A method for molding amorphous polyether ether ketone including steps of preparing a molten mass including polyether ether ketone, cooling a mold assembly to a temperature of at most about 200 F., and injecting the molten mass into the cooled mold assembly.

A method for molding amorphous polyether ether ketone including steps of preparing a molten mass including polyether ether ketone, cooling a mold assembly to a temperature of at most about 200 F., and injecting the molten mass into the cooled mold assembly.

A method for molding amorphous polyether ether ketone including steps of preparing a molten mass including polyether ether ketone, cooling a mold assembly to a temperature of at most about 200 F., and injecting the molten mass into the cooled mold assembly.

A copolymer includes (i) a plurality of ethylenic moieties A having a structure according to the following formula: ##STR00001##
wherein R.sup.2 and R.sup.3 independently represent hydrogen, a halogen, or an optionally substituted linear, branched, or cyclic alk(en)yl group, or an optionally substituted aromatic or heteroaromatic, and (ii) a plurality of acetal moieties B having a structure according to the following formula: ##STR00002##
wherein L represents a divalent linking group; x=0 or 1; and R.sup.1 represents an optionally substituted aromatic or heteroaromatic group including at least one hydroxyl group. Use of these polymers in the coating of lithographic printing plates provides a good abrasion resistance while the balance between the ink acceptance, arising from the ethylenic moieties, and the solubility in an alkaline developer, arising form the acetal moieties, can be controlled efficiently.

A copolymer includes (i) a plurality of ethylenic moieties A having a structure according to the following formula: ##STR00001##
wherein R.sup.2 and R.sup.3 independently represent hydrogen, a halogen, or an optionally substituted linear, branched, or cyclic alk(en)yl group, or an optionally substituted aromatic or heteroaromatic, and (ii) a plurality of acetal moieties B having a structure according to the following formula: ##STR00002##
wherein L represents a divalent linking group; x=0 or 1; and R.sup.1 represents an optionally substituted aromatic or heteroaromatic group including at least one hydroxyl group. Use of these polymers in the coating of lithographic printing plates provides a good abrasion resistance while the balance between the ink acceptance, arising from the ethylenic moieties, and the solubility in an alkaline developer, arising form the acetal moieties, can be controlled efficiently.

A high-quality polyacetal copolymer produced by a simple process and in an economical manner. The method includes supplying a raw material including trioxane or the like to a reaction device; obtaining a reaction mixture by carrying out a polymerization reaction of the raw material in the state where the rotating shafts are inclined by 1 to 6 upwards with respect to the horizontal direction H from the introduction opening towards a polyacetal copolymer recovery portion; vaporizing and separating an unreacted monomer from the reaction mixture using a vaporization and separation portion; re-supplying the unreacted monomer to the reaction device; and recovering the polyacetal copolymer from the reaction using a polyacetal copolymer recovery portion.

A high-quality polyacetal copolymer produced by a simple process and in an economical manner. The method includes supplying a raw material including trioxane or the like to a reaction device; obtaining a reaction mixture by carrying out a polymerization reaction of the raw material in the state where the rotating shafts are inclined by 1 to 6 upwards with respect to the horizontal direction H from the introduction opening towards a polyacetal copolymer recovery portion; vaporizing and separating an unreacted monomer from the reaction mixture using a vaporization and separation portion; re-supplying the unreacted monomer to the reaction device; and recovering the polyacetal copolymer from the reaction using a polyacetal copolymer recovery portion.

A high-quality polyacetal copolymer produced by a simple process in an economical manner. The process includes supplying a raw material including trioxane and the like to a reaction device; setting the polymerization environmental temperature to no more than 100 C. until the reaction device conversion rate becomes 0.5, and then carrying out further polymerization; vaporizing and separating unreacted monomers from the reaction mixture at an environmental temperature of at least 115 C. and less than 140 C.; supplying the separated monomers to the raw material supply; and recovering the polyacetal copolymer from the reaction mixture.

A high-quality polyacetal copolymer produced by a simple process in an economical manner. The process includes supplying a raw material including trioxane and the like to a reaction device; setting the polymerization environmental temperature to no more than 100 C. until the reaction device conversion rate becomes 0.5, and then carrying out further polymerization; vaporizing and separating unreacted monomers from the reaction mixture at an environmental temperature of at least 115 C. and less than 140 C.; supplying the separated monomers to the raw material supply; and recovering the polyacetal copolymer from the reaction mixture.

Poly(phthaladialdehyde) polymers are described comprising the reaction product of an intermediate comprising the reaction product of phthaladialdehyde and a polyol; and an end-capping compound comprising an ethylenically unsaturated group. Also described are composition comprising the poly(phthaladialdehyde) polymer and at least one other ethylenically unsaturated component.