Compositions, articles, and methods for targeted drug delivery, such as thermoresponsive hydrogel polymers, are generally provided. In one aspect, the compositions and articles comprise a thermoresponsive hydrogel polymer comprising a releasable therapeutic agent. In some cases, the compositions described herein have advantageous combinations of properties including mechanical strength, biocompatibility, tunable charge densities, thermal responsiveness, drug loading, and/or configurations for targeted drug delivery. In one embodiment, the composition comprises a solution comprising a thermoresponsive polymer including one or more ligands attached to the polymer, wherein the solution is configured to undergo a sol-to-gel transition under physiological conditions. In another embodiment, the composition comprises a plurality of nanoparticles e.g., associated with the thermoresponsive polymer. In yet another embodiment, the composition comprises a therapeutic agent e.g., associated with the nanoparticles and/or thermoresponsive polymer.

A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.

A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.

A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.

The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device. ##STR00001##

The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) including a repeating unit (i) having a group which decomposes by the action of an acid represented by the following General Formula (1), a pattern forming method using the composition, a method for manufacturing an electronic device, and an electronic device. ##STR00001##

A pattern forming process is provided comprising the steps of applying a resist composition comprising a polymer comprising recurring units having formula (1a) and/or (1b), an acid generator and a solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing in an alkaline developer to form a negative tone pattern.

A pattern forming process is provided comprising the steps of applying a resist composition comprising a polymer comprising recurring units having formula (1a) and/or (1b), an acid generator and a solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing in an alkaline developer to form a negative tone pattern.

A pattern forming process is provided comprising the steps of applying a resist composition comprising a polymer comprising recurring units having formula (1a) and/or (1b), an acid generator and a solvent onto a substrate, baking to form a resist film, exposing the resist film to high-energy radiation, baking, and developing in an alkaline developer to form a negative tone pattern.

A compound having a group represented by the formula (Ia): ##STR00001##
wherein R.sup.1 represents a C.sub.1 to C.sub.8 fluorinated alkyl group, R.sup.2 represents a group having an optionally substituted C.sub.5 to C.sub.18 alicyclic hydrocarbon group, and * represents a binding site.