C08F224/00

Copolymer and optical film using same
11225540 · 2022-01-18 · ·

A novel copolymer suitable for an optical film which is excellent in optical characteristics and has high retardation even in a thin film state, and an optical film containing the same are provided. A copolymer excellent in optical characteristics and easy to form a composite with a different polymer, and an optical film composed of the same are also provided.

Copolymer and optical film using same
11225540 · 2022-01-18 · ·

A novel copolymer suitable for an optical film which is excellent in optical characteristics and has high retardation even in a thin film state, and an optical film containing the same are provided. A copolymer excellent in optical characteristics and easy to form a composite with a different polymer, and an optical film composed of the same are also provided.

Compositions for producing glass coatings by way of inkjet printing techniques and use thereof

A coating material for the production of a UV-curing primer coating. The coating material includes at least 60 to 90 wt.-% of at least one monofunctional cycloaliphatic acrylate monomer or at least one monofunctional aryloxy alkyl acrylate monomer, 1 to 10 wt.-% of at least one amino-functional silane, 1 to 10 wt.-% of at least one photoinitiator, and up to 10 wt.-% of at least one of at least one acrylate oligomer and at least one methacrylate oligomer, each based on a total weight of the coating material.

Compositions for producing glass coatings by way of inkjet printing techniques and use thereof

A coating material for the production of a UV-curing primer coating. The coating material includes at least 60 to 90 wt.-% of at least one monofunctional cycloaliphatic acrylate monomer or at least one monofunctional aryloxy alkyl acrylate monomer, 1 to 10 wt.-% of at least one amino-functional silane, 1 to 10 wt.-% of at least one photoinitiator, and up to 10 wt.-% of at least one of at least one acrylate oligomer and at least one methacrylate oligomer, each based on a total weight of the coating material.

Resist composition and patterning process

A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.

Resist composition and patterning process

A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.

Perfluoro copolymers
11795254 · 2023-10-24 · ·

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

Perfluoro copolymers
11795254 · 2023-10-24 · ·

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

PERFLUORO COPOLYMERS
20230365731 · 2023-11-16 ·

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methoda of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.

PERFLUORO COPOLYMERS
20230365731 · 2023-11-16 ·

Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methoda of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.