Disclosed is a supercritical-state cleaning system, comprising a cleaning chamber, a gas booster apparatus, a first heating apparatus, and a carbon dioxide supply apparatus. The cleaning chamber is separately connected to the first heating apparatus and the carbon dioxide supply apparatus. A vacuum pump set is connected to the cleaning chamber. Compared with the prior art, in the Invention, air introduced when a workpiece enters a cleaning chamber is completely removed, so as to prevent mixing of CO.sub.2 and air, thereby improving a cleaning effect.

The present invention generally relates to a method of reducing contamination from plastics. The resulting purer plastic can be used in demanding applications.

Disclosed is a supercritical-state cleaning system, comprising a cleaning chamber (4), a gas booster apparatus (11), a first heating apparatus (5), and a carbon dioxide supply apparatus. The cleaning chamber (4) is separately connected to the first heating apparatus (5) and the carbon dioxide supply apparatus. A vacuum pump set (1) is connected to the cleaning chamber (4). Compared with the prior art, in the Invention, air introduced when a workpiece enters a cleaning chamber is completely removed, so as to prevent mixing of CO.sub.2 and air, thereby improving a cleaning effect.

A cleaning apparatus having a door assembly sealable against the door opening of the sterilizing machine by an inflatable seal connected to an air chuck on the cleaning apparatus is operable to descale a sterilizing machine. The cleaning apparatus includes separate tanks for storing and dispensing cleaning fluid and rinse fluid. A pump associated with each tank sends fluid into the spray wand for distribution within the sterilizer machine. A vacuum is created within the corresponding tank and to draw fluid from the sterilizer machine back into the selected tank. The spray wand can be moved linearly and rotationally to direct the fluid throughout the interior of the sterilizing machine with the fluid being recycled back into the tank through a vacuum port. A selector valve on the cleaning apparatus allows the selection of cleaning fluid or rinse fluid to be drawn into the sterilizing machine.

The present invention provides a method for cleaning substrates comprising the steps of: placing a substrate on a substrate holder; implementing a bubble less or bubble-free pre-wetting process for the substrate; and implementing an ultra/mega sonic cleaning process for cleaning the substrate.

Disclosed is a supercritical-state cleaning system, comprising a cleaning chamber, a gas booster apparatus, a first heating apparatus, and a carbon dioxide supply apparatus. The cleaning chamber is separately connected to the first heating apparatus and the carbon dioxide supply apparatus. A vacuum pump set is connected to the cleaning chamber. Compared with the prior art, in the Invention, air introduced when a workpiece enters a cleaning chamber is completely removed, so as to prevent mixing of CO.sub.2 and air, thereby improving a cleaning effect.

The present disclosure relates to compositions and methods for cleaning silica deposits from a turbine. A method of cleaning a turbine is disclosed that can include contacting a deposit on a surface of the turbine with a composition and removing at least a portion of the deposit from the surface of the turbine. The composition can include a tetrafluoroboric acid and a urea component, and the deposit includes silica.

The present invention generally relates to a method of reducing contamination from plastics. The resulting purer plastic can be used in demanding applications.

The present invention generally relates to a method of reducing contamination from plastics. The resulting purer plastic can be used in demanding applications.

A composition containing 1,2-dichloro-3,3,3-trifluoropropene (HCFO-1223xd) and a fluorine-based oil.