The present disclosure relates to novel multiple trigger negative working photoresist compositions and processes. The processes involve removing acid-labile protecting groups from crosslinking functionalities in a first step and crosslinking the crosslinking functionality with an acid sensitive crosslinker in a second step. The incorporation of a multiple trigger pathway in the resist catalytic chain increases the chemical gradient in areas receiving a low dose of irradiation, effectively acting as a built in dose depend quencher-analog and thus enhancing chemical gradient and thus resolution, resolution blur and exposure latitude. The photoresist compositions and the methods are ideal for fine pattern processing using, for example, ultraviolet radiation, beyond extreme ultraviolet radiation, extreme ultraviolet radiation, X-rays and charged particle rays.

Polyhydroxyfullerenes (PHFs) having enhanced electron scavenging capabilities have a ratio of non-hydroxyl functional groups to hydroxyl functional groups that is less than or equal to 0.3. When combined with a semiconductor photocatalyst, such as titanium dioxide nanoparticles, the PHFs provide a photocatalyst for degradation of chemical and biological contaminates with an efficiency of at least twice that of titanium dioxide nanoparticles free of PHFs. The PHFs are included in these catalysts at a weight ratio to titanium dioxide of about 0.001 to about 0.003, whereas significantly lower and higher ratios do not achieve the highly improved photodegradation capability. PHFs outside of the desired structure are shown to be of little value for photodegradation, and can be inhibiting to the photocatalytic activity of TiO.sub.2. The enhanced electron scavenging PHFs can be employed as a component of materials for solar cells, field effect transistors, and radical scavengers.

The invention provides compositions and methods for ameliorating, treating, reversing or preventing pathology or inflammation in the central nervous system (CNS), or the brain, caused or mediated by NFkB, IL-6, IL-6-R, NADPH oxidase (Nox), and/or superoxide and/or hydrogen peroxide production by a NADPH oxidase, including for example ameliorating, treating, reversing or preventing schizophrenia, psychosis, delirium, e.g., post-operative delirium, drug-induced psychosis, psychotic features associated with frailty syndrome (FS), aging, depression, dementias; traumatic war neurosis, post traumatic stress disorder (PTSD) or post-traumatic stress syndrome (PTSS), Amyotrophic Lateral Sclerosis (ALS, or Lou Gehrig's Disease), and/or Multiple Sclerosis (MS). The invention also provides methods for purifying a C60 fullerene, C.sub.3 (tris malonic acid C60) or malonic acid derivatives.

A process of dissolving ##STR00001##
in a solvent to produce a first mixture. To the first mixture a reagent is added to produce a second mixture. A HRR is then added to the second mixture to produce a third mixture. The third mixture is then refluxed to produce ##STR00002##

A process of dissolving [6,6]-phenyl-C.sub.60-butyric-N-2-dimethylaminoethyl ester in a solvent to produce a first mixture. A reagent is added to the first mixture to produce a second mixture. The second mixture is then refluxed to produce [6,6]-phenyl-C.sub.60-butyric-N-2-trimethylammonium ethyl ester iodide.

A method forms a resist underlayer film that has high resistance to dry etching using a gas containing a fluorocarbon. A method for forming a resist underlayer film includes the steps of: applying to a substrate a resist underlayer film-forming composition containing a fullerene derivative in which one to six molecules of malonic acid diester of the following Formula (1):

##STR00001##

wherein two Rs are each independently a C.sub.1-10 alkyl group, are added to one molecule of fullerene, a compound having at least two epoxy groups, and a solvent; and baking the substrate applied with the resist underlayer film-forming composition at least one time at a temperature of 240 C. or higher under an atmosphere of nitrogen, argon, or a mixture thereof.

Disclosed herein are radically initiated process involving tris(trimethylsilyl)silane that are suitable for surface functionalization or formation of composite materials based on functionalized nanoparticles.

Disclosed here is a method for producing a graphene macro-assembly (GMA)-fullerene composite, comprising providing a GMA comprising a three-dimensional network of graphene sheets crosslinked by covalent carbon bonds, and incorporating at least 20 wt. % of at least one fullerene compound into the GMA based on the initial weight of the GMA to obtain a GMA-fullerene composite. Also described are a GMA-fullerene composite produced, an electrode comprising the GMA-fullerene composite, and a supercapacitor comprising the electrode and optionally an organic or ionic liquid electrolyte in contact with the electrode.

A nanoparticle or agglomerate which contains connected multi-walled spherical fullerenes coated in layers of graphite. In different embodiments, the nanoparticles and agglomerates have different combinations of: a high mass fraction compared to other carbon allotropes present, a low concentration of defects, a low concentration of elemental impurities, a high Brunauer, Emmett and Teller (BET) specific surface area, and/or a high electrical conductivity. Methods are provided to produce the nanoparticles and agglomerates at a high production rate without using catalysts.

Methods of increasing the solubility of a base in supercritical carbon dioxide include forming a complex of a Lewis acid and the base, and dissolving the complex in supercritical carbon dioxide. The Lewis acid is soluble in supercritical carbon dioxide, and the base is substantially insoluble in supercritical carbon dioxide. Methods for increasing the solubility of water in supercritical carbon dioxide include dissolving an acid or a base in supercritical carbon dioxide to form a solution and dissolving water in the solution. The acid or the base is formulated to interact with water to solubilize the water in the supercritical carbon dioxide. Some compositions include supercritical carbon dioxide, a hydrolysable metallic compound, and at least one of an acid and a base. Some compositions include an alkoxide and at least one of an acid and a base.