Patent classifications
C08F224/00
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, METHOD FOR FORMING PATTERN, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) of which polarity increases by an action of an acid, the resin (A) having a repeating unit represented by General Formula (A1) as defined herein; and a compound (B) that generates an acid upon irradiation with actinic rays or radiation.
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) of which polarity increases by an action of an acid, the resin (A) having a repeating unit represented by General Formula (A1) as defined herein; and a compound (B) that generates an acid upon irradiation with actinic rays or radiation.
SULFUR-CONTAINING POLYMERS AND METHODS OF MAKING THE SAME
The present disclosure relates to a composition having a structure defined by
##STR00001##
, where symbolizes a covalent bond to a neighboring atom, R.sub.2 is a functional group derived from at least one of a homocyclic molecule, a heterocyclic molecule, a polycyclic molecule, an aliphatic molecule, and/or an organo-phosphorous molecule, 1 ≤ x ≤ 1000, and 2 ≤ z ≤ 1000.
SULFUR-CONTAINING POLYMERS AND METHODS OF MAKING THE SAME
The present disclosure relates to a composition having a structure defined by
##STR00001##
, where symbolizes a covalent bond to a neighboring atom, R.sub.2 is a functional group derived from at least one of a homocyclic molecule, a heterocyclic molecule, a polycyclic molecule, an aliphatic molecule, and/or an organo-phosphorous molecule, 1 ≤ x ≤ 1000, and 2 ≤ z ≤ 1000.
TAGGING AGENTS, ANTI-SCALANT POLYMER COMPOSITIONS, AND METHODS
Tagging agents, including fluorescent monomers, which may be polymerized. Anti-scalant polymer compositions that include a copolymer of a tagging agent and an anti-scalant monomer. Methods for synthesizing tagging agents, anti-scalant polymer compositions, and detecting an anti-scalant polymer composition.
TAGGING AGENTS, ANTI-SCALANT POLYMER COMPOSITIONS, AND METHODS
Tagging agents, including fluorescent monomers, which may be polymerized. Anti-scalant polymer compositions that include a copolymer of a tagging agent and an anti-scalant monomer. Methods for synthesizing tagging agents, anti-scalant polymer compositions, and detecting an anti-scalant polymer composition.
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
A photoresist composition, comprising: a polymer comprising: a first repeating unit derived from a first monomer comprising a substituted lactone, wherein the first repeating unit comprises a lactone ring derived from the substituted lactone, and wherein a carbon atom of the lactone ring forms a part of a backbone of the polymer, and a second repeating unit derived from a second monomer comprising an acetal group; a photoacid generator; and a solvent.
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
A photoresist composition, comprising: a polymer comprising: a first repeating unit derived from a first monomer comprising a substituted lactone, wherein the first repeating unit comprises a lactone ring derived from the substituted lactone, and wherein a carbon atom of the lactone ring forms a part of a backbone of the polymer, and a second repeating unit derived from a second monomer comprising an acetal group; a photoacid generator; and a solvent.
Compositions and related methods for targeted drug delivery
Compositions, articles, and methods for targeted drug delivery, such as thermoresponsive hydrogel polymers, are generally provided. In one aspect, the compositions and articles comprise a thermoresponsive hydrogel polymer comprising a releasable therapeutic agent. In some cases, the compositions described herein have advantageous combinations of properties including mechanical strength, biocompatibility, tunable charge densities, thermal responsiveness, drug loading, and/or configurations for targeted drug delivery. In one embodiment, the composition comprises a solution comprising a thermoresponsive polymer including one or more ligands attached to the polymer, wherein the solution is configured to undergo a sol-to-gel transition under physiological conditions. In another embodiment, the composition comprises a plurality of nanoparticles e.g., associated with the thermoresponsive polymer. In yet another embodiment, the composition comprises a therapeutic agent e.g., associated with the nanoparticles and/or thermoresponsive polymer.