C09D161/00

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND PATTERN FORMATION METHOD
20190367658 · 2019-12-05 ·

The present invention provides a compound selected from the group consisting of compounds represented by the following formula (1):

##STR00001## wherein each R.sup.S is independently a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms, and which optionally has a substituent, an alkenyl group, which has 2 to 30 carbon atoms, and which optionally has a substituent, an alkoxy group, which has 1 to 30 carbon atoms, and which optionally has a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group, and the alkoxy group each optionally contain an ether bond, a ketone bond, or an ester bond; wherein at least one R.sup.S is a hydroxy group; and each R.sup.T is independently a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms, and which optionally has a substituent, an alkenyl group, which has 2 to 30 carbon atoms, and which optionally has a substituent, an alkoxy group, which has 1 to 30 carbon atoms, and which optionally has a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group, and the alkoxy group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein two R.sup.T are optionally bonded to include a cyclic structure.

COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND PATTERN FORMATION METHOD
20190367658 · 2019-12-05 ·

The present invention provides a compound selected from the group consisting of compounds represented by the following formula (1):

##STR00001## wherein each R.sup.S is independently a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms, and which optionally has a substituent, an alkenyl group, which has 2 to 30 carbon atoms, and which optionally has a substituent, an alkoxy group, which has 1 to 30 carbon atoms, and which optionally has a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group, and the alkoxy group each optionally contain an ether bond, a ketone bond, or an ester bond; wherein at least one R.sup.S is a hydroxy group; and each R.sup.T is independently a hydrogen atom, an alkyl group, which has 1 to 30 carbon atoms, and which optionally has a substituent, an aryl group, which has 6 to 30 carbon atoms, and which optionally has a substituent, an alkenyl group, which has 2 to 30 carbon atoms, and which optionally has a substituent, an alkoxy group, which has 1 to 30 carbon atoms, and which optionally has a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group, and the alkoxy group each optionally contain an ether bond, a ketone bond, or an ester bond, wherein two R.sup.T are optionally bonded to include a cyclic structure.

Multilayer coating with a primer-surfacer of a nonaqueous coating material comprising at least two different polyesters

Method for producing a multicoat coating comprises: applying a primer-surfacer coat (I) to an optionally pretreated substrate, curing coat (I), applying a basecoat (II) to coat (I), optionally curing the basecoat (II), applying a clearcoat (III) to basecoat (II), and curing basecoat (II) and/or clearcoat (III), wherein coat (I) is obtained by applying a nonaqueous, solventborne coating material comprising by weight: at least 20% of at least one organic solvent, at least 8% of at least one first polyester (A1), having a glass transition temperature of at least 20 C. and an acid number of 0 to 40 mg KOH/g; at least 8% by weight of at least one second polyester (A2), different from (A1) and having a glass transition temperature of not more than 10 C.; at least one crosslinker (B); and at least 8% of one or more fillers and/or pigments (C).

Multilayer coating with a primer-surfacer of a nonaqueous coating material comprising at least two different polyesters

Method for producing a multicoat coating comprises: applying a primer-surfacer coat (I) to an optionally pretreated substrate, curing coat (I), applying a basecoat (II) to coat (I), optionally curing the basecoat (II), applying a clearcoat (III) to basecoat (II), and curing basecoat (II) and/or clearcoat (III), wherein coat (I) is obtained by applying a nonaqueous, solventborne coating material comprising by weight: at least 20% of at least one organic solvent, at least 8% of at least one first polyester (A1), having a glass transition temperature of at least 20 C. and an acid number of 0 to 40 mg KOH/g; at least 8% by weight of at least one second polyester (A2), different from (A1) and having a glass transition temperature of not more than 10 C.; at least one crosslinker (B); and at least 8% of one or more fillers and/or pigments (C).

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group

A resist underlayer film forming composition for lithography that can be used as a hard mask. The composition can improve pattern resolution due to having a trihalogenoacetamide skeleton. A resist underlayer film forming composition for lithography comprising a hydrolyzable silane, a hydrolysis product thereof, a hydrolysis condensate thereof, or a combination thereof as a silane, wherein the hydrolyzable silane comprises a silane having a halogen-containing carboxylic acid amide group.

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

A compound or a resin represented by the following formula (1). ##STR00001##
(in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R.sup.1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R.sup.2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R.sup.2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2).

Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method

A compound or a resin represented by the following formula (1). ##STR00001##
(in formula (1), each X independently represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each R.sup.1 is independently selected from the group consisting of a halogen group, a cyano group, a nitro group, an amino group, a hydroxyl group, a thiol group, a heterocyclic group, an alkyl group having 1 to 30 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, and combinations thereof, in which the alkyl group, the alkenyl group and the aryl group optionally include an ether bond, a ketone bond or an ester bond, each R.sup.2 independently represents an alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 40 carbon atoms, an alkenyl group having 2 to 30 carbon atoms, a thiol group or a hydroxyl group, in which at least one R.sup.2 represents a group including a hydroxyl group or a thiol group, each m is independently an integer of 0 to 7 (in which at least one m is an integer of 1 to 7.), each p is independently 0 or 1, q is an integer of 0 to 2, and n is 1 or 2).

COMPOSITIONS WITH COATED CARBON FIBERS AND METHODS FOR MANUFACTURING COMPOSITIONS WITH COATED CARBON FIBERS
20190119472 · 2019-04-25 ·

The present disclosure provides compositions including a carbon fiber material comprising one or more of dibromocyclopropyl or polysilazane disposed thereon; and a thermosetting polymer or a thermoplastic polymer. The present disclosure further provides metal substrates including a composition of the present disclosure disposed thereon. The present disclosure further provides vehicle components including a metal substrate of the present disclosure. The present disclosure further provides methods for manufacturing a vehicle component, including contacting a carbon fiber material with a polysilazane or a dibromocarbene to form a coated carbon fiber material; and mixing the coated carbon fiber material with a thermosetting polymer or a thermoplastic polymer to form a composition. Methods can further include depositing a composition of the present disclosure onto a metal substrate.

COMPOSITIONS WITH COATED CARBON FIBERS AND METHODS FOR MANUFACTURING COMPOSITIONS WITH COATED CARBON FIBERS
20190119472 · 2019-04-25 ·

The present disclosure provides compositions including a carbon fiber material comprising one or more of dibromocyclopropyl or polysilazane disposed thereon; and a thermosetting polymer or a thermoplastic polymer. The present disclosure further provides metal substrates including a composition of the present disclosure disposed thereon. The present disclosure further provides vehicle components including a metal substrate of the present disclosure. The present disclosure further provides methods for manufacturing a vehicle component, including contacting a carbon fiber material with a polysilazane or a dibromocarbene to form a coated carbon fiber material; and mixing the coated carbon fiber material with a thermosetting polymer or a thermoplastic polymer to form a composition. Methods can further include depositing a composition of the present disclosure onto a metal substrate.