The present disclosure provides processes for forming angular ceramic particles. In at least one embodiment, a process for forming angular ceramic particles includes providing a slurry having a ceramic raw material having alumina. The process includes atomizing the slurry into droplets and coating seeds comprising alumina with the droplets to form green pellets. The process includes sintering the green pellets to form sintered pellets. The process includes breaking the sintered pellets to form the angular ceramic particles comprising a sintered ceramic material. The angular ceramic particles can have an abrasion loss that is less than that of angular ceramic particles formed by crushing the green pellets prior to sintering.

A phosphor having different light emission characteristics from the conventional phosphor, having high emission intensity and chemical and thermal stability, combined with LED of less than 450 nm. This phosphor includes an inorganic compound comprising: a crystal represented by Ba.sub.1Si.sub.4Al.sub.3N.sub.9, an inorganic crystal having the same crystal structure as Ba.sub.1Si.sub.4Al.sub.3N.sub.9 crystal, or a solid solution crystal thereof, comprising A element, D element, E element, and X element (A is one or more elements selected from Li, Mg, Ca, Sr, Ba, and La; D is one or more elements selected from Si, Ge, Sn, Ti, Zr, and Hf; E is one or more elements selected from B, Al, Ga, In, Sc, and Y; X is one or more elements selected from O, N, and F), into which M element is solid-solved (M is one or more elements selected from Mn, Ce, Pr, Nd, Sm, Eu, Tb, Dy, and Yb).

The present disclosure relates to compositions comprising 2,3,3,3-tetrafluoropropene that may be useful as heat transfer compositions, aerosol propellants, foaming agents, blowing agents, solvents, cleaning agents, carrier fluids, displacement drying agents, buffing abrasion agents, polymerization media, expansion agents for polyolefins and polyurethane, gaseous dielectrics, extinguishing agents, and fire suppression agents in liquid or gaseous form. Additionally, the present disclosure relates to compositions comprising 1,1,2,3-tetrachloropropene, 2-chloro-3,3,3-trifluoropropene, or 2-chloro-1,1,1,2-tetrafluoropropane, which may be useful in processes to produce 2,3,3,3-tetrafluoropropene.

The present disclosure relates to compositions comprising 2,3,3,3-tetrafluoropropene that may be useful as heat transfer compositions, aerosol propellants, foaming agents, blowing agents, solvents, cleaning agents, carrier fluids, displacement drying agents, buffing abrasion agents, polymerization media, expansion agents for polyolefins and polyurethane, gaseous dielectrics, extinguishing agents, and fire suppression agents in liquid or gaseous form. Additionally, the present disclosure relates to compositions comprising 1,1,2,3-tetrachloropropene, 2-chloro-3,3,3-trifluoropropene, or 2-chloro-1,1,1,2-tetrafluoropropane, which may be useful in processes to produce 2,3,3,3-tetrafluoropropene.

Heat ray shielding particles are provided that are composite tungsten oxide particles having a hexagonal crystal structure represented by a general formula Li.sub.xM.sub.yWO.sub.z, wherein the element M in the general formula is one or more kinds of elements selected from alkaline earth metals and alkali metals other than lithium, 0.25≦x≦0.80, 0.10≦y≦0.50, and 2.20≦z≦3.00.

The invention provides a drag reducer having an excellent frictional drag-reducing effect on an aqueous medium and the like and also provides a fire-extinguishing agent including this drag reducer. The drag reducer according to the present invention includes a polyalkylene oxide aqueous dispersion that includes a polyalkylene oxide, aluminum oxide, an electrolyte, and water, and that has the polyalkylene oxide dispersed therein. The drag reducer has an excellent frictional drag-reducing effect on an aqueous medium and the like.

A novel compound excellent in heat resistance, resistance to volatilization, and compatibility with a resin component and useful as a UV absorber and a synthetic resin composition containing the compound are provided. Specifically provided are a triazine compound of general formula (1), preferably general formula (2) and a synthetic resin composition containing 0.001 to 20 parts by mass of the compound per 100 parts by mass of a synthetic resin. The details of formulae (1) and (2) are as defined in the description.

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An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition by which a pattern having excellent LWR performance can be formed. In addition, another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition.

The actinic ray-sensitive or radiation-sensitive resin composition according to an embodiment of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition including an acid-decomposable resin including a repeating unit having an acid-decomposable group in which an acid group having a pKa of 13 or less is protected by a leaving group that leaves by an action of an acid, and one or more compounds that generate an acid upon irradiation with actinic rays or radiation, which are selected from a compound (I) and a compound (II),

in which the content of the acid-decomposable resin is 10% by mass or more with respect to a total solid content of the composition,

the content of the compounds that generate an acid upon irradiation with actinic rays or radiation is 10% by mass or more with respect to the total solid content of the composition, and

the acid-decomposable resin has a halogen atom in a repeating unit other than the repeating unit having a group that generates an acid upon irradiation with actinic rays or radiation.

Amines and amine derivatives that improve the buffering range, and/or reduce the chelation and other negative interactions of the buffer and the system to be buffered. The reaction of amines or polyamines with various molecules to form polyamines with differing pKa's will extend the buffering range, derivatives that result in polyamines that have the same pKa yields a greater buffering capacity. Derivatives that result in zwitterionic buffers improve yield by allowing a greater range of stability.

Amines and amine derivatives that improve the buffering range, and/or reduce the chelation and other negative interactions of the buffer and the system to be buffered. The reaction of amines or polyamines with various molecules to form polyamines with differing pKa's will extend the buffering range, derivatives that result in polyamines that have the same pKa yields a greater buffering capacity. Derivatives that result in zwitterionic buffers improve yield by allowing a greater range of stability.