C03C23/00

Method for engineered cellular magmatic mesoporous compounds and articles thereof

Methods for engineered mesoporous cellular magmatics and articles thereof are disclosed. For example, the magmatics may include a mixture of substance that, when exposed to heat for a length of time, form a foamed mass. The foamed mass may be exposed to a solution configured to cause mineralization upon and within the articles.

Ion exchanged glasses via non-error function compressive stress profiles

Glasses with compressive stress profiles that allow higher surface compression and deeper depth of layer (DOL) than is allowable in glasses with stress profiles that follow the complementary error function at a given level of stored tension. In some instances, a buried layer or local maximum of increased compression, which can alter the direction of cracking systems, is present within the depth of layer. Theses compressive stress profiles are achieved by a three step process that includes a first ion exchange step to create compressive stress and depth of layer that follows the complimentary error function, a heat treatment at a temperature below the strain point of the glass to partially relax the stresses in the glass and diffuse larger alkali ions to a greater depth, and a re-ion-exchange at short times to re-establish high compressive stress at the surface.

FUSION-FORMABLE GLASS-BASED ARTICLES INCLUDING A METAL OXIDE CONCENTRATION GRADIENT

A glass-based article including a first surface and a second surface opposing the first surface defining a thickness (t) of about 3 millimeters or less (e.g., about 1 millimeter or less), and a stress profile, wherein all points of the stress profile between a thickness range from about 0.Math.t up to 0.3.Math.t and from greater than about 0.7.Math.t to t, comprise a tangent with a slope having an absolute value greater than about 0.1 MPa/micrometer. In some embodiments, the glass-based article includes a non-zero metal oxide concentration that varies along at least a portion of the thickness (e.g., 0.Math.t to about 0.3.Math.t) and a maximum central tension of less than about 71.5/√(t) (MPa). In some embodiments, the concentration of metal oxide or alkali metal oxide decreases from the first surface to a point between the first surface and the second surface and increases from the point to the second surface. The concentration of the metal oxide may be about 0.05 mol % or greater or about 0.5 mol % or greater throughout the thickness. Methods for forming such glass-based articles are also disclosed.

GLASS-BASED ARTICLES HAVING CRACK RESISTANT STRESS PROFILES

Glass-based articles are disclosed having a thickness in a range of from about 0.2 mm to about 4.0 mm, a first compressive stress layer extending from a first surface of the glass-based article to a first depth of compression that is in a range of from about 5% to about 20% of the thickness, a second compressive stress layer extending from a second surface of the glass-based article to a second depth of compression that is in a range of from about 5% to about 20% of the thickness, wherein the second surface is opposite the first surface, and a central region extending from the first depth of compression to the second depth of compression and having a maximum tensile stress in a range of from about 0.5 MPa to about 20 MPa. Electronic devices comprising the glass-based articles and methods of making glass-based articles are also disclosed.

MANUFACTURING METHOD OF GLASS PLATE HAVING HOLES, AND GLASS PLATE
20230095132 · 2023-03-30 · ·

A manufacturing method of a glass plate having holes, includes: (1) having a first surface of a glass base material irradiated with a laser, to form initial holes each having a first initial opening, wherein each initial hole is an initial through hole or non-through hole, wherein the first initial opening has a maximum dimension φ.sub.1S of 5 μm or greater, and wherein in each initial hole, denoting a depth as d.sub.1, an aspect ratio (d.sub.1/φ.sub.1S) is 15 or greater; and (2) etching the glass base material with an alkaline solution, to form processed holes from the initial holes, wherein each processed hole has a first opening on the first surface, and wherein the first opening has a diameter φ.sub.1 defined as an average of diameters of circumscribed and inscribed circles of the first opening, and a roundness P.sub.1, and a ratio P.sub.1/φ.sub.1 is 10% or less.

GLASS FORM AND MARKING

A system for forming a glass panel includes a mixing apparatus for weighing and mixing glass particles and additives, an oven for melting and holding molten glass, a float chamber for floating molten glass thereover, an annealing lehr, and at least a nozzle for delivering compressed air at least of one of a first pressure and a second pressure.

GLASS FORM AND MARKING

A system for forming a glass panel includes a mixing apparatus for weighing and mixing glass particles and additives, an oven for melting and holding molten glass, a float chamber for floating molten glass thereover, an annealing lehr, and at least a nozzle for delivering compressed air at least of one of a first pressure and a second pressure.

INORGANIC COMPOSITION AND ITS PRODUCING METHOD
20230032923 · 2023-02-02 ·

Provided is an inorganic composition having excellent mechanical strength and the like.

Disclosed is an inorganic composition and the like, wherein the flexural strength of the inorganic composition is 300 MPa or greater, and the fluorescence intensity based on JIS K 0120, is 3,000 RFU or less.

FLEXIBLE AND TUNABLE INFRARED EMISSIVITY MATERIAL PLATFORM

A material platform with controllable emissivity and fabrication methods are provided that permit the manipulation of thermal radiation detection and IR signal modulation and can be adapted to a variety of uses including infrared camouflage, thermal IR decoys, thermo-reflectance imaging and IR signal modulation. The platform is a multilayer W.sub.xV.sub.1-xO.sub.2 film with different W doping levels (x values) and layer thicknesses, forming a graded W-doped construct. In WVO.sub.2 films with a total thickness <100 nm, the graded doping of W spreads the originally sharp metal-insulator phase transition (MIT) to a broad temperature range, greatly expanding the temperature window for emissivity modulation.

SYSTEMS FOR AND METHODS OF FORMING MICRO-HOLES IN GLASS-BASED OBJECTS USING AN ANNULAR VORTEX LASER BEAM

The systems and methods disclosed herein utilize a beam-forming system configured to convert a Gaussian laser beam into an annular vortex laser beam having a relatively large depth of focus, which enables the processing of thick or stacked glass-based objects annular laser beam is defined in part by a topological charge m that defines an amount of rotation of the annular vortex beam around its central axis as it propagates annular vortex beam is used to form micro-holes in a glass-based object using either a one-step or a two-step method micro-holes formed by either process can be in the form of recesses or through-holes, depending on the application size of the micro-holes can be controlled by controlling the size of the annular vortex beam over the depth of focus range.