A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

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A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

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The present invention generally relates to a device and a process for performing large-scale noncovalent functionalization of 2D materials, with chemical pattern elements as small as a few nanometers, using thermally controlled rotary Langmuir-Schaefer conversion. In particular, the present invention discloses a device comprising a thermally regulated disc driven by a rotor with fine speed control configured to be operable with a Langmuir trough for performing large-scale noncovalent functionalization of 2D materials, achieving ordered domain areas up to nearly 10,000 m.sup.2, with chemical pattern elements as small as a few nanometers. A process using the device for performing large-scale noncovalent functionalization of 2D materials with chemical pattern elements as small as a few nanometers is within the scope of this disclosure. The process we demonstrate would be readily extensible to roll-to-roll processing, addressing a longstanding challenge in scaling Langmuir-Schaefer transfer for practical applications.

The present invention generally relates to a device and a process for performing large-scale noncovalent functionalization of 2D materials, with chemical pattern elements as small as a few nanometers, using thermally controlled rotary Langmuir-Schaefer conversion. In particular, the present invention discloses a device comprising a thermally regulated disc driven by a rotor with fine speed control configured to be operable with a Langmuir trough for performing large-scale noncovalent functionalization of 2D materials, achieving ordered domain areas up to nearly 10,000 m.sup.2, with chemical pattern elements as small as a few nanometers. A process using the device for performing large-scale noncovalent functionalization of 2D materials with chemical pattern elements as small as a few nanometers is within the scope of this disclosure. The process we demonstrate would be readily extensible to roll-to-roll processing, addressing a longstanding challenge in scaling Langmuir-Schaefer transfer for practical applications.

An object of the present invention is to provide a resonant sensor having excellent sensitivity and selectivity with respect to a component to be detected that is contained at a low concentration in the system. A resonant sensor of the present invention has a receiving layer that contains a polymer having a repeating unit represented by Formula (1). In Formula, R.sup.1 represents an alkyl group. A plurality of R.sup.1's may be the same as or different from each other. R.sup.2 represents a hydrogen atom, an alkyl group, or an aryl group.

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An object of the present invention is to provide a resonant sensor having excellent sensitivity and selectivity with respect to a component to be detected that is contained at a low concentration in the system. A resonant sensor of the present invention has a receiving layer that contains a polymer having a repeating unit represented by Formula (1). In Formula, R.sup.1 represents an alkyl group. A plurality of R.sup.1's may be the same as or different from each other. R.sup.2 represents a hydrogen atom, an alkyl group, or an aryl group.

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A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

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A polymer, an organic layer composition, and a method of forming patterns, the polymer including a structural unit represented by Chemical Formula 1 or Chemical Formula 2:

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A material for forming an organic film, including: a compound for forming an organic film shown by the following general formula (1A); and an organic solvent, where W.sub.1 represents a tetravalent organic group, n1 an integer of 0 or 1, n2 an integer of 1 to 3, and R.sub.1 an alkynyl group having 2 to 10 carbon atoms. A compound for forming an organic film is cured not only under air, but also under film formation conditions of inert gas, and forms an organic film having not only excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but also favorable adhesion to a substrate, and a material for forming an organic film containing the compound, and a substrate for manufacturing a semiconductor device using the material, a method for forming an organic film using the material, and a patterning process using the material. ##STR00001##

A material for forming an organic film, including: a compound for forming an organic film shown by the following general formula (1A); and an organic solvent, where W.sub.1 represents a tetravalent organic group, n1 an integer of 0 or 1, n2 an integer of 1 to 3, and R.sub.1 an alkynyl group having 2 to 10 carbon atoms. A compound for forming an organic film is cured not only under air, but also under film formation conditions of inert gas, and forms an organic film having not only excellent heat resistance and properties of filling and planarizing a pattern formed on a substrate, but also favorable adhesion to a substrate, and a material for forming an organic film containing the compound, and a substrate for manufacturing a semiconductor device using the material, a method for forming an organic film using the material, and a patterning process using the material. ##STR00001##