It is an object of the present invention to provide a coating agent composition from which a cured layer superior in water scale resistance and chemical resistance as well as in processability can be obtained. A cured film superior in water scale resistance and chemical resistance as well as in processability can be obtained from a coating agent composition for a laminated film to protect an exterior curved surface of a vehicle, including a component (A1): a (meth)acrylic resin having a hydroxyl group, and a component (B): a polyfunctional isocyanate compound, wherein the component (A1) has an alicyclic structure (a11) and a structure (a12) selected from the group consisting of polylactone, polycarbonate, polyester and polyether, and the component (A1) has a hydroxyl value of 50 to 150 mg KOH/g.

The present invention relates to anaerobically curable compositions made from renewable materials. In particular, an alpha-methylene-lactone is used with a (meth)acrylate component and a cure system to form an anaerobically curable composition.

The present invention relates to anaerobically curable compositions made from renewable materials. In particular, an alpha-methylene-lactone is used with a (meth)acrylate component and a cure system to form an anaerobically curable composition.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.

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The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.

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The present invention provides a curable compound including a pigment, a compound A, a photopolymerization initiator, a curable compound other than the compound A, and a resin, in which a content of the compound A in a total solid content of the curable composition is 1 to 15 mass %. The compound A is a compound having each of a coloring agent partial structure, an acid group or a basic group, and a curable group. The present invention further provides a method for producing the curable composition, a film formed of the curable composition, a color filter, a method for manufacturing a color filter, a solid-state imaging element, and an image display device.

The present invention provides a curable compound including a pigment, a compound A, a photopolymerization initiator, a curable compound other than the compound A, and a resin, in which a content of the compound A in a total solid content of the curable composition is 1 to 15 mass %. The compound A is a compound having each of a coloring agent partial structure, an acid group or a basic group, and a curable group. The present invention further provides a method for producing the curable composition, a film formed of the curable composition, a color filter, a method for manufacturing a color filter, a solid-state imaging element, and an image display device.

Provided is a pigment dispersion composition including: a yellow pigment; a polymerizable compound having a solubility parameter (SP value) of 10.00 or greater; and a pigment dispersant having an amine value of 30 mgKOH/g or greater but 100 mgKOH/g or less, wherein a ratio (B/A) of a content (B) of the pigment dispersant to a content (A) of the yellow pigment is 0.10 or greater but 0.80 or less.

Provided is a pigment dispersion composition including: a yellow pigment; a polymerizable compound having a solubility parameter (SP value) of 10.00 or greater; and a pigment dispersant having an amine value of 30 mgKOH/g or greater but 100 mgKOH/g or less, wherein a ratio (B/A) of a content (B) of the pigment dispersant to a content (A) of the yellow pigment is 0.10 or greater but 0.80 or less.

The present invention provides a composition capable of forming a film having high etching resistance, as well as a method for forming a resist pattern and a method for forming an insulating film, using the composition.

A composition comprising a base material (A) and a polyphenol compound (B), wherein the mass ratio between the base material (A) and the polyphenol compound (B) is 5:95 to 95:5.

A method for forming an insulating film, comprising the step of: developing the photoresist layer after the radiation irradiation.