A grinding apparatus includes a holding unit including a holding table having a holder for holding a workpiece and a grinding water suction part for drawing in grinding water outside of the holder, a rotational shaft having an end fixed centrally to a bottom surface of the holding table, a tubular rotary joint surrounding the rotational shaft, and a motor rotating the rotational shaft about its own axis. The rotational shaft has a first suction channel held in fluid communication with the holder of the holding table and a second suction channel held in fluid communication with the grinding water suction part. The rotary joint has a communication channel by which the first suction channel and the second suction channel are held in fluid communication with at least a suction source.

A process for recovery of all or some abrasive elements contained in an abrasive material in which the abrasive elements are dispersed in a resin with at least one phenolic hydroxyl group, the process including steps of: a) bringing the abrasive material into contact with an aqueous nitric solution (S.sub.1), whereby an aqueous nitric solution (S.sub.2) is obtained containing abrasive elements and residue derived from degradation of the resin; then (b) separating the abrasive elements from the aqueous nitric solution (S.sub.2) obtained after step (a). The use of abrasive elements thus recovered particularly to prepare agglomerated abrasives or coated abrasives.

A method for collecting an abrasive from an abrasive slurry which has been used for polishing an object including silicon as a main component includes: (i) adding a solvent to the abrasive slurry; (ii) dissolving particles of the polished object among components of the polished object contained in the abrasive slurry; and (iii) filtering the abrasive slurry to collect the abrasive, in which the steps (i) to (iii) are carried out without a pH adjuster to remove components of the polished object to collect the abrasive.

A method for collecting an abrasive from an abrasive slurry which has been used for polishing an object including silicon as a main component includes: (i) adding a solvent to the abrasive slurry; (ii) dissolving particles of the polished object among components of the polished object contained in the abrasive slurry; and (iii) filtering the abrasive slurry to collect the abrasive, in which the steps (i) to (iii) are carried out without a pH adjuster to remove components of the polished object to collect the abrasive.

This disclosure features methods of forming chemical compositions. The method includes (1) mixing a plurality of continuous material flows in a mixing tank to form a chemical composition, each continuous material flow including at least one component of the composition; and (2) moving a continuous flow of the chemical composition to a packaging station downstream of the mixing tank. The mixing and moving steps are performed continuously. This disclosure also features systems that can be used to perform such methods.

This disclosure features methods of forming chemical compositions. The method includes (1) mixing a plurality of continuous material flows in a mixing tank to form a chemical composition, each continuous material flow including at least one component of the composition; and (2) moving a continuous flow of the chemical composition to a packaging station downstream of the mixing tank. The mixing and moving steps are performed continuously. This disclosure also features systems that can be used to perform such methods.

A conditioner for filtering and drying recyclable abrasive media, such as steel grit, garnet, or other abrasive media used for abrasive blasting operations for steel structures, such as bridges, tanks, and marine vessels that are being repainted. The conditioner may include a pre-classifier (e.g., a trommel) to separate or filter the abrasive media from larger debris that may be vacuumed with the abrasive media during resurfacing operations. A dryer may use radiation elements (e.g., infrared (IR) lamps) positioned above a conveyor (e.g., vibration tray) that moves the abrasive media beneath the radiation elements. Vacuum airflow may bypass the dryer except for a portion of the vacuum airflow used to remove moisture from the dryer while drying the abrasive media. The conditioner may have a drying portion or the entirety under negative pressures.

A conditioner for filtering and drying recyclable abrasive media, such as steel grit, garnet, or other abrasive media used for abrasive blasting operations for steel structures, such as bridges, tanks, and marine vessels that are being repainted. The conditioner may include a pre-classifier (e.g., a trommel) to separate or filter the abrasive media from larger debris that may be vacuumed with the abrasive media during resurfacing operations. A dryer may use radiation elements (e.g., infrared (IR) lamps) positioned above a conveyor (e.g., vibration tray) that moves the abrasive media beneath the radiation elements. Vacuum airflow may bypass the dryer except for a portion of the vacuum airflow used to remove moisture from the dryer while drying the abrasive media. The conditioner may have a drying portion or the entirety under negative pressures.

When a polishing liquid is supplied while moving a polishing liquid supply head including a plurality of polishing liquid supply ports above a polishing pad, a uniformity of a polishing liquid supply range is improved. A polishing apparatus 1 includes a polishing table for supporting a polishing pad 100, a polishing head 30 for holding an object, and a polishing liquid supply device 40 for supplying a polishing liquid between the polishing pad 100 and the object. The polishing liquid supply device 40 includes a polishing liquid supply head 41 including a plurality of polishing liquid supply ports 414, a link mechanism 60 configured to move the polishing liquid supply head 41 along a polishing surface of the polishing pad 100, and a drive mechanism 90 configured to drive the link mechanism 60. The drive mechanism 90 is configured to drive the link mechanism 60 such that the plurality of polishing liquid supply ports 414 are arranged along a radial direction of the polishing pad 100 in a first state 450 where the polishing liquid supply head 41 is disposed to be opposed to a center side of the polishing pad 100 and the plurality of polishing liquid supply ports 414 are arranged along a radial direction of the polishing pad 100 in a second state 460 where the polishing liquid supply head 41 is disposed to be opposed to an outer edge side of the polishing pad 100 compared with the first state 450.

This disclosure features methods of forming chemical compositions. The method includes (1) mixing a plurality of continuous material flows in a mixing tank to form a chemical composition, each continuous material flow including at least one component of the composition; and (2) moving a continuous flow of the chemical composition to a packaging station downstream of the mixing tank. The mixing and moving steps are performed continuously. This disclosure also features systems that can be used to perform such methods.