The present invention relates to polymers comprising one or more (repeating) unit(s) of the formula (I), and compounds of formula (III), wherein Y, Y.sup.15, Y.sup.16 and Y.sup.17 are independently of each other a group of formula and their use as IR absorber, organic semiconductor in organic devices, especially in organic photovoltaics and photodiodes, or in a device containing a diode and/or an organic field effect transistor. The polymers and compounds according to the invention can have excellent solubility in organic solvents and excellent film-forming properties. In addition, high efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when the polymers and compounds according to the invention are used in organic field effect transistors, organic photovoltaics and photodiodes. ##STR00001##

The present invention relates to polymers comprising one or more (repeating) unit(s) of the formula (I), and compounds of formula (III), wherein Y, Y.sup.15, Y.sup.16 and Y.sup.17 are independently of each other a group of formula and their use as IR absorber, organic semiconductor in organic devices, especially in organic photovoltaics and photodiodes, or in a device containing a diode and/or an organic field effect transistor. The polymers and compounds according to the invention can have excellent solubility in organic solvents and excellent film-forming properties. In addition, high efficiency of energy conversion, excellent field-effect mobility, good on/off current ratios and/or excellent stability can be observed, when the polymers and compounds according to the invention are used in organic field effect transistors, organic photovoltaics and photodiodes. ##STR00001##

The present disclosure provides copolymers comprising from about 0.5 wt % to about 25 wt % cyclic olefin content and films comprising the copolymers. In one embodiment, a copolymer includes a C.sub.2-C.sub.40 monomer content of from about 75 wt % to about 99.5 wt %; and a C.sub.5-C.sub.40 cyclic olefin comonomer content of from about 0.5 wt % to about 25 wt %. The copolymer has a density of about 0.91 g/cm.sup.3 to about 0.933 g/cm.sup.3. Films of the present disclosure can have advantageous mechanical properties (such as melt strength) and optical properties (such as haze %).

Provided are: a curable composition for imprinting, which contains a compound C represented by Formula (C1) and a radical polymerization initiator; a kit including the curable composition; a pattern producing method using the curable composition; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.

##STR00001##

Provided are: a curable composition for imprinting, which contains a compound C represented by Formula (C1) and a radical polymerization initiator; a kit including the curable composition; a pattern producing method using the curable composition; and a method for manufacturing a semiconductor element, which includes the pattern producing method as a step.

##STR00001##

The present invention provides: a copolymer (A) which is a copolymer obtained by copolymerizing one or plural cycloolefin monomers and one or plural acyclic olefin monomers, or a copolymer obtained by copolymerizing two or more cycloolefin monomers, wherein the glass transition temperature (Tg) of the copolymer is 100° C. or higher, the refractive index of the copolymer is 1.545 or higher, and the Abbe's number of the copolymer is 50 or larger, and at least one of the cycloolefin monomers is a deltacyclene.

The present invention provides: a copolymer (A) which is a copolymer obtained by copolymerizing one or plural cycloolefin monomers and one or plural acyclic olefin monomers, or a copolymer obtained by copolymerizing two or more cycloolefin monomers, wherein the glass transition temperature (Tg) of the copolymer is 100° C. or higher, the refractive index of the copolymer is 1.545 or higher, and the Abbe's number of the copolymer is 50 or larger, and at least one of the cycloolefin monomers is a deltacyclene.

Described is a cyclic olefin-based copolymer has a constitutional unit (A) derived from an α-olefin having 2 to 20 carbon atoms, a constitutional unit (B) derived from a cyclic olefin without an aromatic ring, and a constitutional unit (C) derived from a cyclic olefin having an aromatic ring. Also described is a medical container containing a cyclic olefin-based copolymer having a constitutional unit (A) derived from an α-olefin having 2 to 20 carbon atoms, a constitutional unit (B) derived from a cyclic olefin without an aromatic ring, and a constitutional unit (C) derived from a cyclic olefin having an aromatic ring.

Described is a cyclic olefin-based copolymer has a constitutional unit (A) derived from an α-olefin having 2 to 20 carbon atoms, a constitutional unit (B) derived from a cyclic olefin without an aromatic ring, and a constitutional unit (C) derived from a cyclic olefin having an aromatic ring. Also described is a medical container containing a cyclic olefin-based copolymer having a constitutional unit (A) derived from an α-olefin having 2 to 20 carbon atoms, a constitutional unit (B) derived from a cyclic olefin without an aromatic ring, and a constitutional unit (C) derived from a cyclic olefin having an aromatic ring.

A resin composition is provided. The resin composition comprises: (A) a compound having a structure of formula (I),

##STR00001## wherein R.sub.1 is an organic group; and (B) a vinyl-containing elastomer, wherein the weight ratio of the compound having the structure of formula (I) to the vinyl-containing elastomer is 20:1 to 1:1.