The present invention is a system and method for electroplating and etching, which provides a solution to the problem of smoothing rough exterior features of a 3D printed or otherwise roughly manufactured object with rough exterior features. The core components of the invention are an acid bath with a first electrode and a target object as a second electrode which are in the acid bath. The first electrode and the target object are connected to a power source that causes a current to run in a first direction to etch the target object and in a second direction to plate on the target object. The amount of different metals dissolved in the acid solution will affect the composition of plated material on the target object.

The present invention is a system and method for electroplating and etching, which provides a solution to the problem of smoothing rough exterior features of a 3D printed or otherwise roughly manufactured object with rough exterior features. The core components of the invention are an acid bath with a first electrode and a target object as a second electrode which are in the acid bath. The first electrode and the target object are connected to a power source that causes a current to run in a first direction to etch the target object and in a second direction to plate on the target object. The amount of different metals dissolved in the acid solution will affect the composition of plated material on the target object.

The present method for machining a part includes wire electro-discharge machining the part to create a recast layer, and then removing a zinc content of the recast layer without substantially altering the remainder of the initial composition make-up of the recast layer. The final composition make-up of the recast layer is substantially identical to the initial composition make-up except for the removed zinc content.

The present method for machining a part includes wire electro-discharge machining the part to create a recast layer, and then removing a zinc content of the recast layer without substantially altering the remainder of the initial composition make-up of the recast layer. The final composition make-up of the recast layer is substantially identical to the initial composition make-up except for the removed zinc content.

The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than −10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.

The object of the present invention is to provide a metal plate capable of manufacturing a deposition mask in which dispersion of positions of through-holes is restrained. A thermal recovery rate is defined as parts per million of a difference a distance between to measurement points on a sample before a heat treatment and a distance therebetween after the heat treatment, relative to the distance therebetween before the heat treatment. In this case, an average value of the thermal recovery rates of the respective samples is not less than −10 ppm and not more than +10 ppm, and (2) a dispersion of the thermal recovery rates of the respective samples is not more than 20 ppm.

Composites of porous nano-featured silicon and various materials, such as carbon, are provided. The composites find utility in various applications, such as electrical energy storage electrodes and devices comprising the same.

Composites of porous nano-featured silicon and various materials, such as carbon, are provided. The composites find utility in various applications, such as electrical energy storage electrodes and devices comprising the same.

A method of making an atomic layer nanoribbon that includes forming a double atomic layer ribbon having a first monolayer and a second monolayer on a surface of the first monolayer, wherein the first monolayer and the second monolayer each contains a transition metal dichalcogenide material, oxidizing at least a portion of the first monolayer to provide an oxidized portion, and removing the oxidized portion to provide an atomic layer nanoribbon of the transition metal dichalcogenide material. Also provided are double atomic layer ribbons, double atomic layer nanoribbons, and single atomic layer nanoribbons prepared according to the method.

A method of making an atomic layer nanoribbon that includes forming a double atomic layer ribbon having a first monolayer and a second monolayer on a surface of the first monolayer, wherein the first monolayer and the second monolayer each contains a transition metal dichalcogenide material, oxidizing at least a portion of the first monolayer to provide an oxidized portion, and removing the oxidized portion to provide an atomic layer nanoribbon of the transition metal dichalcogenide material. Also provided are double atomic layer ribbons, double atomic layer nanoribbons, and single atomic layer nanoribbons prepared according to the method.