Patent classifications
B24B1/00
Polishing composition
A polishing composition of the present invention is to be used for polishing an object including a portion containing a high-mobility material and a portion containing a silicon material. The polishing composition comprises an oxidizing agent and abrasive grains having an average primary particle diameter of 40 nm or less. The polishing composition preferably further contains a hydrolysis-suppressing compound that bonds to a surface OH group of the portion containing a silicon material of the object to function to suppress hydrolysis of the portion containing a silicon material. Alternatively, a polishing composition of the present invention contains abrasive grains, an oxidizing agent, and a hydrolysis-suppressing compound. The polishing composition preferably has a neutral pH.
Polishing composition
A polishing composition of the present invention is to be used for polishing an object including a portion containing a high-mobility material and a portion containing a silicon material. The polishing composition comprises an oxidizing agent and abrasive grains having an average primary particle diameter of 40 nm or less. The polishing composition preferably further contains a hydrolysis-suppressing compound that bonds to a surface OH group of the portion containing a silicon material of the object to function to suppress hydrolysis of the portion containing a silicon material. Alternatively, a polishing composition of the present invention contains abrasive grains, an oxidizing agent, and a hydrolysis-suppressing compound. The polishing composition preferably has a neutral pH.
Polishing Composition
The present invention provides a polishing composition for use in polishing a material having a Vickers hardness of 1500 Hv or higher. The polishing composition has an oxidation-reduction potential ORP.sub.x mV and the material to be polishing has an oxidation-reduction potential ORP.sub.y mV, with their relation satisfying ORP.sub.x−ORP.sub.y≧100 mV.
Method for fabricating super mirror finish stainless steel decorative sheet
The present invention provides a method for fabricating a super mirror finish stainless steel sheet uses the following steps: 1) rough machining, wherein a 400-450 grit sandpaper or scouring pad is used to remove an oxide layer on a surface of a stainless steel decorative sheet; 2) finish machining, wherein a 240-1,000 grit graphite grinding wheel is used to perform finish grinding; and 3) polishing processing, wherein an abrasive material is used to perform polishing. For the finish grinding and the polishing that are performed by using the grinding wheel and the abrasive material respectively, a multi-shaft polishing system is used to drive a grinding wheel, and a cylinder is controlled to adjust a force of each polishing shaft, which enables a stainless steel decorative sheet to have a surface finish under 0.01 μm and a reflectivity above 69%.
Method for fabricating super mirror finish stainless steel decorative sheet
The present invention provides a method for fabricating a super mirror finish stainless steel sheet uses the following steps: 1) rough machining, wherein a 400-450 grit sandpaper or scouring pad is used to remove an oxide layer on a surface of a stainless steel decorative sheet; 2) finish machining, wherein a 240-1,000 grit graphite grinding wheel is used to perform finish grinding; and 3) polishing processing, wherein an abrasive material is used to perform polishing. For the finish grinding and the polishing that are performed by using the grinding wheel and the abrasive material respectively, a multi-shaft polishing system is used to drive a grinding wheel, and a cylinder is controlled to adjust a force of each polishing shaft, which enables a stainless steel decorative sheet to have a surface finish under 0.01 μm and a reflectivity above 69%.
Methods for polishing inorganic substrates
A method for treating a surface of inorganic flooring (e.g., concrete, terrazzo, or a ceramic) includes applying a composition that includes a silicate to a surface of the inorganic flooring and, while the composition is present on the surface, polishing the surface. The silicate may be a lithium polysilicate and/or a colloidal silica. The composition may further include a surfactant and/or a leveling agent. When the composition is applied to the surface of the inorganic flooring, gravity may enable it to spread substantially evenly across the surface. The acts of applying and polishing may be repeated. Such a treatment may result in a surface that has a glossiness that reflects at least about 80% of incident light when the incident light is directed toward the composition at an angle of 60° to the surface.
Methods for polishing inorganic substrates
A method for treating a surface of inorganic flooring (e.g., concrete, terrazzo, or a ceramic) includes applying a composition that includes a silicate to a surface of the inorganic flooring and, while the composition is present on the surface, polishing the surface. The silicate may be a lithium polysilicate and/or a colloidal silica. The composition may further include a surfactant and/or a leveling agent. When the composition is applied to the surface of the inorganic flooring, gravity may enable it to spread substantially evenly across the surface. The acts of applying and polishing may be repeated. Such a treatment may result in a surface that has a glossiness that reflects at least about 80% of incident light when the incident light is directed toward the composition at an angle of 60° to the surface.
SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME
A silicon carbide single crystal substrate includes a first main surface, a second main surface, and a circumferential edge portion. The second main surface is opposite to the first main surface. The circumferential edge portion connects the first main surface and the second main surface. The circumferential edge portion has a linear orientation flat portion, a first arc portion having a first radius, and a second arc portion connecting the orientation flat portion and the first arc portion and having a second radius smaller than the first radius, when viewed along a direction perpendicular to the first main surface.
CONTROLLABLE MAGNETIC FIELD-ASSISTED FINISHING APPARATUS FOR INNER SURFACE AND METHOD
A controllable magnetic field-assisted finishing apparatus for an inner surface and a finishing method are provided. The apparatus includes a housing, ball screw mechanisms, a workpiece, a centering clamp, a connecting plate, a magnetic field generating device, a chuck clamp, a precise displacement platform and a base. The magnetic field generating device includes electromagnetic coils, coil connecting plates, a magnetic yoke, nuts, springs and bolts. The magnetic field generating device dynamically adjusts a distance from the magnetic yoke to the outer surface of the workpiece through the springs. The movement tracks of the magnetic finishing medium are controlled by the formed rotation of the magnetic field, the finishing action force dynamic-adjustment, the optimization of the machining form of the magnetic finishing medium in collaboration with the rotation of the chuck clamp and the feed movement of the precise displacement platform.
METHOD FOR PRODUCING A GLASS SUBSTRATE WITH AN EMBOSSED SURFACE FINISH AND GLASS SUBSTRATE OBTAINED USING SAID METHOD
The invention relates to a method comprising the steps of: Abrasion, preferably but non-limited by means of sandblasting which produces mechanical roughing on the surface of the glass substrate, optionally applying a primer on the roughed surface, and applying an ink on this primer by means of screen printing which may be digital inkjet screen printing, drying the injected ink deposited by means of digital screen printing, and performing a tempering process. A glass substrate with an embossed surface finish is achieved which simulates the aesthetic and surface texture of different construction materials, such as stone, wood, granite, marble or porcelain, among others.