Provided is a coating composition from which a coating film having excellent decontamination properties, scratch resistance, and transparency can be formed. Specifically, provided is a coating composition containing a resin (A) having a hydroxyl group and an alkoxysilyl group, a curing agent (B), and an acrylic resin-coated silica particle (C) dispersion, wherein: the acrylic resin-coated silica particle (C) dispersion is a reaction product of silica particles with a polymerizable unsaturated group (c1) and a polymerizable unsaturated monomer mixture (c2); and the polymerizable unsaturated monomer mixture (c2) contains, as at least a part of components thereof, a polymerizable unsaturated monomer having a polysiloxane structure (c21) and an alkoxysilyl group-containing polymerizable unsaturated monomer (c22).

Provided is a coating composition from which a coating film having excellent decontamination properties, scratch resistance, and transparency can be formed. Specifically, provided is a coating composition containing a resin (A) having a hydroxyl group and an alkoxysilyl group, a curing agent (B), and an acrylic resin-coated silica particle (C) dispersion, wherein: the acrylic resin-coated silica particle (C) dispersion is a reaction product of silica particles with a polymerizable unsaturated group (c1) and a polymerizable unsaturated monomer mixture (c2); and the polymerizable unsaturated monomer mixture (c2) contains, as at least a part of components thereof, a polymerizable unsaturated monomer having a polysiloxane structure (c21) and an alkoxysilyl group-containing polymerizable unsaturated monomer (c22).

Provided are an anti-reflective film including a low-refractive layer having mechanical properties such as high abrasion resistance and scratch resistance, etc., and excellent optical properties, and a hard coating layer, a polarizing plate including the same, and a display device including the same.

Provided are an anti-reflective film including a low-refractive layer having mechanical properties such as high abrasion resistance and scratch resistance, etc., and excellent optical properties, and a hard coating layer, a polarizing plate including the same, and a display device including the same.

A resin composition, a light conversion layer and a light emitting device are provided. The resin composition includes a quantum dot (A), an alkali-soluble resin (B), an ethylenically unsaturated monomer (C), a photoinitiator (D), a solvent (E) and a phenyl-based compound (F). The phenyl-based compound (F) includes at least one of a compound represented by following Formula (F-1) and a compound represented by following Formula (F-2). Based on a total usage amount of the resin composition as 100 parts by weight, a usage amount of the phenyl-based compound (F) is 0.05 to 5 parts by weight. ##STR00001##
In Formula (F-1) and Formula (F-2), the definition of R.sup.1, R.sup.3, R.sup.4, Y, Z, m, n and p are the same as defined in the detailed description.

A resin composition, a light conversion layer and a light emitting device are provided. The resin composition includes a quantum dot (A), an alkali-soluble resin (B), an ethylenically unsaturated monomer (C), a photoinitiator (D), a solvent (E) and a phenyl-based compound (F). The phenyl-based compound (F) includes at least one of a compound represented by following Formula (F-1) and a compound represented by following Formula (F-2). Based on a total usage amount of the resin composition as 100 parts by weight, a usage amount of the phenyl-based compound (F) is 0.05 to 5 parts by weight. ##STR00001##
In Formula (F-1) and Formula (F-2), the definition of R.sup.1, R.sup.3, R.sup.4, Y, Z, m, n and p are the same as defined in the detailed description.

A production method of water-absorbent resin particles is disclosed, the method including: preparing a monomer aqueous solution containing an ethylenically unsaturated monomer and silica; polymerizing the ethylenically unsaturated monomer in the monomer aqueous solution by an aqueous solution polymerization method to obtain a hydrogel-like polymer; and coarsely crushing the hydrogel-like polymer, in which a concentration of the silica in the monomer aqueous solution is 0.02 to 4.0 ppm.

A production method of water-absorbent resin particles is disclosed, the method including: preparing a monomer aqueous solution containing an ethylenically unsaturated monomer and silica; polymerizing the ethylenically unsaturated monomer in the monomer aqueous solution by an aqueous solution polymerization method to obtain a hydrogel-like polymer; and coarsely crushing the hydrogel-like polymer, in which a concentration of the silica in the monomer aqueous solution is 0.02 to 4.0 ppm.

A flexible window stack structure includes a substrate, a first hard coating layer formed on a surface of the substrate and a second hard coating layer formed on an opposite surface of the substrate. The first hard coating layer has a curing contraction greater than that of the second hard coating layer, and the second hard coating layer is disposed at an elongated side when the window stack structure is folded. Cracks may be prevented by a curl property of the first hard coating layer when being bent.

A flexible window stack structure includes a substrate, a first hard coating layer formed on a surface of the substrate and a second hard coating layer formed on an opposite surface of the substrate. The first hard coating layer has a curing contraction greater than that of the second hard coating layer, and the second hard coating layer is disposed at an elongated side when the window stack structure is folded. Cracks may be prevented by a curl property of the first hard coating layer when being bent.