A method of making precooked meat pieces using a hybrid cooking system comprises preheating meat pieces to a temperature of at least approximately 140 F. to create preheated meat pieces. The preheated meat pieces are transferred to an oven heated with an external heating source. The oven includes internal surfaces, and the external heating source assists in keeping the internal surfaces at a temperature below a smoke point of fat from the meat pieces. The preheated meat pieces are cooked in the oven to a water activity level of 0.92 or less to create precooked meat pieces. Optionally, flavoring could be applied to the precooked meat pieces after the precooked meat pieces have been removed from the oven and before the precooked meat pieces have cooled.

A method of making precooked meat pieces using a hybrid cooking system comprises preheating meat pieces to a temperature of at least approximately 140 F. to create preheated meat pieces. The preheated meat pieces are transferred to an oven heated with an external heating source. The oven includes internal surfaces, and the external heating source assists in keeping the internal surfaces at a temperature below a smoke point of fat from the meat pieces. The preheated meat pieces are cooked in the oven to a water activity level of 0.92 or less to create precooked meat pieces. Optionally, flavoring could be applied to the precooked meat pieces after the precooked meat pieces have been removed from the oven and before the precooked meat pieces have cooled.

An oven comprising a housing, a cook cavity located within the housing, wherein the housing includes an opening to the cook cavity and the cook cavity is configured to receive a food item through the opening, an oven door for covering the opening, a heating element configured to heat an air within the cook cavity, an active vent interconnecting the cook cavity and an outside of the housing, and a controller operatively coupled to the active vent and the heating element is disclosed. The controller is configured to perform the steps of (a) turning on the heating element to initiate a cooking cycle, (b) keeping the active vent closed during an initial stage of the cooking cycle, (c) after the initial stage of the cooking cycle, opening the active vent, and (d) keeping the active vent open during at least a portion of a remainder of the cooking cycle.

Known devices for heat treatment comprise a process space surrounded by a furnace lining made of quartz glass, a heating facility, and a reflector. In order to provide, on this basis, a device for heat treatment having a furnace lining that can be manufactured easily and in variable shapes and enables rapid heating and cooling of the material to be heated and short process times and is characterized by its long service life, the invention proposes that the furnace lining comprises multiple wall elements having a side facing the process space and a side facing away from the process space, and that at least one of the wall elements comprises multiple quartz glass tubes that are connected to each other by means of an SiO.sub.2-containing connecting mass.

Embodiments described herein generally relate to an improved power distribution assembly for a lamphead assembly used in a thermal processing chamber. In one embodiment, the lamphead assembly includes a plurality of lamps for thermal processing of semiconductor substrates, and a power distribution assembly having a plurality of openings, the power distribution assembly provides power to the plurality of lamps, and each opening is sized to allow passage of the lamp therethough.

A photodetector element for receiving radiated light from a surface of a semiconductor wafer loses a detection function because the intensity of the received light exceeds a detection limit while a flash lamp emits light. Measurement is not performed during the above-mentioned period, and the intensity of the radiated light from the surface of the semiconductor wafer is measured after the flash lamp stops emitting light and the photodetector element restores the detection function. Then, the temperature of the surface of the semiconductor wafer heated by irradiation with a flash of light is calculated based on the measured intensity of the radiated light. Accordingly, even in a case where intense irradiation is performed in an extremely short period of time, such as flash irradiation, the flash of light does not act as ambient light, which enables to obtain the surface temperature of the semiconductor wafer.

Embodiments described herein generally relate to apparatus for processing substrates. The apparatus generally include a process chamber including a lamp housing containing lamps positioned adjacent to an optically transparent window. Lamps within the lamp housing provide radiant energy to a substrate positioned on the substrate support. Temperature control of the optically transparent window is facilitated using cooling channels within the lamp housing. The lamp housing is thermally coupled to the optically transparent window using compliant conductors. The compliant conductors maintain a uniform conduction length irrespective of machining tolerances of the optically transparent window and the lamp housing. The uniform conduction length promotes accurate temperature control. Because the length of the compliant conductors is uniform irrespective of machining tolerances of chamber components, the conduction length is the same for different process chambers. Thus, temperature control amongst multiple process chambers is uniform, reducing chamber-to-chamber variation.

An infrared heater appliance with airtight chamber, includes a bulb housed in a shell (2) constituted by a cap (3) and a closure lid (4), wherein a safety valve (10) is provided, mounted on the cap (3), suitable for discharging externally the overpressure that may be caused in the airtight chamber due to the heat generated by the infrared bulb.

A matchbox oven is disclosed. The matchbox oven includes a housing having a cavity and first and second openings. A surface is movable only in a single axis and a single plane, a first portion of the surface is located substantially within the cavity when a second portion of the surface is located substantially outside the cavity, and the first portion of the surface is located substantially outside the cavity when the second portion of the surface is located substantially within the cavity. A plurality of stoppers are attached onto the surface, wherein two of the stoppers substantially block the first and second openings when one of the first and second portions of the surface is located within the cavity.

A matchbox oven is disclosed. The matchbox oven includes a housing having a cavity and first and second openings. A surface is movable only in a single axis and a single plane, a first portion of the surface is located substantially within the cavity when a second portion of the surface is located substantially outside the cavity, and the first portion of the surface is located substantially outside the cavity when the second portion of the surface is located substantially within the cavity. A plurality of stoppers are attached onto the surface, wherein two of the stoppers substantially block the first and second openings when one of the first and second portions of the surface is located within the cavity.