C09D1/00

STABILIZATION OF TITANIUM OXIDE FILMS FOR HIGHLY TRANSPARENT COATINGS
20230220214 · 2023-07-13 ·

A sol-gel material for overcoating a surface-relief structure includes a titanium(IV) precursor, and a titanium oxide stabilizer including R.sup.3OC(O)OR.sup.4, R.sup.5C(O)OR.sup.6, or a combination. R.sup.3 and R.sup.4 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, such as propylene carbonate (PC). R.sup.5 and R.sup.6 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, for example, a lactone such as gamma butyrolactone (GBL). In some embodiments, the sol-gel material includes a source of sulfate or phosphate anions, an acid, a base, a peroxide, a surfactant, a cross-linker, a flexibilizer, a toughener additive, a solvent, or a combination thereof. In some embodiments, the sol-gel material is annealed at a temperature between 50-150° C., and then annealed at a temperature between 200-300° C. In some embodiments, the sol-gel material is cured using ultraviolet light before annealing at a temperature between 200-300° C.

STABILIZATION OF TITANIUM OXIDE FILMS FOR HIGHLY TRANSPARENT COATINGS
20230220214 · 2023-07-13 ·

A sol-gel material for overcoating a surface-relief structure includes a titanium(IV) precursor, and a titanium oxide stabilizer including R.sup.3OC(O)OR.sup.4, R.sup.5C(O)OR.sup.6, or a combination. R.sup.3 and R.sup.4 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, such as propylene carbonate (PC). R.sup.5 and R.sup.6 include alkyl or alkene groups optionally containing carboxylate, alcohol, or ester functionalities, for example, a lactone such as gamma butyrolactone (GBL). In some embodiments, the sol-gel material includes a source of sulfate or phosphate anions, an acid, a base, a peroxide, a surfactant, a cross-linker, a flexibilizer, a toughener additive, a solvent, or a combination thereof. In some embodiments, the sol-gel material is annealed at a temperature between 50-150° C., and then annealed at a temperature between 200-300° C. In some embodiments, the sol-gel material is cured using ultraviolet light before annealing at a temperature between 200-300° C.

COMPOSITIONS FOR MANUFACTURING THIN FILM AND METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

Compositions for manufacturing a thin film are provided. The compositions may include a compound having a structure of Chemical Formula 1:

##STR00001##

M may be strontium (Sr) or barium (Ba), X.sub.1 and X.sub.2 may each independently be oxygen (O) or a substituted or unsubstituted alkylamino group having 1 to 5 carbon atoms, R.sub.1 and R.sub.2 may each independently be a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms or a substituted or unsubstituted perfluoro alkyl group having 1 to 5 carbon atoms, R.sub.3 may be hydrogen or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms, L may be a substituted or unsubstituted polyether having 1 to 6 oxygen atoms, or a substituted or unsubstituted polyamine having 1 to 6 nitrogen atoms, or a substituted or unsubstituted polyetheramine having 1 to 6 oxygen atoms or nitrogen atoms, and n may be an integer of 1 to 6.

COMPOSITIONS FOR MANUFACTURING THIN FILM AND METHODS FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

Compositions for manufacturing a thin film are provided. The compositions may include a compound having a structure of Chemical Formula 1:

##STR00001##

M may be strontium (Sr) or barium (Ba), X.sub.1 and X.sub.2 may each independently be oxygen (O) or a substituted or unsubstituted alkylamino group having 1 to 5 carbon atoms, R.sub.1 and R.sub.2 may each independently be a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms or a substituted or unsubstituted perfluoro alkyl group having 1 to 5 carbon atoms, R.sub.3 may be hydrogen or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms, L may be a substituted or unsubstituted polyether having 1 to 6 oxygen atoms, or a substituted or unsubstituted polyamine having 1 to 6 nitrogen atoms, or a substituted or unsubstituted polyetheramine having 1 to 6 oxygen atoms or nitrogen atoms, and n may be an integer of 1 to 6.

Articles with patterned coatings

Embodiments of a article including include a substrate and a patterned coating are provided. In one or more embodiments, when a strain is applied to the article, the article exhibits a failure strain of 0.5% or greater. Patterned coating may include a particulate coating or may include a discontinuous coating. The patterned coating of some embodiments may cover about 20% to about 75% of the surface area of the substrate. Methods for forming such articles are also provided.

Articles with patterned coatings

Embodiments of a article including include a substrate and a patterned coating are provided. In one or more embodiments, when a strain is applied to the article, the article exhibits a failure strain of 0.5% or greater. Patterned coating may include a particulate coating or may include a discontinuous coating. The patterned coating of some embodiments may cover about 20% to about 75% of the surface area of the substrate. Methods for forming such articles are also provided.

PASSIVATED SILVER NANOPARTICLE COATINGS AND METHODS OF MAKING THE SAME
20230211408 · 2023-07-06 ·

The instant disclosure is directed to passivated silver nanoparticle coatings and methods of making the same. A method may comprise obtaining a substrate having a surface, exposing the surface to a plurality of silver nanoparticles, applying a nucleating agent to the silver nanoparticles to form a plurality of silver cores, and passivating the silver cores by applying a sulfidation agent to the silver cores to form silver sulfide shells around the silver cores, thereby forming a coating comprising a plurality of sulfidated silver nanoparticles having a core-shell structure. The method may be used to form a coating comprising a plurality of sulfidated silver nanoparticles having a core-shell structure.

PASSIVATED SILVER NANOPARTICLE COATINGS AND METHODS OF MAKING THE SAME
20230211408 · 2023-07-06 ·

The instant disclosure is directed to passivated silver nanoparticle coatings and methods of making the same. A method may comprise obtaining a substrate having a surface, exposing the surface to a plurality of silver nanoparticles, applying a nucleating agent to the silver nanoparticles to form a plurality of silver cores, and passivating the silver cores by applying a sulfidation agent to the silver cores to form silver sulfide shells around the silver cores, thereby forming a coating comprising a plurality of sulfidated silver nanoparticles having a core-shell structure. The method may be used to form a coating comprising a plurality of sulfidated silver nanoparticles having a core-shell structure.

CONDUCTIVE LAMINATE AND MANUFACTURING METHOD OF CONDUCTIVE LAMINATE
20230212413 · 2023-07-06 · ·

Provided is a conductive laminate including a base material and a conductive ink film provided on the base material, in which a region that extends from a first main surface toward a second main surface to a position being away from the first main surface by a distance equivalent to 50% of a thickness of the conductive ink film has a first void ratio of 15% to 50%, a region that extends from a position being away from the second main surface toward the first main surface by a distance equivalent to 10% of the thickness of the conductive ink film to the second main surface has a second void ratio which is smaller than the first void ratio, and the conductive ink film comprises at least one metal selected from the group consisting of silver, gold, platinum, nickel, palladium, and copper.

CONDUCTIVE LAMINATE AND MANUFACTURING METHOD OF CONDUCTIVE LAMINATE
20230212413 · 2023-07-06 · ·

Provided is a conductive laminate including a base material and a conductive ink film provided on the base material, in which a region that extends from a first main surface toward a second main surface to a position being away from the first main surface by a distance equivalent to 50% of a thickness of the conductive ink film has a first void ratio of 15% to 50%, a region that extends from a position being away from the second main surface toward the first main surface by a distance equivalent to 10% of the thickness of the conductive ink film to the second main surface has a second void ratio which is smaller than the first void ratio, and the conductive ink film comprises at least one metal selected from the group consisting of silver, gold, platinum, nickel, palladium, and copper.