A monomer material for preparing a polymer electrolyte precursor composition capable to form an in-situ polymerized polymer electrolyte, which comprises, consists essentially of, or consists of A1) a first monomer and optionally A2) a second monomer. A polymer electrolyte precursor raw material composition, a polymer electrolyte precursor composition capable to form a polymer electrolyte comprising the monomer material, a polymer electrolyte and an electrochemical device are also provided.

A monomer material for preparing a polymer electrolyte precursor composition capable to form an in-situ polymerized polymer electrolyte, which comprises, consists essentially of, or consists of A1) a first monomer and optionally A2) a second monomer. A polymer electrolyte precursor raw material composition, a polymer electrolyte precursor composition capable to form a polymer electrolyte comprising the monomer material, a polymer electrolyte and an electrochemical device are also provided.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

A monomer has the structure ##STR00001##
wherein R is an organic group comprising a polymerizable carbon-carbon double bond or carbon-carbon triple bond; X and Y are independently at each occurrence hydrogen or a non-hydrogen substituent; EWG1 and EWG2 are independently at each occurrence an electron-withdrawing group; p is 0, 1, 2, 3, or 4; n is 1, 2, 3, or 4; and M.sup.+ is an organic cation. A polymer prepared from monomer is useful as a component of a photoresist composition.

An object of the present disclosure is to provide an insulating film or dielectric film comprising a fluoropolymer and having electrical insulation and hardness. The present disclosure relates to an insulating film or dielectric film comprising a fluoropolymer, wherein the fluoropolymer comprises, as a main component, a monomer unit represented by formula (1):

##STR00001##

wherein
R.sup.1 to R.sup.4 are each independently a fluorine atom, a fluoroalkyl group, or a fluoroalkoxy group.

An object of the present disclosure is to provide an insulating film or dielectric film comprising a fluoropolymer and having electrical insulation and hardness. The present disclosure relates to an insulating film or dielectric film comprising a fluoropolymer, wherein the fluoropolymer comprises, as a main component, a monomer unit represented by formula (1):

##STR00001##

wherein
R.sup.1 to R.sup.4 are each independently a fluorine atom, a fluoroalkyl group, or a fluoroalkoxy group.

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.