A device for cleaning substrates. The device comprises a polymeric pad, a frame body, and a coupling member. The polymeric pad has a top surface and a bottom surface. At least a portion of the frame body extends between the top surface and the bottom surface of the polymeric paid. A coupling member extends upwards from at least a portion of the frame body.

A fixed abrasive article having a body including abrasive particles contained within a bond material, the abrasive particles including shaped abrasive particles or elongated abrasive particles having an aspect ratio of length:width of at least 1.1:1, each of the shaped abrasive particles or elongated abrasive particles having a predetermined position or a predetermined three-axis orientation, including a placement angle ranging from +90 degrees to −90 degrees and a rake angle ranging from +90 degrees to −90 degrees.

An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.

Provided is a polishing pad including a polishing surface having a zeta potential of +0.1 mV or more at a pH of 10.0. Preferably, a polishing pad including a polyurethane having a tertiary amine is provided. Further preferably, the polyurethane having a tertiary amine is a reaction product of a polyurethane reaction raw material containing at least a chain extender having a tertiary amine. A polishing method using the polishing pads is also provided, wherein the method is performed while supplying an alkaline polishing slurry.

Provided is a polishing pad including a polishing surface having a zeta potential of +0.1 mV or more at a pH of 10.0. Preferably, a polishing pad including a polyurethane having a tertiary amine is provided. Further preferably, the polyurethane having a tertiary amine is a reaction product of a polyurethane reaction raw material containing at least a chain extender having a tertiary amine. A polishing method using the polishing pads is also provided, wherein the method is performed while supplying an alkaline polishing slurry.

A roughing disc for machining material surfaces, which may have a disc-shaped main body having a tool side, which can face a tool, and a workpiece side, which can face a workpiece, the main body having a central opening through which an axis of rotation passes and which serves for direct or indirect attachment of a drive shaft of the tool, a disc-shaped backing layer disposed on the tool side, at least one abrasive layer, and a separating layer between adjacent layers. The backing layer may be made of a material mixture that is free of abrasive additives and that has at least one mineral additive.

The invention relates to an abrasive article 1 for abrading at least one workpiece, the abrasive article with: a carrier body 2, at least one abrasive layer 3 with a main surface and a predefined thickness, the at least one abrasive layer being arranged on the carrier body, at least two visual indicators 6 with a cross-section in the main surface of the abrasive layer, wherein the size, shape and/or location of the cross-section of the visual indicators in the main surface of the abrasive layer depends on the thickness of the abrasive layer at more than one location of the visual indicators.

The present disclosure relates to an abrasive article with a cork backing layer. In addition, the present disclosure relates to a method for producing abrasive articles comprising a cork backing layer.

The invention provides a porous polyurethane polishing pad that includes a porous matrix. The matrix has large pores that extend upward from a base surface and open to an upper surface. The large pores are interconnected with tertiary pores, a portion of the large pores is open to a top polishing surface and at least a portion of the large pores extend to the top polishing surface. Spring-arm sections connect lower and upper sections of the large pores. The spring-arm sections all are in a same horizontal direction as measured from the vertical orientation and they combine for increasing compressibility of the polishing pad and contact area of the top polishing surface during polishing.

An abrasive article comprising a first group including a plurality of shaped abrasive particles overlying a backing, wherein the plurality of shaped abrasive particles of the first group define a first non-shadowing distribution relative to each other.