A method for manufacturing a toner includes a pigment crushing step of kneading a pigment, a binder, and a grinding agent to obtain a pigment dispersion in which the grinding agent and the crushed pigment are dispersed in the binder; and a step of obtaining toner particles by a predetermined method using the pigment dispersion. The binder and the grinding agent are contained in the resulting toner particles.

Provided is an indium phosphide substrate having good linearity accuracy of a ridge line where the main surface is in contact with the orientation flat, and a method for producing the indium phosphide substrate. An indium phosphide substrate having a main surface and an orientation flat, wherein a maximum value of deviation is less than 1/1000 of a length of a ridge line where the main surface is in contact with the orientation flat, when a plurality of measurement points are set at intervals of 2 mm from a start point to an end point at the ridge line, except for a length portion of 3 mm inward from both ends of the ridge line, and based on a reference line which is a straight line connecting the start point and the end point, a distance of each measurement point from the reference line is defined as the deviation of each measurement point.

Force measurement system is provided. It includes: a grinding arm and a stressed layer, the stressed layer being configured to bear a force from the grinding arm; a base and a plurality of elastic bodies, the elastic bodies being fixed between the stressed layer and the base; a deformation sensor, configured to detect deformation of the elastic bodies; and an analysis device, configured to obtain the force on the stressed layer according to a detection result of the deformation sensor and an elastic constant of the elastic body.

Force measurement system is provided. It includes: a grinding arm and a stressed layer, the stressed layer being configured to bear a force from the grinding arm; a base and a plurality of elastic bodies, the elastic bodies being fixed between the stressed layer and the base; a deformation sensor, configured to detect deformation of the elastic bodies; and an analysis device, configured to obtain the force on the stressed layer according to a detection result of the deformation sensor and an elastic constant of the elastic body.

Present disclosure provides chemical mechanical polishing (CMP) apparatus, including a counterface configured to support a semiconductor wafer at a first surface, a first electromagnet array under the first surface, a polishing head over the counterface and configured to hold the semiconductor wafer at a second surface, and a controller connects to the first electromagnet array. The first electromagnet array comprises a plurality of electromagnets, a polarity of each of the plurality of electromagnets is capable of being individually controlled by the controller. Present disclosure also provides a CMP slurry and a method for using a chemical mechanical polishing apparatus.

According to an aspect of the present invention, there is provided a polishing liquid containing abrasive grains, a hydroxy acid, a polyol, at least one zwitterionic compound selected from the group consisting of an aminocarboxylic acid and an aminosulfonic acid, and a liquid medium, in which a zeta potential of the abrasive grains is positive, an isoelectric point of the aminocarboxylic acid is smaller than 7.0, and pKa of the aminosulfonic acid is larger than 0.

According to an aspect of the present invention, there is provided a polishing liquid containing abrasive grains, a hydroxy acid, a polyol, at least one zwitterionic compound selected from the group consisting of an aminocarboxylic acid and an aminosulfonic acid, and a liquid medium, in which a zeta potential of the abrasive grains is positive, an isoelectric point of the aminocarboxylic acid is smaller than 7.0, and pKa of the aminosulfonic acid is larger than 0.

A silicon carbide substrate is a silicon carbide substrate including: a first main surface, a shape of the first main surface before the orientation flat is provided being a circle. An average value of LTVs of a plurality of first square regions of a plurality of square regions is less than or equal to 0.75 μm, the plurality of first square regions being disposed in a form of a ring on an outermost side with respect to the center of the circle so as to form an outermost periphery when the central region of the first main surface is divided into the plurality of square regions to provide a largest number of square regions, each of the square regions exactly forming a square having each side of 5 mm.

A golf club head includes a main body and a cover member. The main body is provided with a sole opening, and a receiving area therearound. The cover member integrally includes a crown cover and a sole cover. The sole cover has a peripheral edge portion on the receiving area. The sole portion is provided with a convexed or concaved shape-changing portion. The peripheral edge portion of the sole cover is located between the shape-changing portion and the back-side outer rim portion. The outer surface of the sole portion includes a first region on a side opposite of the shape-changing portion opposite to the back-side outer rim portion, and a second region on the same side of the shape-changing portion as the back-side outer rim portion. The second region includes a polished area formed from a part of the sole cover and a part of the main body.

A golf club head includes a main body and a cover member. The main body is provided with a sole opening, and a receiving area therearound. The cover member integrally includes a crown cover and a sole cover. The sole cover has a peripheral edge portion on the receiving area. The sole portion is provided with a convexed or concaved shape-changing portion. The peripheral edge portion of the sole cover is located between the shape-changing portion and the back-side outer rim portion. The outer surface of the sole portion includes a first region on a side opposite of the shape-changing portion opposite to the back-side outer rim portion, and a second region on the same side of the shape-changing portion as the back-side outer rim portion. The second region includes a polished area formed from a part of the sole cover and a part of the main body.