The present disclosure relates to an apparatus and method for cleaning a chamber, and more particularly, to an apparatus and method for cleaning a chamber, which are capable of cleaning the chamber which is contaminated while depositing a thin film on a substrate. The chamber cleaning method in accordance with an exemplary embodiment is a method for cleaning a chamber configured to deposit a zinc oxide, the method comprising: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into a chamber; activating and reacting the separately supplied gases with each other inside the chamber to generate a reaction gas; and firstly cleaning the chamber with the reaction gas.

A substrate cleaning apparatus that cleans a processing target substrate by blasting the gas clusters to the processing target substrate. The apparatus includes: a chamber configured to accommodate the processing target substrate; a rotary stage configured to rotatably support the processing target substrate in the chamber; an blasting unit configured to blast the gas clusters to the processing target substrate supported by the rotary stage; a driving unit configured to scan a gas cluster-blasted position on the processing target substrate; an exhaust port configured to evacuate the chamber; and a control mechanism configured to control a scattering direction of particles by controlling a rotation direction of the processing target substrate by the rotary stage and a scanning direction of the gas cluster-blasted position, thereby suppressing re-adhesion of the particles to the processing target substrate.

A dust removal device installed on a slide rail of an automatic door is provided. The slide rail includes a slide groove on the bottom side thereof and is connected to a plurality of door panels. The slide rail includes a top plate, where a plurality of dust discharging holes is disposed. The dust removal device further includes a dust extracting case disposed on the top plate. The dust extracting includes an air passage at the inside, which communicates with the plurality of dust discharging holes. The dust removal device further includes a negative pressure device connected to the dust extracting case so as to generate a negative pressure at the inside of the dust extracting case and the air passage.

A method is provided for operating a dishwasher (1) in the form of a batch dishwasher, which has a treatment chamber (2) for accommodating washware to be cleaned. Provision is made, during an adsorption phase, for air to be conducted out of the treatment chamber (2) through a sorption unit (41), which contains a reversibly dehydratable dry material, in such a way that the dry material absorbs moisture from the air stream, wherein the air is then returned to the treatment chamber (2). Provision is further made, during a desorption phase, for the dry material of the sorption unit (41) to be heated in such a way that moisture is desorbed from the dry material as steam. During the desorption phase, the sorption unit (41) is subjected to forced ventilation only to such an extent that recondensation of desorbed steam in the sorption unit (41) itself is effectively prevented.

The present disclosure provides embodiments of a system and method for detecting processing chamber condition. The embodiments include performing a wafer-less processing step in a processing chamber to determine the condition of the chamber walls. Based on an analysis of the residual gas resulting from the wafer-less processing step, an operator or a process controller can determine whether the chamber walls have deteriorated to such an extent as to be cleaned.

There is provided a maintenance device comprising: a case having an opening whose size corresponds to a second gate of a vacuum processing device disposed in a processing chamber having a first gate and the second gate different from the first gate, the first gate and the second gate being used for loading and unloading substrates, the opening being capable of being attached to the second gate in a detachable manner and an airtight manner; a depressurization mechanism configured to reduce a pressure in the case; and a suction mechanism disposed in the case and configured to enter the processing chamber through the opening and conduct suction of deposits on an object in the processing chamber.

Embodiments of the disclosure include an apparatus and method of cleaning a substrate. The disclosure describes a method of cleaning a substrate includes supplying a gas at a gas temperature and a gas mass flow rate to a nozzle. The method also includes supplying a liquid at a liquid temperature and a liquid mass flow rate to the nozzle. The method also includes mixing the gas with the liquid in the nozzle to form a fluid mixture having a mixture temperature of not more than about 10 C. below the liquid temperature. The method also includes spraying the fluid mixture onto a surface of the substrate through an orifice in the nozzle.

A method includes: stopping the supply of the oxygen to the membrane support; pushing a chemical solution that cleans the plurality of holes from a lower end of the membrane support to inside of the membrane support; pushing water or first air that pushes out the chemical solution inside the plurality of holes to a side of the reaction tank from the lower end to the inside of the membrane support; performing closing control of a valve that controls an amount of air to be discharged from an upper end of the membrane support; and pushing second air to dry the inside of the plurality of holes by pushing out the water or the first air inside the plurality of holes to the side of the reaction tank from the lower end to the inside of the membrane support.

An apparatus for removing contaminants from a slide comprises a manifold including at least one input port and at least one output port in fluid communication with the at least one input port, the at least one output port being adapted to direct a flow of gas onto a surface of the slide such that the flow of gas removes contaminants from the slide; an aperture for receiving the slide; and an enclosure adapted to capture the contaminants removed from the slide.

A waterblasting system includes a fluid supply device, an air supply device, and a waterblasting tool. The air supply device contains a battery and an alternator in a single unit. The alternator is operated by compressed air from a separate air compressor and generates electric power, at least some of which is used to charge the battery.