A system and method are provided to create porous surface coatings. In use, a material layer includes synthesized carbon-containing composite materials, wherein the synthesized carbon-containing composite materials comprise a porosity characteristic, and at least one of: heat transfer characteristics, resistance to corrosion characteristics, or non-ablative erosion characteristics. Additionally, a bonding layer comprising at least some of the synthesized carbon-containing composite materials is bonded by at least one of, a carbon-to-carbon bond, or a metal-to-carbon bond to a substrate. Further, a surface interfacial layer comprising at least some of the synthesized carbon-containing composite materials is hydraulically smooth.

A system and method are provided to create porous surface coatings. In use, a material layer includes synthesized carbon-containing composite materials, wherein the synthesized carbon-containing composite materials comprise a porosity characteristic, and at least one of: heat transfer characteristics, resistance to corrosion characteristics, or non-ablative erosion characteristics. Additionally, a bonding layer comprising at least some of the synthesized carbon-containing composite materials is bonded by at least one of, a carbon-to-carbon bond, or a metal-to-carbon bond to a substrate. Further, a surface interfacial layer comprising at least some of the synthesized carbon-containing composite materials is hydraulically smooth.

The process comprises treating 90-190 g titanium (IV) chloride in 10-100 ml de-ionized water for preparing Titanium cation (Ti.sup.4+); treating 130-275 ml potassium persulfate in 10-100 ml double-distilled water and keeping at constant temperature to obtain sulphate/oxide; dipping substrates into titanium (IV) chloride solution and re-dipping in de-ionized water to remove loosely bonded ions, if could be any; dipping substrates into potassium persulfate solution and re-dipping in de-ionized water to remove loosely bonded ions, if could be any, and keeping at 50-90° C. for complete one cycle; treating obtained Titanium cation (Ti.sup.4+) with sulphate/oxide and obtaining whitish layer on the substrate surface by necked eyes after about 10-15 cycles, suggesting initiation of film formation, wherein the deposition thickness of TiO.sub.2 layer is increased from 0.3-2.0-micron on determined 5-50 deposition cycles; and rinsing deposited films with de-ionized water and air annealed at 400-600° C. temperature to obtain anatase TiO.sub.2.

The process comprises treating 90-190 g titanium (IV) chloride in 10-100 ml de-ionized water for preparing Titanium cation (Ti.sup.4+); treating 130-275 ml potassium persulfate in 10-100 ml double-distilled water and keeping at constant temperature to obtain sulphate/oxide; dipping substrates into titanium (IV) chloride solution and re-dipping in de-ionized water to remove loosely bonded ions, if could be any; dipping substrates into potassium persulfate solution and re-dipping in de-ionized water to remove loosely bonded ions, if could be any, and keeping at 50-90° C. for complete one cycle; treating obtained Titanium cation (Ti.sup.4+) with sulphate/oxide and obtaining whitish layer on the substrate surface by necked eyes after about 10-15 cycles, suggesting initiation of film formation, wherein the deposition thickness of TiO.sub.2 layer is increased from 0.3-2.0-micron on determined 5-50 deposition cycles; and rinsing deposited films with de-ionized water and air annealed at 400-600° C. temperature to obtain anatase TiO.sub.2.

The present disclosure provides a window protective film and a display device. The display device includes the window protective film. The window protective film includes a base layer, a soft coating layer disposed on the base layer, and an anti-fingerprint coating layer disposed on the soft coating layer. The soft coating layer includes a conductive polymer layer disposed on and in contact with a first surface of the base layer, a silica coating layer disposed on at least one side of the conductive polymer layer and that includes a plurality of silica nano particles, and a cover layer disposed on at least one side of the silica coating layer.

The present disclosure provides a window protective film and a display device. The display device includes the window protective film. The window protective film includes a base layer, a soft coating layer disposed on the base layer, and an anti-fingerprint coating layer disposed on the soft coating layer. The soft coating layer includes a conductive polymer layer disposed on and in contact with a first surface of the base layer, a silica coating layer disposed on at least one side of the conductive polymer layer and that includes a plurality of silica nano particles, and a cover layer disposed on at least one side of the silica coating layer.

A metal-assisted chemical imprinting stamp includes a porous polymer substrate and a noble metal coating formed directly on the porous polymer substrate. Fabricating the metal-assisted chemical imprinting stamp includes providing a porous polymer substrate, and disposing a noble metal on the porous polymer substrate. Metal-assisted chemical imprinting includes positioning a silicon substrate in an etching solution, contacting a surface of the silicon substrate with a stamp comprising a noble metal layer on a surface of a porous polymer substrate, and separating the silicon substrate from the stamp to yield a pattern corresponding to the noble metal layer on the silicon substrate.

A metal-assisted chemical imprinting stamp includes a porous polymer substrate and a noble metal coating formed directly on the porous polymer substrate. Fabricating the metal-assisted chemical imprinting stamp includes providing a porous polymer substrate, and disposing a noble metal on the porous polymer substrate. Metal-assisted chemical imprinting includes positioning a silicon substrate in an etching solution, contacting a surface of the silicon substrate with a stamp comprising a noble metal layer on a surface of a porous polymer substrate, and separating the silicon substrate from the stamp to yield a pattern corresponding to the noble metal layer on the silicon substrate.

A coating material containing an oxyfluoride of yttrium and having a Fisher diameter of 1.0 to 10 μm and a tap density TD to apparent density AD ratio, TD/AD, of 1.6 to 3.5. The coating material preferably has a pore volume of pores with a diameter of 100 μm or smaller of 1.0 cm.sup.3/g or less as measured by mercury intrusion porosimetry. A coating containing an oxyfluoride of yttrium and having a Vickers hardness of 200 HV0.01 or higher. The coating preferably has a fracture toughness of 1.0×10.sup.2 Pa.Math.m.sup.1/2 or higher.

A coating material containing an oxyfluoride of yttrium and having a Fisher diameter of 1.0 to 10 μm and a tap density TD to apparent density AD ratio, TD/AD, of 1.6 to 3.5. The coating material preferably has a pore volume of pores with a diameter of 100 μm or smaller of 1.0 cm.sup.3/g or less as measured by mercury intrusion porosimetry. A coating containing an oxyfluoride of yttrium and having a Vickers hardness of 200 HV0.01 or higher. The coating preferably has a fracture toughness of 1.0×10.sup.2 Pa.Math.m.sup.1/2 or higher.