Bonded die structures and methods of fabricating bonded die structures including improved positioning of the dies used to form the structures. Improved positioning may be achieved by providing non-linear alignment features around the periphery of the dies that may facilitate accurate positioning of the dies with respect to one or more alignment marks on the target structures on which the dies are placed. The non-linear alignment features may include features formed in the peripheral edges of the dies, such as indent portions extending inwardly from the peripheral edges of the dies and/or outward bulge portions extending outwardly from the peripheral edges of the dies. Alternatively, or in addition, the non-linear alignment features may be features formed in a seal ring structure of the dies. The non-linear alignment features may improve the accuracy of the positioning of the dies relative to alignment mark(s) on the target structures using optical detection systems.

Methods to fabricate a semiconductor device, the method including: forming a first level, the first level including a single crystal silicon layer, a plurality of transistors, and a plurality of first metal layers, where each transistor of the plurality of transistors includes a single crystal channel, and where the plurality of first metal layers include interconnections between the transistors of the plurality of transistors; thinning the single crystal silicon layer to a thickness of less than two microns; forming a second level, the second level including a plurality of second metal layers, where the second level is disposed underneath the first level; and forming a connection path between at least one of the transistors to at least one of the plurality of second metal layers, where the connective path includes at least one via disposed through at least the single crystal silicon layer.

A method of manufacturing a semiconductor device includes cutting a substrate structure along a scribe lane to separate a plurality of semiconductor devices from the substrate structure. The substrate structure includes a plurality of device regions and the scribe lane separates the plurality of device regions. Each of the plurality of device regions includes a first side and a second side opposite the first side. Each of the plurality of device regions includes bonding pads arranged along the first side, and bonding pads are absent on a region adjacent to the second side. The plurality of device regions are arranged such that the first side and the second side of adjacent device regions face each other and the scribe lane is therebetween in the substrate structure. The substrate structure further includes metal patterns arranged closer to the second side than to the first side in the scribe lane.

A wafer-to-wafer bonding structure includes a first wafer having a first bonding layer thereon, a first main pattern region, a first scribe lane surrounding the first main pattern region, and a first alignment cavity disposed in the first bonding layer within the first main pattern region; and a second wafer having a second bonding layer bonded to the first bonding layer, a second main pattern region, a second scribe lane surrounding the second main pattern region, and a second alignment cavity disposed in the second bonding layer within the second main pattern region.

The invention concerns a method of manufacturing an assembly of electronic components on a front surface of a semiconductor substrate comprising a plurality of field areas, each field area comprising at least one field and each field comprising at least one electronic component, the method comprising a plurality of photolithography steps to form a stack of layers forming each electronic component, each photolithography step defining a mask level and comprising the application of a mask successively on each field in photolithography equipment, the positioning of said mask on each field being performed relative to a reference mask level, one of the masks being designated as identification mask. The manufacturing method is remarkable in that: at the photolithography step defining a mask level associated with the identification mask, said mask is positioned with a predetermined offset with respect to the reference mask level, the offset being different for each field area, the electronic component(s) of a field area have an identification element appearing as a predetermined offset between a pattern defined at the reference mask level and a pattern defined at the identification mask level.

A semiconductor device includes channel region, first and second two-dimensional metallic contacts, a gate structure, and first and second metal contacts. The channel region includes a two-dimensional semiconductor material. The first two-dimensional metallic contact is disposed at a side of the channel region and includes a two-dimensional metallic material. The second two-dimensional metallic contact is disposed at an opposite side of the channel region and includes the two-dimensional metallic material. The gate structure is disposed on the channel region in between the first and second two-dimensional metallic contacts. The first metal contact is disposed at an opposite side of the first two-dimensional metallic contact with respect to the channel region. The second metal contact is disposed at an opposite side of the second two-dimensional metallic contact with respect to the channel region. The first and second two-dimensional metallic contacts contact sideways the channel region to form lateral semiconductor-metallic junctions.

An integrated circuit (IC) chip is provided. In one aspect, a semiconductor substrate includes active devices at its front surface and power delivery tracks on its back surface. The active devices are powered through mutually parallel buried power rails, with the power delivery tracks running transversely with respect to the power rails, and connected to the power rails by a plurality of Through Semiconductor Via connections, which run from the power rails to the back of the substrate. The TSVs are elongate slit-shaped TSVs aligned to the power rails and arranged in a staggered pattern, so that any one of the power delivery tracks is connected to a first row of mutually parallel TSVs, and any power delivery track directly adjacent to the power delivery track is connected to another row of TSVs which are staggered relative to the TSVs of the first row. A method of producing an IC chip includes producing the slit-shaped TSVs before the buried power rails.

In an embodiment, a method includes: placing a wafer on an implanter platen, the wafer including alignment marks; measuring a position of the wafer by measuring positions of the alignment marks with one or more cameras; determining an angular displacement between the position of the wafer and a reference position of the wafer; and rotating the implanter platen by the angular displacement.

A printed circuit board includes a substrate base; a plurality of ball lands arranged on a surface of the substrate base; a cutting position identification mark disposed on a corner of the surface of the substrate base; and at least one alignment mark disposed on the surface of the substrate base to be spaced apart from the ball lands and exposed to the outside, wherein top surfaces of the ball lands and a top surface of the at least one alignment mark are at substantially the same vertical level and the ball lands and the at least one alignment mark include the same material.

A method for fabricating an integrated circuit structure is provided. The method includes forming an epitaxial stack over a semiconductor substrate, wherein the epitaxial stack comprises a plurality of first epitaxial layers and a plurality of second epitaxial layers alternately arranged over the semiconductor substrate; patterning the epitaxial stack into a first fin and a second fin, wherein from a top view the first fin extends along a first direction, and the second fin has a first fin line extending along the first direction and a second fin line extending along a second direction different from the first direction; forming a first gate structure over a first portion of the first fin; etching a recess in a second portion of the first fin adjacent the first portion of the first fin; and forming a source/drain feature in the recess.