A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced. Besides, it becomes possible to control the reflectance of a cured film by varying an irradiation amount of infrared ray.

A technology for curing a photocurable resin composition by ultraviolet ray/infrared ray hybrid irradiation is provided. An infrared ray irradiation is applied at least one of before or after the application of ultraviolet ray irradiation to a photocurable resin composition, to have the photocurable resin composition cured. It becomes possible to relax the ultraviolet ray irradiation conditions for photo curing by applying an infrared ray irradiation as compared with the case in which the infrared ray irradiation is not applied, and, in particular, the scratch resistance characteristics of a cured film are significantly enhanced. Moreover, because of a combination of ultraviolet ray irradiation and infrared ray irradiation, the curing time period of a cured film can be reduced and/or stress relaxation effects can be produced. Besides, it becomes possible to control the reflectance of a cured film by varying an irradiation amount of infrared ray.

The present invention provides a photocured product having both excellent toughness and high strength, and also provides a photocurable composition for forming said photocured product. The present invention provides a photocurable composition comprising: A. a (meth)acrylic acid ester monomer, wherein the glass transition temperature of a polymer formed from only said monomer is 20 C. or higher; B. a polyrotaxane obtained by respectively placing blocking groups at both ends of a pseudo-polyrotaxane, which is obtained by threading a linear molecule through the hole of a cyclic molecule, so as not to release the cyclic molecule, wherein the cyclic molecule has a (meth)acrylic group; and C. a photopolymerization initiator. The present invention also provides a photocured product formed from said composition.

The present invention provides a photocured product having both excellent toughness and high strength, and also provides a photocurable composition for forming said photocured product. The present invention provides a photocurable composition comprising: A. a (meth)acrylic acid ester monomer, wherein the glass transition temperature of a polymer formed from only said monomer is 20 C. or higher; B. a polyrotaxane obtained by respectively placing blocking groups at both ends of a pseudo-polyrotaxane, which is obtained by threading a linear molecule through the hole of a cyclic molecule, so as not to release the cyclic molecule, wherein the cyclic molecule has a (meth)acrylic group; and C. a photopolymerization initiator. The present invention also provides a photocured product formed from said composition.

The present invention relates to an additive to prevent phase separation between a low profile additive and the other components of the molding composition, said other components comprising at least an unsaturated resin and an unsaturated monomer.

The present invention relates to an additive to prevent phase separation between a low profile additive and the other components of the molding composition, said other components comprising at least an unsaturated resin and an unsaturated monomer.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

A problem of The present invention is to provide a curable composition capable of forming a resist which can be easily washed after curing and which has high dry etching resistance and excellent precision of fine pattern transfer, also provide a resist film and a laminate each containing the curable composition, and further provide a pattern forming method using the resist film. The problem of the present invention can be solved by providing a curable composition containing a multifunctional polymerizable monomer (A) which has two or more groups having a polymerizable group and has at least one group Q having a polymerizable group represented by formula (1) below, the amount of silicon atoms in an nonvolatile content being 10 wt % or more.

The invention pertains to a printing form and a process for preparing a polymeric printing form from a curable composition that includes a multifunctional urethane in a specified reactive group equivalent weight range, and an initiator. The process includes coating the curable composition onto a supporting substrate, such as a print cylinder, to form a layer, curing the layer with heat or by exposure to actinic radiation, and engraving the resulting cured layer to form at least one printing cell in the cured layer. The process prepares novel polymeric printing forms, particularly novel polymeric gravure printing forms, having a cured polymer-based composition layer that is engravable, resistant to solvent inks, and capable of printing gravure-quality images. The present invention shortens the time to prepare gravure printing cylinders and removes the need for and disposal of toxic heavy metals such as copper and chrome associated with conventional gravure print cylinder preparation.

The invention pertains to a printing form and a process for preparing a polymeric printing form from a curable composition that includes a multifunctional urethane in a specified reactive group equivalent weight range, and an initiator. The process includes coating the curable composition onto a supporting substrate, such as a print cylinder, to form a layer, curing the layer with heat or by exposure to actinic radiation, and engraving the resulting cured layer to form at least one printing cell in the cured layer. The process prepares novel polymeric printing forms, particularly novel polymeric gravure printing forms, having a cured polymer-based composition layer that is engravable, resistant to solvent inks, and capable of printing gravure-quality images. The present invention shortens the time to prepare gravure printing cylinders and removes the need for and disposal of toxic heavy metals such as copper and chrome associated with conventional gravure print cylinder preparation.