An integrated magnetic inductor is provided with an inductor coil, magnetic film, and a substrate. The magnetic film can be placed between the neighboring inductor coils, and the thickness of the magnetic film is greater than the coil thickness. In addition, the magnetic film includes exchange-coupled magnetic materials. The exchange-coupled magnetic materials provide improved permeability and f.sub.FMR at the frequency of interest for the integrated magnetic inductor.

Provided is a system and method for metering an amount of molten amorphous alloy into a mold cavity of an injection system. A melting chamber in the system is heated to or above a solidus temperature of the alloy to form a hot chamber. Both the chamber and mold are maintained in an inert atmosphere. The molten alloy is metered from the chamber using a valve system and injected into the mold cavity for molding into a part. A feed tube may extend from the hot chamber to the valve system. The valve system may use gravity or pressure from a pump to meter a volume of molten alloy. In another case, the valve system may include a plunger and a shot sleeve for injecting alloy into the mold. In one embodiment, the plunger itself meters a volume of the alloy. The shot sleeve and plunger may optionally be heated.

A wear resistant coating may comprise an amorphous metal comprising at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. An amorphous metal may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. A coating may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and silicon. In some examples, the amorphous metal is TaWSi. In one example, the refractory metals may comprise Niobium, Molybdenum, Tantalum, Tungsten, Rhenium, or combinations thereof.

A wear resistant coating may comprise an amorphous metal comprising at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. An amorphous metal may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and a metalloid. A coating may comprise at least one refractory metal, at least two elements selected from periods 4, 5, 6, 9, and 10, and silicon. In some examples, the amorphous metal is TaWSi. In one example, the refractory metals may comprise Niobium, Molybdenum, Tantalum, Tungsten, Rhenium, or combinations thereof.

The invention provides a method of producing an amorphous alloy ribbon, the method including a step of producing an amorphous alloy ribbon by discharging a molten alloy through a rectangular opening of a molten metal nozzle having a molten metal flow channel along which the molten alloy flows, the opening being an end of the molten metal flow channel, onto a surface of a rotating chill roll, in which, among wall surfaces of the molten metal flow channel, a maximum height Rz(t) of a surface t, which is a wall surface parallel to a flow direction of the molten alloy and to a short side direction of the opening, is 10.5 m or less.

The invention provides a method of producing an amorphous alloy ribbon, the method including a step of producing an amorphous alloy ribbon by discharging a molten alloy through a rectangular opening of a molten metal nozzle having a molten metal flow channel along which the molten alloy flows, the opening being an end of the molten metal flow channel, onto a surface of a rotating chill roll, in which, among wall surfaces of the molten metal flow channel, a maximum height Rz(t) of a surface t, which is a wall surface parallel to a flow direction of the molten alloy and to a short side direction of the opening, is 10.5 m or less.

An ultraflat and ultralow-friction metallic glass thin film is fabricated. The metallic glass thin film is a binary alloy, wherein a content of one metal element of the binary alloy is between 45 atomic % and 64 atomic %. The metallic glass thin film has an atomically smooth surface with a surface roughness R.sub.a less than 0.1 nm and a total height of profile R.sub.t less than 0.15 nm; the friction coefficient is below 110.sup.2. Due to the metallic glass thin film being treated by ion bombardment, the metallic glass thin film is thermally ultrastable.

A method of making a metallic alloy, more particularly, a high-entropy alloy with a composite structure that exhibits high strength and good ductility, and is used as a component material in electromagnetic, chemical, shipbuilding, machinery, and other applications, and in extreme environments, and the like.

A method of making a metallic alloy, more particularly, a high-entropy alloy with a composite structure that exhibits high strength and good ductility, and is used as a component material in electromagnetic, chemical, shipbuilding, machinery, and other applications, and in extreme environments, and the like.

A rapid discharge heating and forming apparatus is provided. The apparatus includes a source of electrical energy and at least two electrodes configured to interconnect the source of electrical energy to a metallic glass sample. The apparatus also includes a shaping tool disposed in forming relation to the metallic glass sample. The source of electrical energy and the at least two electrodes are configured to deliver a quantum of electrical energy to the metallic glass sample to heat the metallic glass sample. The shaping tool is configured to apply a deformational force to shape the heated sample to an article. The at least two electrodes have a yield strength of at least 200 MPa, a Young's modulus that is at least 25% higher than the metallic glass sample, and an electrical resistivity that is lower than the metallic glass sample by a factor of at least 3.