A semiconductor die stack includes a first semiconductor die having a first lattice direction, and a second semiconductor die bonded to the first semiconductor die and having a second lattice direction different than the first lattice direction.

A bonded structure is disclosed. The bonded structure can comprise a first semiconductor element having a first contact pad. An interposer can include a second contact pad on a first side of the interposer and a third contact pad and a fourth contact pad on a second side of the interposer opposite the first side, the second contact pad bonded to the first contact pad; a second semiconductor element having a fifth contact pad bonded to the third contact pad and a sixth contact pad bonded to the fourth contact pad. A switching circuitry can be configured to switch between a first electrical connection between the second and third contact pads and a second electrical connection between the second and fourth contact pads.

A memory device is provided. The memory device includes a first structure and a second structure stacked on the first structure in a vertical direction. The first structure includes a first substrate, peripheral circuitry, an auxiliary memory cell array, a first insulating layer, and a plurality of first bonding pads. The second structure includes a second substrate, a main memory cell array, a second insulating layer, and a plurality of second bonding pads. The plurality of first bonding pads are in contact with the plurality of second bonding pads, respectively.

In some aspects, the disclosed technology provides microelectronic devices which can effectively dissipate heat and methods of forming the disclosed microelectronic devices. In some embodiments, a disclosed device may include a first integrated device die. The disclosed device may further include a thermoelectric element bonded to the first integrated device die. The disclosed device may further include a heat sink disposed over at least the thermoelectric element. The thermoelectric element may be configured to transfer heat from the first integrated device die to the heat sink. The thermoelectric element directly may be bonded to the first integrated device die without an adhesive.

A die alignment method includes vertically aligning a first die comprising first magnetic patterns and a second die comprising second magnetic patterns with each other using magnetic force between the first magnetic patterns and the second magnetic patterns. Each of the first magnetic patterns and the second magnetic patterns comprises a horizontally magnetically anisotropic material. The first magnetic patterns and the second magnetic patterns do not vertically overlap each other when the first die and the second die are vertically aligned with each other.

An interposer, and integrated circuit including an interposer, has a lower surface adapted for bump mounting and an upper surface adapted for copper bonding. An interposer layer includes active interposers and passive interposers. Bridges connect interposers in the interposer layer to produce a functionally large interposer from smaller interposer dies. A core may overlap more than one interposer in the interposer layer. Active interposers are disposed around the edge of the core with passive interposers beneath the core to facilitate heat dissipation.

A device package includes a first die comprising a semiconductor substrate; an isolation layer on the semiconductor substrate, wherein the isolation layer is a first dielectric material; a first dummy via penetrating through the isolation layer and into the semiconductor substrate; a bonding layer on the isolation layer, wherein the bonding layer is a second dielectric material that has a smaller thermal conductivity than the first dielectric material; a first dummy pad within the bonding layer and on the first dummy via; a dummy die directly bonded to the bonding layer; a second die directly bonded to the bonding layer and to the first dummy pad; and a metal gap-fill material between the dummy die and the second die.

A semiconductor device is provided. The semiconductor device comprises a semiconductor die comprising a semiconductor substrate and a plurality of transistors arranged at a front side of the semiconductor substrate. Further, the semiconductor die comprises a first electrically conductive structure extending from the front side of the semiconductor substrate to a backside of the semiconductor substrate and a second electrically conductive structure extending from the front side of the semiconductor substrate to the backside of the semiconductor substrate. The semiconductor device further comprises an interposer directly attached to the backside of the semiconductor substrate. The interposer comprises a first trace electrically connected to the first electrically conductive structure of the semiconductor die. Further the interposer comprises the first trace or a second trace electrically connected to the second electrically conductive structure of the semiconductor die.

Disclosed are an alignment mark used for aligning a first semiconductor wafer and a second semiconductor wafer in a wafer bonding process in which the first semiconductor wafer and a flipped second semiconductor wafer are aligned and bonded such that the surfaces on which semiconductor elements are formed face each other, and to a wafer bonding method using the same. The alignment mark includes a first alignment mark formed in a predetermined region of the first semiconductor wafer and having a first center of symmetry and a second alignment mark formed in a predetermined region of the second semiconductor wafer and having a second center of symmetry, the second alignment mark being configured to overlap the first alignment mark in a flipped state when the first semiconductor wafer and the flipped second semiconductor wafer are bonded.

Multi-die composite packages including directly bonded IC die and at least one electro-thermo-mechanical die (ETMD). An ETMD is distinguished from an active IC die as an ETMD is a passive die lacking any semiconductor devices, such as transistors. In exemplary embodiments, an ETMD includes a substrate, which may be a crystalline semiconductor material, for example, and one or more through substrate vias (TSVs) passing through a thickness of the substrate. The TSVs may enable a ETMD to electrically interconnect an (active) IC die of a composite package to another IC die of the package or to a package host.