Patent classifications
C08F224/00
Copolymer and optical film using same
A novel copolymer suitable for an optical film which is excellent in optical characteristics and has high retardation even in a thin film state, and an optical film containing the same are provided. A copolymer excellent in optical characteristics and easy to form a composite with a different polymer, and an optical film composed of the same are also provided.
Copolymer and optical film using same
A novel copolymer suitable for an optical film which is excellent in optical characteristics and has high retardation even in a thin film state, and an optical film containing the same are provided. A copolymer excellent in optical characteristics and easy to form a composite with a different polymer, and an optical film composed of the same are also provided.
Compositions for producing glass coatings by way of inkjet printing techniques and use thereof
A coating material for the production of a UV-curing primer coating. The coating material includes at least 60 to 90 wt.-% of at least one monofunctional cycloaliphatic acrylate monomer or at least one monofunctional aryloxy alkyl acrylate monomer, 1 to 10 wt.-% of at least one amino-functional silane, 1 to 10 wt.-% of at least one photoinitiator, and up to 10 wt.-% of at least one of at least one acrylate oligomer and at least one methacrylate oligomer, each based on a total weight of the coating material.
Compositions for producing glass coatings by way of inkjet printing techniques and use thereof
A coating material for the production of a UV-curing primer coating. The coating material includes at least 60 to 90 wt.-% of at least one monofunctional cycloaliphatic acrylate monomer or at least one monofunctional aryloxy alkyl acrylate monomer, 1 to 10 wt.-% of at least one amino-functional silane, 1 to 10 wt.-% of at least one photoinitiator, and up to 10 wt.-% of at least one of at least one acrylate oligomer and at least one methacrylate oligomer, each based on a total weight of the coating material.
Resist composition and patterning process
A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.
Resist composition and patterning process
A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.
Perfluoro copolymers
Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.
Perfluoro copolymers
Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methods of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.
PERFLUORO COPOLYMERS
Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methoda of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.
PERFLUORO COPOLYMERS
Provided herein are perfluoro copolymers of a perfluoro dioxole monomer, a perfluoro dioxane monomer, and an optional perhalo monomer. Methoda of making the perfluoro copolymers and methods of using the perfluoro copolymers are also disclosed.