Patent classifications
C11D1/00
Enzyme-containing detergent composition
A method for enhancing the detergent properties of enzymes of an enzyme-containing detergent composition, comprising the step of adding to said composition an amphoteric polysaccharide.
Use of enzymes, composition and method for removing soil
The present invention concerns the use of enzymes for removing soil from a surface during the rising of the surface, wherein the rinsing is following a washing cycle. The invention further concerns a rinse aid composition for rinsing the surface and a method for removing soil from the surface during a rinsing step.
CLEANING AGENT AND PREPARATION METHOD AND USE THEREOF
Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-K dielectric materials, and has a good selectivity.
Tungsten post-CMP cleaning composition
A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.
Solution for removing various types of deposits
The invention relates to cleaning deposits of various natures from metal, glass and ceramic surfaces of industrial equipment and can be used for the removal of such deposits, as metal oxides (iron, chromium, nickel, etc.), carbonate and salt deposits, asphalt-tar-paraffin deposits and deposits of an oily nature, deposits of organic and biological nature (bacterial deposits). The proposed solution for removing deposits of different natures comprises hydrogen peroxide, complexing agent, calixarene and water in the following quantitative ratio, wt. %: hydrogen peroxide, 2-90; complexing agent, 3-30; calixarene, 0.01-10; water, the balance. EFFECT: increased degree of cleaning off deposits of various natures with simultaneous reduction of solution aggressiveness to structural materials.
Anionic surfactants and detergents comprising them
Surfactants of the general formula (I) in which R.sup.1 is a linear or branched akyl radical having 6 to 20, especially 10 to 16 C atoms, R.sup.2 and R.sup.3 independently of one another are H or H.sub.3CO, and M is hydrogen, an alkali metal or a moiety N.sup.+R.sup.4R.sup.5R.sup.6, in which R.sup.4, R.sup.5 and R.sup.6 independently of one another are hydrogen, an alkyl group having 1 to 6 C atoms or a hydroxyalkyl group having 2 to 6 C atoms, are readily incorporated into laundry detergents or cleaning products, possess outstanding performance qualities and can be prepared on the basis of renewable raw materials. ##STR00001##
Surfactant composition
The present invention provides a surfactant composition which includes a surfactant at a high concentration, while having fluidity over a wide concentration range. A surfactant composition according to the present invention contains the components A, B, C and D described below, and is configured such that: the total content of the components A, B and C is from 30% by mass to 80% by mass (inclusive); the mass ratio of the total content of the components A and B to the content of the component C, namely (A+B)/C is from 20/80 to 80/20; and the mass ratio of the content of the component A to the content of the component B, namely A/B is from 98/2 to 45/55. A: an internal olefin sulfonic acid and/or a salt thereof; B: an anionic surfactant other than the component A; C: a nonionic surfactant; D: water.
Liquid detergent composition
There is provided a liquid detergent composition comprising an internal olefin sulfonate salt at a high concentration and being excellent in stability at low temperatures without lowering the detergency. The liquid detergent composition comprises the following components (A) to (D), wherein a mass ratio of the component (A) to a total amount of the component (B) and the component (C), (A/(B+C)), is 0.6 or more and 5 or less; and a mass ratio of the component (B) to the component (C), (B/C), is 0.05 or more and 1.8 or less. (A): 10 to 40% by mass of an internal olefin sulfonate salt having 16 to 18 carbon atoms in which a content of an internal olefin sulfonate salt having a sulfonic group at the C-2 position is 5% by mass to 25% by mass; (B): 0.5 to 16% by mass of a fatty acid salt represented by the following formula (1): R.sup.1COOM (1) wherein R.sup.1 represents an alkyl group or alkenyl group having 10 or more and 14 or less carbon atoms; and M represents a hydrogen atom, an alkali metal, alkaline earth metal ( atom), ammonium or an organic ammonium; (C): an organic solvent having one or more hydroxyl groups; and (D) water.
Compositions and methods of removing lipstick using branched polyamines
Methods of cleaning waxy, oily and/or greasy soils, including lipsticks and lip gloss, are disclosed. Methods of removing lipstick and lip gloss stains in laundry applications are disclosed through application of alkaline cleaning compositions comprising branched polyamines.
Alkaline cleaning composition and methods for removing lipstick
Methods of cleaning waxy, oily and/or greasy soils, including lipsticks and lip gloss, are disclosed. Methods of removing lipstick and lip gloss stains in warewash and laundry applications are disclosed through application of cleaning compositions comprising long chain polyamines, namely C6-C20 polyamines having between 1 and 5 nitrogens. In some aspects alkaline cleaning compositions comprise sodium hydroxide detergents and a C6-C20 polyamines such as N1-(3-aminopropyl)-N3-dodecylpropane-1,3,diamine) and/or N1,N1,N3-tris(3-aminopropyl)-N3-dodecylpropane-1,3-diamine.