A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used.

##STR00001##

(in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R.sup.0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m.sub.1 is independently an integer of 0 to 4, in which at least one m.sub.1 is an integer of 1 to 4, each m.sub.2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

A material for forming an underlayer film for lithography, in which a compound represented by the following formula (0) is used.

##STR00001##

(in formula (0), each X independently represents an oxygen atom or a sulfur atom, or a non-crosslinked state, R.sup.1 represents a 2n-valent group having 1 to 30 carbon atoms, or a single bond, each R.sup.0 independently represents a straight, branched or cyclic alkyl group having 1 to 30 carbon atoms, an aryl group having 6 to 30 carbon atoms, a straight, branched or cyclic alkenyl group having 2 to 30 carbon atoms, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group or a hydroxyl group, the alkyl group, the alkenyl group and the aryl group each optionally include a cyanato group, a thiol group, a halogen group, a nitro group, an amino group, a carboxylic acid group, a hydroxyl group, an ether bond, a ketone bond or an ester bond, each m.sub.1 is independently an integer of 0 to 4, in which at least one m.sub.1 is an integer of 1 to 4, each m.sub.2 is independently an integer of 0 to 3, n is an integer of 1 to 4, and each p is independently 0 or 1.)

A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming a pattern or patterns using a hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer that includes a structural unit represented by Chemical Formula 1; and a solvent:

##STR00001##

A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming a pattern or patterns using a hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer that includes a structural unit represented by Chemical Formula 1; and a solvent:

##STR00001##

A semicrystalline poly ketone powder useful for additive manufacturing may be made by dissolving a polyketone having differential scanning calorimetry (DSC) monomodal melt peak, at a temperature above 50 C. to below the melt temperature of the polyketone, precipitating the dissolved polyketone by cooling, addition of a nonsolvent or combination thereof. The method may be used to form polyketones having a DSC melt peak with an enthalpy greater than the starting polyketone.

A semicrystalline poly ketone powder useful for additive manufacturing may be made by dissolving a polyketone having differential scanning calorimetry (DSC) monomodal melt peak, at a temperature above 50 C. to below the melt temperature of the polyketone, precipitating the dissolved polyketone by cooling, addition of a nonsolvent or combination thereof. The method may be used to form polyketones having a DSC melt peak with an enthalpy greater than the starting polyketone.

Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, SiOH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

Disclosed herein are polysilsesquioxane-based anti-reflective coating (ARC) compositions, methods of preparation, and methods of deposition on a substrate. In one embodiment, the polysilsesquioxane of this disclosure is prepared in a two-step process of acid catalyzed hydrolysis of organoalkoxysilane followed by addition of tetralkoxysilane that generates silicone polymers with >40 mol % silanol based on Si-NMR. These high silanol siloxane polymers are stable and have a long shelf-life in polar organic solvents at room temperature. Also disclosed are low refractive index ARC made from these compositions with and without additives such as porogens, templates, thermal radical initiator, photo radical initiators, crosslinkers, SiOH condensation catalyst and nano-fillers. Also disclosed are methods and apparatus for applying coatings to flat substrates including substrate pre-treatment processes, coating processes and coating curing processes including skin-curing using hot-air knives. Also disclosed are coating compositions and formulations for highly tunable, durable, highly abrasion-resistant functionalized anti-reflective coatings.

A material system and method for bonding refractory powders in a three dimensional printer. A first particulate component including a refractory material is mixed with a first reactive component to form a particulate mixture. A flat layer of the particulate mixture is dispensed onto a build surface. A liquid binder, which may include a furan monomer and a surfactant, is dispensed by an ink-jet printhead onto the particulate mixture. The particulate mixture may contain a furan-soluble polymer that imposes a capillary attraction for the liquid binder, keeping it situated in the immediate vicinity of where the binder is dispensed. Additionally it provides a sufficient catalytic power to co-polymerize with the furan monomer and form a solid structure. This enables a 3D printer to build strong, accurate parts with high packing density, and to reuse the feed material many times in the printer.

A material system and method for bonding refractory powders in a three dimensional printer. A first particulate component including a refractory material is mixed with a first reactive component to form a particulate mixture. A flat layer of the particulate mixture is dispensed onto a build surface. A liquid binder, which may include a furan monomer and a surfactant, is dispensed by an ink-jet printhead onto the particulate mixture. The particulate mixture may contain a furan-soluble polymer that imposes a capillary attraction for the liquid binder, keeping it situated in the immediate vicinity of where the binder is dispensed. Additionally it provides a sufficient catalytic power to co-polymerize with the furan monomer and form a solid structure. This enables a 3D printer to build strong, accurate parts with high packing density, and to reuse the feed material many times in the printer.