The present invention relates to: a method of manufacturing glass with hollow nanopillars, which includes a silicon oxide layer forming step in which a silicon oxide layer made of silicon oxide is formed on one side of a glass substrate, a first etching step in which the silicon oxide layer is etched and a plurality of silicon oxide clusters are formed on the glass substrate, and a second etching step in which the glass substrate, on which the silicon oxide clusters are formed, is etched and hollow nanopillars are formed; and glass with hollow nanopillars manufactured thereby.

Described herein are an SiC material and a method for manufacturing same. The SiC material includes an SiC layer having a low thermal conductivity region formed in at least a portion thereof, wherein the low thermal conductivity region has an average crystal grain size of 3.5 μm or less and (111) plane preferential growth according to X-ray diffraction analysis.

A method for manufacturing an electromechanical actuator includes providing a primary stack of layers comprising a monocrystalline layer, providing a secondary stack of layers, and forming, in the etching layer, at least three pads. The method further includes encapsulating the three pads by a first encapsulation layer, assembling the primary stack of layers with the secondary stack of layers, removing the first substrate, and forming a movable electrode in the monocrystalline layer.

A process for manufacturing custom optically active quantum-particle cells includes forming a pre-customization assembly and then, in response to receipt of specifications for quantum-particle cells, performing a customization subprocess on the pre-customization assembly to yield custom quantum-particle cells, e.g., vapor cells, vacuum cells, micro-channel cells containing alkali metal or alkaline-earth metal ions or neutral atoms. The customization can include for metasurface structures on cell walls, e.g., to serve as anti-reflection coatings, lenses, etc., and introducing quantum particles (e.g., alkali metal atoms). A cover can be bonded to hermetically seal the assembly, which can then be diced to yield plural separated custom optically active quantum-particle cells.

Disclosed are devices, systems, and methods for fabrication of moving, actuatable structures at micron scales that can be electronically controlled using low power and low voltages. Also disclosed are microscale robots having such microscale actuator structures to actuate the robots’ movements as well as devices, systems, and methods for fabrication of microscale robots. The disclosed methods of fabrication are compatible with standard semiconductor technologies.

A particle size reducing method using a ball mill, a vortexer, a Taylor-Couette flow-inducing device (TCFID), a homogenizer, and a dryer. A feedstock with a first particle size is provided to the processing system. In the ball mill, the particle size of the feedstock is reduced to a second particle size. The feedstock is mixed with a carrier fluid to create a working fluid, wherein particles of the feedstock are suspended within the carrier fluid. The particle size is reduced to a third particle size in the vortexer, producing a second reduced working fluid. The third particle size is reduced with the TCFID to a fourth particle size, producing a third reduced working fluid. Using the homogenizer, the distribution of particles in the third reduced working fluid is normalized. In the dryer, the carrier fluid of the working fluid is separated from the particles to produce a granular material.

Provided are a composite in which metal nanoparticles are evenly dispersed and adsorbed to pores of a support, and a method of preparing the same. An amorphous nanostructure formed of inorganic polymers having a transition metal and a halogen element as a main chain via hydrogen bonding is used as a chemical template for forming the metal nanoparticles. The formed metal nanoparticles are evenly dispersed and adsorbed to the support with pores.

Nanoassembly methods for producing quasi-3D plasmonic films with periodic nanoarrays of nano-sized surface features. A sacrificial layer is deposited on a surface of a donor substrate having periodic nanoarrays of nanopattern features formed thereon. A plasmon film is deposited onto the sacrificial layer and a dielectric spacer is deposited on the plasmon film. The donor substrate having the sacrificial layer, plasmon film, and dielectric spacer thereon is immersed in a bath of etchant to selectively remove the sacrificial layer such that the plasmon film and the dielectric spacer thereon adhere to the surface of the donor substrate. The dielectric spacer and the plasmon film are mechanically separated from the donor substrate to define a quasi-three dimensional (3D) plasmonic film having periodic nanoarrays of nano-sized surface features defined by the nanopattern features of the donor substrate surface. The quasi-3D plasmonic film is then applied to a receiver substrate.

Methods are disclosed for producing core-shell particles having a uniform size using a microwave plasma process. More particularly, methods of the present technology are used to manufacture core-shell particles having a core at least partially surrounded by a shell. The core and shell of the core-shell particles are chemically distinct. Methods of the present technology occur within a plasma chamber of a microwave plasma reactor and a microwave formed plasma is utilized to vaporize core precursor material.

An anti-reflective article includes a substrate including a surface and a bulk, and an arrangement of anti-reflective nanostructures along the surface of the substrate, each anti-reflective nanostructure of the arrangement of anti-reflective nanostructures being supported by the bulk of the substrate, each anti-reflective nanostructure of the arrangement of anti-reflective nanostructure tapering from the bulk of the substrate to define a respective peak. At least some of the anti-reflective nanostructures of the arrangement of anti-reflective nanostructures are linked with an adjacent anti-reflective nanostructure of the arrangement of anti-reflective nanostructures via a respective interconnection. The respective interconnections are in addition to the bulk of the substrate supporting the anti-reflective nanostructures. The respective interconnections are disposed at or above a midpoint between the peaks of the anti-reflective nanostructures and the bulk of the substrate.