A removable hiding fluid includes an organic solvent; a dispersing and wetting agent having a polyamine amide of polycarboxylic acid; an opacifier at a content between 50% and 60% by weight relative to a total weight of the removable hiding fluid; a resin; and an additive including a rubber element melted into a mixture of the organic solvent, dispersing and wetting agent, specifier and resin.

A removable hiding fluid includes an organic solvent; a dispersing and wetting agent having a polyamine amide of polycarboxylic acid; an opacifier at a content between 50% and 60% by weight relative to a total weight of the removable hiding fluid; a resin; and an additive including a rubber element melted into a mixture of the organic solvent, dispersing and wetting agent, specifier and resin.

The present invention provides a process for preparing printed shrinkable polymeric film substrates, by applying an ink or overprint varnish comprising self-crosslinking acrylic emulsions. The inks and overprint varnishes are rub, scratch, chemical, humidity/water, and heat resistant, as well as being resistant to repeated bending and folding.

The present invention provides a process for preparing printed shrinkable polymeric film substrates, by applying an ink or overprint varnish comprising self-crosslinking acrylic emulsions. The inks and overprint varnishes are rub, scratch, chemical, humidity/water, and heat resistant, as well as being resistant to repeated bending and folding.

A photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a display substrate comprising a bezel pattern manufactured thereby, and a rework method for removing a bezel pattern having a defective printed pattern are disclosed herein. In some embodiments, the composition includes a colorant, an epoxy monomer, an oxetane monomer, a vinyl monomer, a cationic photopolymerization initiator, an adhesion promoter and a diluting solvent, the oxetane monomer comprises a monofunctional oxetane monomer and a difunctional oxetane monomer. The composition is suitable for manufacturing a bezel pattern that is easily removed, has sufficient adhesion to a display substrate, and good curing sensitivity and pencil hardness, without requiring a high-temperature heating process.

A photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a display substrate comprising a bezel pattern manufactured thereby, and a rework method for removing a bezel pattern having a defective printed pattern are disclosed herein. In some embodiments, the composition includes a colorant, an epoxy monomer, an oxetane monomer, a vinyl monomer, a cationic photopolymerization initiator, an adhesion promoter and a diluting solvent, the oxetane monomer comprises a monofunctional oxetane monomer and a difunctional oxetane monomer. The composition is suitable for manufacturing a bezel pattern that is easily removed, has sufficient adhesion to a display substrate, and good curing sensitivity and pencil hardness, without requiring a high-temperature heating process.

The present disclosure relates to a water-based correction fluid comprising aa photocrosslinkable acrylate and/or methacrylate oligomer, ba photoinitiator, can opacifying agent, and dwater, eoptionally a photocrosslinkable acrylate and/or methacrylate monomer, and foptionally an additive. The fluid has a dry extract of between 40 and 80% by weight relative to the total weight of the fluid, advantageously between 54 and 66%, and forms a film after drying comprising at least 40% by weight of opacifying agent relative to the total weight of the film, advantageously between 40 and 80% by weight. The present disclosure also relates to a device for applying the correction fluid and a process for covering a mark on a paper support using the correction fluid.

The present disclosure relates to a water-based correction fluid comprising aa photocrosslinkable acrylate and/or methacrylate oligomer, ba photoinitiator, can opacifying agent, and dwater, eoptionally a photocrosslinkable acrylate and/or methacrylate monomer, and foptionally an additive. The fluid has a dry extract of between 40 and 80% by weight relative to the total weight of the fluid, advantageously between 54 and 66%, and forms a film after drying comprising at least 40% by weight of opacifying agent relative to the total weight of the film, advantageously between 40 and 80% by weight. The present disclosure also relates to a device for applying the correction fluid and a process for covering a mark on a paper support using the correction fluid.

A photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a display substrate comprising a bezel pattern manufactured thereby, and a rework method for removing a bezel pattern having a defective printed pattern are disclosed herein. In some embodiments, the composition includes a colorant, an epoxy monomer, an oxetane monomer, a vinyl monomer, a cationic photopolymerization initiator, an adhesion promoter and a diluting solvent, the oxetane monomer comprises a monofunctional oxetane monomer and a difunctional oxetane monomer. The composition is suitable for manufacturing a bezel pattern that is easily removed, has sufficient adhesion to a display substrate, and good curing sensitivity and pencil hardness, without requiring a high-temperature heating process.

A photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a display substrate comprising a bezel pattern manufactured thereby, and a rework method for removing a bezel pattern having a defective printed pattern are disclosed herein. In some embodiments, the composition includes a colorant, an epoxy monomer, an oxetane monomer, a vinyl monomer, a cationic photopolymerization initiator, an adhesion promoter and a diluting solvent, the oxetane monomer comprises a monofunctional oxetane monomer and a difunctional oxetane monomer. The composition is suitable for manufacturing a bezel pattern that is easily removed, has sufficient adhesion to a display substrate, and good curing sensitivity and pencil hardness, without requiring a high-temperature heating process.