The invention relates to surfactants of general formula (I) or general formula (II) or a mixture thereof, in which R represents a linear or branched alkyl, alkenyl, alkylaryl or alkenylaryl group having 5-25 C atoms and X.sup.+ represents a charge-balancing cation. The surfactants can be incorporated into detergents or cleaning agents, have excellent technological application properties and can be produced based on renewable raw materials.

Dry mixtures and liquid formulations are provided that comprise metal oxide and/or metal hydroxide nanocrystalline particles. The dry mixtures are advantageously formulated with select surfactants to be readily solubilized and stable in liquid carriers. Additional select components are provided in preferred combinations that are capable of achieving improved biocidal and chemical agent efficacy. Notably, the inventive formulations provided herein allow for easier delivery of the formulations and increased shelf stability.

The present invention relates to a an aqueous composition for removing soils from a surface to be cleaned, formed from water, a detergent mixture and a rinse aid, wherein the detergent mixture comprises a peroxidation catalyst and wherein the rinse aid comprises an oxygen source. Such a composition may provide a more effective cleaning behaviour. The present invention further relates to a method for removing soil from a surface to be cleaned comprising applying to the surface to be cleaned a composition according to the invention.

The present invention relates to a an aqueous composition for removing soils from a surface to be cleaned, formed from water, a detergent mixture and a rinse aid, wherein the detergent mixture comprises a peroxidation catalyst and wherein the rinse aid comprises an oxygen source. Such a composition may provide a more effective cleaning behaviour. The present invention further relates to a method for removing soil from a surface to be cleaned comprising applying to the surface to be cleaned a composition according to the invention.

An azeotropic cleaning solvent composition has from about 96 to about 98 weight percent 1,1,1,3,3,3-hexafluoro-2-methoxypropane (“HFMOP”) and from about 2 to about 4 weight percent acetone, for example, about 97 weight percent HFMOP and about 3 weight percent acetone. Another composition of the invention has a weight ratio of HFMOP to acetone of about 24 to about 99, for example, about 24 to 49. Conventional additives such as surfactants, lubricants and co-solvents may be present in an amount not to exceed about 10 weight percent of the composition. A method of the invention comprises contacting an article of manufacture with the solvent composition in order to clean the article of manufacture and then removing the solvent composition from the article of manufacture.

The present disclosure relates to a polymerizable surfactant with reducibility and a preparation method thereof. The acid anhydride is reacted with a long-chain fatty alcohol to obtain an intermediate of an anhydride monoester, and then the obtained intermediate is reacted with the hydrochloride of dimethylaminohalogenated alkane, and a polymerizable surfactant with reducibility is obtained by post-processing. The polymerizable surfactant can not only play a role as a reactive emulsifier and copolymerize with monomers to obtain a soap-free emulsion, but also form a redox initiation system with peroxide, and conduct redox emulsion polymerization at room temperature. The soap-free emulsion synthesized by the polymerizable surfactant synthesized can greatly reduce the energy consumption in production, and can carry out one-step emulsion polymerization at normal temperature or low temperature to obtain an environment-friendly emulsion with a branched structure, thereby obtaining coatings with excellent water resistance, weather resistance, and impact resistance.

The rinsing composition according to embodiments of the present invention includes a non-ionic fluorinated surfactant and a basic additive containing tetraalkylammonium hydroxide in a specific range of content, so as to reduce the number of defects possibly occurring in a pattern after development of photoresist in a fine patterning process, while preventing pattern collapse.

Provided are formulations that offer a high cleaning effect on inorganic particles, organic residues, chemical residues, reaction products on the surface due to interaction of the wafer surface with the Chemical Mechanical Planarization (CMP) slurry and elevated levels of undesirable metals on the surface left on the semiconductor devices after the CMP. The post-CMP cleaning formulations comprise one or more organic acid, one or more polymer and a fluoride compound with pH<7 and optionally a surfactant with two sulfonic acid groups.

Surfactants based on a newly discovered class of compounds include a hydrophobic lipid oligomer covalently linked to a peptide or peptide-like chain and a carbohydrate moiety, and a serine-leucinol dipeptide linked to the lipid oligomer. Such surfactants can be used to create an oil-in-water or water-in-oil emulsion by mixing together a polar component; a non-polar component; and the surfactant. Biosurfactants of the newly discovered class can be made by isolating and culturing a microorganism which produces the biosurfactant, and then isolating the biosurfactant from the culture. A microorganism can be engineered to produce biosurfactant of this newly discovered class by expressing a set of heterologous genes involved in the biosynthesis of the biosurfactant in the microorganism.

Fabric treatment compositions that include benefit agent capsules and biphenyl brightener. Methods of using the same. Wash water that includes such compositions.