Disclosed are a salt represented by formula (I), and an acid generator and a resist composition which include the same: ##STR00001## wherein R1 represents a fluorine atom or a fluorinated alkyl group; R2, R3 and R4 each represent a halogen atom, a fluorinated alkyl group or a hydrocarbon group; m2 and m3 represent an integer of 0 to 4; m4 represents an integer of 0 to 5; Q1 and Q2 each represent a fluorine atom or a perfluoroalkyl group; L1 represents a saturated hydrocarbon group, —CH2- included in the group may be replaced by —O— or —CO—, and a hydrogen atom included in the group may be substituted with a fluorine atom or a hydroxy group; Y1 represents a methyl group which may have a substituent or an alicyclic hydrocarbon group which may have a substituent.

A radiation-sensitive resin composition includes a solvent and an onium salt compound having a structure represented by formula (1). R.sup.f1 and R.sup.f2 each independently represent a fluorine atom or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R.sup.1 represents a hydrogen atom, a monovalent hydrocarbon group having 1 to 20 carbon atoms, a fluorine atom, or a monovalent fluorinated hydrocarbon group having 1 to 20 carbon atoms. R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, and R.sup.7 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 20 carbon atoms. n.sub.1+n.sub.2 is an integer of 2 to 8. n.sub.3 represents an integer of 0 to 5. X.sup.1 and X.sup.2 each independently represent an oxygen atom or a sulfur atom. Each * represents a bond with another structure. Z.sup.+ represents a monovalent radiation-sensitive onium cation.

##STR00001##

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, the group may have a substituent, —CH.sub.2— in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:

##STR00001##

wherein R.sup.4 to R.sup.9 each represent a halogen atom, a haloalkyl group, etc., A.sup.1, A.sup.2 and A.sup.3 each represent a hydrocarbon group, the group may have a substituent, —CH.sub.2— in the group may be replaced by —O—, —CO—, —S—, etc., X.sup.4, X.sup.5 and X.sup.6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI.sup.− represents an organic anion.

A method of producing an alcohol, comprises reducing an aldehyde or a ketone with a hydridosilatrane. The reducing is carried out with an activator.

A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.

##STR00001##

A carboxylic acid onium salt of formula (1) exerts a satisfactory acid diffusion control (or quencher) function. A resist composition comprising the carboxylic acid onium salt can be processed by DUV or EUV lithography to form a resist pattern with improved resolution, reduced LWR and minimal defects after development.

##STR00001##

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.

##STR00001##

A monomer having an onium salt structure represented by formula (1) gives a polymer which is fully compatible with resist components. A resist composition comprising the polymer has advantages including reduced acid diffusion, high sensitivity, high resolution, a good balance of lithography properties, and less defects, and is quite effective for precise micropatterning.

##STR00001##

It is already known that 1-(benzofuran-2-yl)-2-propylaminopentane or a pharmacologically acceptable acid addition salt thereof exhibits an excellent effect as an antidepressant, a psychotropic drug, an antiparkinsonian drug, and an anti-Alzheimer's disease drug. However, it has not been known at all that the compound is effective for the prevention or therapy of attention-deficit/hyperactivity disorder (ADHD). The present invention has newly found that 1-(benzofuran-2-yl)-2-propylaminopentane or a pharmacologically acceptable acid addition salt thereof is effective for the prevention or therapy of ADHD, and has been accomplished.