

A substrate cleaning system includes a cleaner module to clean a substrate after polishing of the substrate, a drier module to dry the substrate after cleaning by the cleaner module, a substrate support movable along a first axis from a first position in the drier module to a second position outside the drier module, and an in-line metrology station including a line-scan camera positioned to scan the substrate as the substrate is held by the substrate support and the substrate support is between the first position to the second position. The first axis is substantially parallel to a face of the substrate as held in by the substrate support.

Exemplary methods of treating a chamber may include delivering a cleaning precursor to a remote plasma unit. The methods may include forming a plasma of the cleaning precursor. The methods may include delivering plasma effluents of the cleaning precursor to a processing region of a semiconductor processing chamber. The processing region may be defined by one or more chamber components. The one or more chamber components may include an oxide coating. The methods may include halting delivery of the plasma effluents. The methods may include treating the oxide coating with a hydrogen-containing material delivered to the processing region subsequent halting delivery of the plasma effluents.

A bed pan sanitizing assembly includes a housing and a pair of trays that is each of the trays is positioned within the housing. Each of the trays can have a respective one of a bed pan and a urine bottle positioned thereon. A pair of light emitting units is each positioned within the housing to emit light into an interior of the housing. Each of the light emitting units has an operational frequency within the ultraviolet spectrum to sterilize the bed pan and the urine bottle when the light emitting units are turned on. A heating unit is integrated into the housing to heat the interior of the housing when the heating unit is turned on for enhancing sterilizing the bed pan and the urine bottle.

A battery pack including a supporting structure, a battery cell housed within the supporting structure, a sleeve partially surrounding the battery cell, a bus bar, and a wire. The sleeve extends over a portion of a first end of the battery cell and has a laser-cut cutaway portion exposing a laser-cleaned first bonding area of the first end of the battery cell. The laser-cleaned first bonding area is positioned adjacent to an outer perimeter of the first end of the battery cell. The bus bar has a laser-cleaned second bonding area. The wire is bonded to the first and second laser-cleaned bonding areas to electrically connect the battery cell to the bus bar.

The invention relates to a facility which has a dirty facility area and an adjacent clean facility area, baskets for receiving the dirty articles, and a wall separating the dirty area from the clean area, the dirty area including an entry door for receiving the dirty articles, pre-processing stations with tables for the pre-washing and/or sorting by a human operator, or even by a robotic operator, of the dirty articles and for arranging the pre-washed and/or sorted articles in the baskets, pick-up points at the pre-processing stations for pick-up of the baskets with the pre-washed and/or sorted articles, a plurality of washers, eg. machines operating in a manner similar to a dishwasher, positioned along the dividing wall, for washing the pre-washed and/or sorted articles arranged in the baskets, the washers having an inlet opening in the dirty area and an outlet opening for washed articles in the clean area, the clean area including processing stations with tables for processing by a human operator, or even a robotic operator, of the washed articles. One or more unmanned vehicles are configured for travelling on the floor of the dirty area at least between pick-up points and an inlet opening of the respective washers, each vehicle including a base with a front end and a rear end, an upper part with a loading platform configured for supporting the baskets, an on-board control device for receiving and executing mission information, each pre-processing station including a first type control device for direct or indirect communication with one or more of the vehicles, each washer including a respective second type control device for direct or indirect communication with the one or more vehicles and/or for direct or indirect communication with the first control devices, each first control device being for calling a vehicle to the pick-up point and/or for dispatching a vehicle from the pick-up point.

Provided is a reduction treatment method in which hydrogen radicals are efficiently generated in an amount required for reduction treatment and the surface of an object to be treated is reduced by a relatively simple treatment process. A reduction treatment method including: irradiating a hydrogen radical source-containing material with ultraviolet light having a wavelength of 255 nm or less to generate hydrogen radicals; and bringing the generated hydrogen radicals into contact with a surface of an object to be treated to reduce the surface.

Provided is a reduction treatment method in which hydrogen radicals are efficiently generated in an amount required for reduction treatment and the surface of an object to be treated is reduced by a relatively simple treatment process. A reduction treatment method including: irradiating a hydrogen radical source-containing material with ultraviolet light having a wavelength of 255 nm or less to generate hydrogen radicals; and bringing the generated hydrogen radicals into contact with a surface of an object to be treated to reduce the surface.

The inventive concept provides a substrate treating method. The substrate treating method includes first treating a substrate in a treating space according to a reference recipe; second treating a substrate in the treating space according to the reference recipe after the first treating; and optimizing an inner ambient of the treating space according to the reference recipe, and wherein the optimizing includes a purge operation of supplying and discharging a treating fluid to/from the treating space.

A cleaning system includes at least one cleaning module configured to receive a substrate after a chemical mechanical polishing (CMP) process and to remove contaminants on the substrate using a cleaning solution. The cleaning system further includes a cleaning solution supply system configured to supply the cleaning solution to the at least one cleaning module. The cleaning solution supply system includes at least one temperature control system. The at least one temperature control system includes a heating device configured to heat the cleaning solution, a cooling device configured to cool the cleaning solution, a temperature sensor configured to monitor a temperature of the cleaning solution, and a temperature controller configured to control the heating device and the cooling device.