The present disclosure provides embodiments of a system and method for detecting processing chamber condition. The embodiments include performing a wafer-less processing step in a processing chamber to determine the condition of the chamber walls. Based on an analysis of the residual gas resulting from the wafer-less processing step, an operator or a process controller can determine whether the chamber walls have deteriorated to such an extent as to be cleaned.

The present disclosure provides embodiments of a system and method for detecting processing chamber condition. The embodiments include performing a wafer-less processing step in a processing chamber to determine the condition of the chamber walls. Based on an analysis of the residual gas resulting from the wafer-less processing step, an operator or a process controller can determine whether the chamber walls have deteriorated to such an extent as to be cleaned.

A glass manufacturing apparatus includes a first nozzle including a first orifice facing a travel path. The glass manufacturing apparatus includes a gas source in fluid communication with the first nozzle, with the gas source directing a gas flow to the first nozzle. The glass manufacturing apparatus includes a controller coupled to one or more of the gas source or the first nozzle to vary the gas flow from the gas source the first nozzle such that the first nozzle is discharges a series of gas bursts through the first orifice toward the travel path at a frequency within a range from about 10 Hz to about 45 Hz. A second nozzle is spaced apart from the first nozzle. The second nozzle includes a second orifice facing the travel path. The second nozzle discharges a continuous gas flow through the second orifice toward the travel path.

A cleaning device for a substrate transfer device comprises a traveling unit configured to travel along a rail having first and second areas, a rail unit including the rail and a rail structure disposed on the rail, and a rinsing unit including a suction part disposed on the rail and that rotates about a suction nozzle. When the rinsing unit is placed in contact with the rail structure, the suction part rotates about the suction nozzle.

Methods and apparatus for cleaning a showerhead are provided. For example, the methods includes moving a substrate support including a heater disposed therein from a substrate processing position a first distance away from the showerhead to a cleaning position a second distance away from the showerhead, wherein the second distance is less than the first distance; heating the showerhead using the heater disposed in the substrate support to a predetermined temperature; at least one of supplying at least one cleaning gas to the processing chamber to form a plasma or supplying the plasma from a remote plasma source; and providing a predetermined pressure within an inner volume of the processing chamber and maintaining the plasma within the inner volume of the processing chamber while heating the showerhead to the predetermined temperature.

Disclosed is a sanitization indicator that indicates whether or not sanitization has been performed after textile products such as sweaters, t-shirts, trousers, skirts, shirts, shoes, which are sold in stores, are worn and removed in fitting rooms.

This invention provides an air curtain apparatus, which are characterized by making the dry and clean airflow and/or de-electrostatic ionized airflow sprayed by the air-spraying heads or air-spraying slit thereof be further accelerated by a funnel structure and flowed vertically toward to a predetermined target, thereby less dry and clean airflow and/or a de-electrostatic ionized airflow are needed to achieve an idea dry and clean and/or de-electrostatic state, and the cost for cleaning or removing static electricity can be highly reduced.

The invention relates to a method for cleaning a phosgene-conducting apparatus by pressurization with ammonia gas to constant pressure. In this way, phosgene residues in the apparatus to be cleaned are decomposed effectively.

The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.

A device is described for protecting a sensor window. The device includes a two-piece nozzle system and is configured for generating a first and a second fluid flow, a first piece of the two-piece nozzle system being fixedly situated with respect to the sensor window, and a second piece of the two-piece nozzle system being configured for assuming different positions with respect to the first piece of the two-piece nozzle system, and the two-piece nozzle system being aligned with respect to the sensor window to direct a predominant portion of the first fluid flow in parallel to the sensor window and to direct a predominant portion of the second fluid flow in the direction onto the sensor window.