A strengthened glass article (100), such as a substrate for a p-Si based transistors, includes first and second glass cladding layers (104, 106) and a glass core layer (102) disposed therebetween. A coefficient of thermal expansion [CTE] of each cladding layer (104, 106), which can be made of the same glass, is at least 1×10.sup.−7° C..sup.−1 less than that of the core layer (102). Each of the core and cladding layers has a strain point less than 700° C. A compaction of the glass article (100) is at most about 20 ppm [see FIG. 1]. A method includes forming a glass article and/or heating a glass article to a first temperature of at least about 400° C. The glass article has a glass core layer (102) and a glass cladding layer (104, 106) adjacent to the core layer. The glass article is maintained at a temperature within a range of from 400° C. to 600° C. for a holding period from 30 to 90 minutes and subsequently cooled to a temperature of at most 50° C. over a cooling period from 30 seconds to 5 minutes. The glass article (100) for heat strengthening may have been produced by the fusion overflow down draw process, e.g. as depicted in FIG. 3.

Provided is a silica glass member which exhibits high optical transparency to vacuum ultraviolet light and has a low thermal expansion coefficient of 4.0−10.sup.−7/K or less at near room temperature, particularly a silica glass member which is suitable as a photomask substrate to be used in a double patterning exposure process using an ArF excimer laser (193 nm) as a light source. The silica glass member is used in a photolithography process using a vacuum ultraviolet light source, in which the fluorine concentration is 1 wt % or more and 5 wt % or less, and the thermal expansion coefficient at from 20° C. to 50° C. is 4.0×10.sup.−7/K or less.

An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×10.sup.16 to 1.0×10.sup.18 molecules/cm.sup.3, an SiH group content of less than 2×10.sup.17 molecules/cm.sup.3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×10.sup.9 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm.sup.2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M.sub.193 nm when measured using the applied wavelength of 193 nm and a second measured value M.sub.633 nm when measured using a measured wavelength of 633 nm. The ratio M.sub.193 nm/M.sub.633 nm is less than 1.7.

An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×10.sup.16 to 1.0×10.sup.18 molecules/cm.sup.3, an SiH group content of less than 2×10.sup.17 molecules/cm.sup.3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×10.sup.9 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm.sup.2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M.sub.193 nm when measured using the applied wavelength of 193 nm and a second measured value M.sub.633 nm when measured using a measured wavelength of 633 nm. The ratio M.sub.193 nm/M.sub.633 nm is less than 1.7.

The present invention relates to an oven system 7 for heating laminated glass panes 1, having at least one oven module 8, wherein the laminated glass panes are able to be transported in a horizontal orientation on transport rollers 10 through the oven system 7, and the oven system 7 has an outer box-shaped housing 9, wherein radiation heat sources and convection heat sources are disposed in the housing 9, characterized in that the convection heat sources are configured as elongate tubular nozzles having punctiform outflow openings which are disposed so as to be oriented transversely to the transport direction, wherein in a heat radiator 11 is disposed between two adjacently disposed tubular nozzles 12, and in that a central blower box which supplies the tubular nozzles 12 with heated air is disposed on an end face.

The present invention relates to an oven system 7 for heating laminated glass panes 1, having at least one oven module 8, wherein the laminated glass panes are able to be transported in a horizontal orientation on transport rollers 10 through the oven system 7, and the oven system 7 has an outer box-shaped housing 9, wherein radiation heat sources and convection heat sources are disposed in the housing 9, characterized in that the convection heat sources are configured as elongate tubular nozzles having punctiform outflow openings which are disposed so as to be oriented transversely to the transport direction, wherein in a heat radiator 11 is disposed between two adjacently disposed tubular nozzles 12, and in that a central blower box which supplies the tubular nozzles 12 with heated air is disposed on an end face.

A method for manufacturing an SiO.sub.2—TiO.sub.2 based glass upon a target by a direct method, includes a first process of preheating the target and a second process of growing an SiO.sub.2—TiO.sub.2 based glass ingot to a predetermined length upon the target which has been preheated, wherein the target is heated in the first process such that, in the second process, the temperature of growing surface of the glass ingot is maintained at or above a predetermined lower limit temperature.

A solid state method of producing inorganic nanoparticles using glass is disclosed. The nanoparticles may not be formed until the glass is reacted with or degraded by contact with a fluid in vivo or in vitro.

The invention relates to a blank for producing a dental molded part such as an inlay, onlay, crown or bridge, and to a method for producing the blank. To be able to machine a dental molded part, in particular one having thin wall thicknesses, from the blank without difficulty, the blank is designed to consist of a glass ceramic having a density of between 30 and 60% of theoretical density, and of glass-ceramic powder particles with a particle size distribution d.sub.90≦80 μm, lithium silicate crystals being present in an amount of 10 to 90% by volume.

The invention relates to a blank for producing a dental molded part such as an inlay, onlay, crown or bridge, and to a method for producing the blank. To be able to machine a dental molded part, in particular one having thin wall thicknesses, from the blank without difficulty, the blank is designed to consist of a glass ceramic having a density of between 30 and 60% of theoretical density, and of glass-ceramic powder particles with a particle size distribution d.sub.90≦80 μm, lithium silicate crystals being present in an amount of 10 to 90% by volume.