A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.

A material for lithography containing a tellurium-containing compound or a tellurium-containing resin, a production method therefor, a composition for lithography, a pattern formation method, a compound, a resin, and a method for purifying the compound or the resin are provided. The compounds and materials can provide for high solubility in a safe solvent.

The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

The present invention provides an optical component forming composition comprising a tellurium-containing compound or a tellurium-containing resin.

The present invention involves a radical polymerization initiator comprising an organotellurium compound represented by a formula (1), wherein R.sup.1 represents an alkyl group or the like, each of R.sup.2 and R.sup.3 independently represents a hydrogen atom or the like, and each of R.sup.4, R.sup.5, and R.sup.6 independently represents a hydrogen atom or the like. The present invention provides: a radical polymerization initiator that is useful for producing a polymer that includes a double bond at the molecular terminal; and a method for producing a polymer that utilizes the radical polymerization initiator. ##STR00001##

The present invention involves a radical polymerization initiator comprising an organotellurium compound represented by a formula (1), wherein R.sup.1 represents an alkyl group or the like, each of R.sup.2 and R.sup.3 independently represents a hydrogen atom or the like, and each of R.sup.4, R.sup.5, and R.sup.6 independently represents a hydrogen atom or the like. The present invention provides: a radical polymerization initiator that is useful for producing a polymer that includes a double bond at the molecular terminal; and a method for producing a polymer that utilizes the radical polymerization initiator. ##STR00001##

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

New Te-salt compounds, including photoactive tellurium compounds useful for Extreme Ultraviolet Lithography.

An organic tellurium compound is disclosed having a versatility that, when used as a living radical polymerization initiator, it is applicable to polymerization of a vinyl monomer in an aqueous vehicle without using any surfactant or dispersant. The organic tellurium compound is represented by a general formula (1),

##STR00001##

where R.sup.1 and R.sup.2 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, A represents an alkali metal atom or an alkaline earth metal atom, x=1 when A is monovalent, x= when A is divalent, and R.sup.3 is represented by a general formula (2),

##STR00002##

where in the general formula (2) R.sup.4 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R.sup.5 and R.sup.6 each independently represent an alkylene group having 2 to 8 carbon atoms, and a represents an integer from 0 to 10.

An organic tellurium compound is disclosed having a versatility that, when used as a living radical polymerization initiator, it is applicable to polymerization of a vinyl monomer in an aqueous vehicle without using any surfactant or dispersant. The organic tellurium compound is represented by a general formula (1),

##STR00001##

where R.sup.1 and R.sup.2 each independently represent a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, A represents an alkali metal atom or an alkaline earth metal atom, x=1 when A is monovalent, x= when A is divalent, and R.sup.3 is represented by a general formula (2),

##STR00002##

where in the general formula (2) R.sup.4 represents a hydrogen atom or an alkyl group having 1 to 8 carbon atoms, R.sup.5 and R.sup.6 each independently represent an alkylene group having 2 to 8 carbon atoms, and a represents an integer from 0 to 10.