Patent classifications
C07C2604/00
Fullerene derivative, fluororesin composition, and lubricant
A fullerene derivative of the present invention has a fullerene skeleton and a plurality of perfluoropolyether chains in a molecule, wherein the perfluoropolyether chains are bonded to the fullerene skeleton via methano groups, and a lubricant and fluororesin composition of the present invention contain the derivative.
Process of manufacturing an electron transport material
A process of dissolving ##STR00001##
in a solvent to produce a first mixture. To the first mixture a reagent is added to produce a second mixture. A HNRR is then added to the second mixture to produce a third mixture. The third mixture is then refluxed to produce ##STR00002##
CARBON ALLOTROPES
A nanoparticle or agglomerate which contains connected multi-walled spherical fullerenes coated in layers of graphite. In different embodiments, the nanoparticles and agglomerates have different combinations of: a high mass fraction compared to other carbon allotropes present, a low concentration of defects, a low concentration of elemental impurities, a high Brunauer, Emmett and Teller (BET) specific surface area, and/or a high electrical conductivity. Methods are provided to produce the nanoparticles and agglomerates at a high production rate without using catalysts.
FULLERENE DERIVATIVES AND PHOTOELECTRIC DEVICES AND IMAGE SENSORS
A fullerene derivative may be included in photoelectric devices and image sensor. Optical absorption characteristics of a thin film including the fullerene derivative may be shifted toward a short wavelength compared with those of the thin film including the unsubstituted C60 fullerene, for example, a thin film including the fullerene derivative may be associated with a peak absorption wavelength (?.sub.max) that is be shorter than that of a thin film including the unsubstituted C60 fullerene.
Carbon allotropes
A nanoparticle or agglomerate which contains connected multi-walled spherical fullerenes coated in layers of graphite. In different embodiments, the nanoparticles and agglomerates have different combinations of: a high mass fraction compared to other carbon allotropes present, a low concentration of defects, a low concentration of elemental impurities, a high Brunauer, Emmett and Teller (BET) specific surface area, and/or a high electrical conductivity. Methods are provided to produce the nanoparticles and agglomerates at a high production rate without using catalysts.
COMPOSITIONS AND METHODS FOR AMELIORATING CNS INFLAMMATION, PSYCHOSIS, DELIRIUM, PTSD OR PTSS
The invention provides compositions and methods for ameliorating, treating, reversing or preventing pathology or inflammation in the central nervous system (CNS), or the brain, caused or mediated by NFkB, IL-6, IL-6-R, NADPH oxidase (Nox), and/or superoxide and/or hydrogen peroxide production by a NADPH oxidase, including for example ameliorating, treating, reversing or preventing schizophrenia, psychosis, delirium, e.g., post-operative delirium, drug-induced psychosis, psychotic features associated with frailty syndrome (FS), aging, depression, dementias; traumatic war neurosis, post traumatic stress disorder (PTSD) or post-traumatic stress syndrome (PTSS), Amyotrophic Lateral Sclerosis (ALS, or Lou Gehrig's Disease), and/or Multiple Sclerosis (MS). The invention also provides methods for purifying a C60 fullerene, C.sub.3 (tris malonic acid C60) or malonic acid derivatives.
Multiple trigger photoresist compositions and methods
The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.
CARBON ALLOTROPES
A nanoparticle or agglomerate which contains connected multi-walled spherical fullerenes coated in layers of graphite. In different embodiments, the nanoparticles and agglomerates have different combinations of: a high mass fraction compared to other carbon allotropes present, a low concentration of defects, a low concentration of elemental impurities, a high Brunauer, Emmett and Teller (BET) specific surface area, and/or a high electrical conductivity. Methods are provided to produce the nanoparticles and agglomerates at a high production rate without using catalysts.
FULLERENE DERIVATIVE AND PRODUCTION METHOD THEREFOR
A fullerene derivative having a partial structure shown in the following General Formula (1) is privided.
##STR00001##
(in Formula (1), C*'s are adjacent carbon atoms that form a fullerene framework. Rf.sup.1 and Rf.sup.2 each independently represents a perfluoroalkyl group having 1 to 4 carbon atoms, and Rf.sup.1 and Rf.sup.2 may be linked to each other to form a ring structure).
Isomer selective synthesis of methanofullerenes
[6,6]-Phenyl C.sub.71 butyric acid derivatives (C.sub.70-PCBR.sub.3) having a selectivity of greater than 95 wt % of the -isomer are provided by reacting fullerene C.sub.70 with a dialkyl sulfonium tetrafluoroborate having the formula: ##STR00001##