Disclosed are an organic light emitting display device improving opening ratio and a method of fabricating the same. The organic light emitting display device includes a light emitting device disposed at each sub-pixel of a substrate, a pixel circuit driving the light emitting device, a bank providing a first light emitting region at a remaining region except for a region where the pixel circuit is disposed, and a second light emitting region at the region where the pixel circuit is disposed, and a color filter disposed at the first and second light emitting regions, wherein at least one of electrodes included in the pixel circuit includes a transparent conductive layer at the second light emitting region.

A radio-frequency (RF) switch includes a field-effect transistor (FET) disposed between a first node and a second node, the FET having a source, a drain, a gate, and a body. The RF switch further includes a coupling circuit including a first path and a second path, the first path being connected between the gate and one of the source or the drain via a first resistor in series with a first capacitor, the second path being connected between the body and the one of the source or the drain via a second resistor in series with a second capacitor, the coupling circuit configured to allow discharge of interface charge from either or both of the gate and body.

An Integrated Circuit device, including: a first layer including first transistors; and a second layer including second transistors overlaying the first layer, where the first transistors are facing down and the second transistors are facing up, and where the second layer includes a through layer via of less than 300 nm diameter.

A method for creating electrically or thermally conductive vias in both vertical and horizontal orientations in a dielectric material has the steps of: (a) depositing a powder comprising metallic particles on a planar surface of a dielectric material having through or blind vias; (b) drying the deposited powder of metallic particles; (c) polishing the powder of metallic powders into the through or blind vias; (d) repeating steps (a)-(c) on a reverse side of the dielectric material; and (e) repeating steps (a)-(d) until no unfilled vias are detected.

An organic light emitting diode display including: a substrate; a plurality of first signal lines on the substrate extending in a first direction; a first insulating layer covering the substrate and the first signal lines; a plurality of auxiliary signal lines formed on the first insulating layer and overlapping the first signal lines; a second insulating layer covering the auxiliary signal lines; a plurality of first signal line connecting members formed on the second insulating layer while overlapping parts of the auxiliary signal lines; a plurality of second signal lines crossing the first signal lines; a plurality of switching transistors and a plurality of driving transistors connected with the first signal lines and the second signal lines; and a plurality of organic light emitting diodes electrically connected to the driving transistors, where the first signal line connecting members connect the first signal lines to the auxiliary signal lines.

The present application discloses a display device having a metal pattern on a substrate of a display device and a light absorbing layer positioned to absorb light reflected by the metal pattern, and a manufacturing method thereof. The light absorbing layer has a pattern corresponding to at least a portion of the metal pattern.

A display device in which light leakage in a monitor element portion is prevented without increasing the number of steps and cost is provided. The display device includes a monitor element for suppressing influence on a light-emitting element due to temperature change and change over time and a TFT for driving the monitor element, in which the TFT for driving the monitor element is provided so as not to overlap the monitor element. Furthermore, the display device includes a first light shielding film and a second light shielding film, in which the first light shielding film is provided so as to overlap a first electrode of the monitor element and the second light shielding film is electrically connect to the first light shielding film through a contact hole formed in an interlayer insulating film. The contact hole is formed so as to surround the outer edge of the first electrode of the monitor element.

An object of the invention is to provide a circuit technique which enables reduction in power consumption and high definition of a display device. A switch controlled by a start signal is provided to a gate electrode of a transistor, which is connected to a gate electrode of a bootstrap transistor. When the start signal is input, a potential is supplied to the gate electrode of the transistor through the switch, and the transistor is turned off. The transistor is turned off, so that leakage of a charge from the gate electrode of the bootstrap transistor can be prevented. Accordingly, time for storing a charge in the gate electrode of the bootstrap transistor can be shortened, and high-speed operation can be performed.

Embodiments of the present invention disclose an array substrate and a manufacturing method thereof, a display device, which relates to the display field, and can increase transmittance of the product, and also has improvement effect to defects such as crosstalk, flicker, etc. An embodiment of the present invention provides an array substrate, comprising: a substrate, a data line, a gate line, a thin film transistor and a pixel electrode formed on the substrate, the thin film transistor comprises a gate insulating layer, a part of the gate insulating layer corresponding to a light-transmissive area of a pixel is removed.

An array substrate, a method for manufacturing the same and a liquid crystal display device are provided. A metal oxide semiconductor layer and an etching stop layer are sequentially formed on a gate insulating layer. One patterning process is performed in the etching stop layer to form a source electrode contact region via hole, a drain electrode contact region via hole and an insulation region. A source-drain electrode layer is formed on the etching stop layer. During a process of performing one patterning process in the source-drain electrode layer to form a source-drain electrode pattern, a portion of the metal oxide semiconductor layer corresponding to the insulation region is removed so that the metal oxide semiconductor layer is disconnected at a position corresponding to the insulation region. The insulation region surrounds the source-drain electrode pattern.