A fixture for supporting articles in an industrial process comprises a plurality of first elongate members extending longitudinally in a first direction. The plurality of first elongate members each comprise a rod member having a riveted portion at an end thereof. The fixture further comprises a plurality of second elongate members extending longitudinally in a second direction that is substantially perpendicular to the first direction and a plurality of third elongate members extending longitudinally in a third direction that is substantially perpendicular to the first direction and the second direction. The rod member of one of the first elongate members extends through an aperture of one of the second elongate members and an aperture of one of the third elongate members and is movably coupled thereto by its riveted portion.

A fixture for supporting articles in an industrial process comprises a plurality of first elongate members extending longitudinally in a first direction. The plurality of first elongate members each comprise a rod member having a riveted portion at an end thereof. The fixture further comprises a plurality of second elongate members extending longitudinally in a second direction that is substantially perpendicular to the first direction and a plurality of third elongate members extending longitudinally in a third direction that is substantially perpendicular to the first direction and the second direction. The rod member of one of the first elongate members extends through an aperture of one of the second elongate members and an aperture of one of the third elongate members and is movably coupled thereto by its riveted portion.

A cleaning system and method uses a tank holding a fluid detergent and an equipment assembly formed from a plurality of discrete components joined together. One or more ultrasound transducers remove one or more deposits on the equipment assembly by generating and propagating high frequency ultrasound waves into the fluid detergent while the equipment assembly is in contact with the fluid detergent.

Provided in the present disclosure is a liquid metal substrate cleaning method and cleaning and coating integrated device, belonging to the technical field of thermal interface materials construction. The above-mentioned method includes a substrate cleaning and a cleaning qualification inspection, wherein the substrate cleaning comprises a plasma cleaning, an inorganic cleaning reagent cleaning, and an organic reagent cleaning, and any combination of the plasma cleaning, the inorganic cleaning reagent cleaning and the organic reagent cleaning; and the cleaning qualification inspection is judged as qualified or not based on a diffusion area of the organic reagent on a surface of the liquid metal substrate, and when the diffusion area meets a predetermined requirement, the cleaning is finished; and when the diffusion area does not meet the predetermined requirement, the substrate cleaning step is repeated, and the steps are repeated in this way until the diffusion area meets the predetermined requirement.

Provided in the present disclosure is a liquid metal substrate cleaning method and cleaning and coating integrated device, belonging to the technical field of thermal interface materials construction. The above-mentioned method includes a substrate cleaning and a cleaning qualification inspection, wherein the substrate cleaning comprises a plasma cleaning, an inorganic cleaning reagent cleaning, and an organic reagent cleaning, and any combination of the plasma cleaning, the inorganic cleaning reagent cleaning and the organic reagent cleaning; and the cleaning qualification inspection is judged as qualified or not based on a diffusion area of the organic reagent on a surface of the liquid metal substrate, and when the diffusion area meets a predetermined requirement, the cleaning is finished; and when the diffusion area does not meet the predetermined requirement, the substrate cleaning step is repeated, and the steps are repeated in this way until the diffusion area meets the predetermined requirement.

A system for performing electroless nickel plating on a portion of a metallic piece comprises a chamber fixedly coupled to the metallic piece during operation of the system so that the portion of the metallic piece and the chamber define a closed volume. The chamber has an inlet to supply at least a plating fluid into the volume and an outlet to discharge the plating fluid from the volume, so that the portion of the metallic piece is exposed to the plating fluid and is plated.

Provided is a surface treatment device capable of performing surface treatment on a treatment surface of a substrate at low cost by reusing a mist of a treatment liquid introduced into a treatment chamber. The surface treatment device is a device for surface treatment of a substrate by causing a treatment liquid to adhere to the treatment surface of the substrate. The surface treatment device includes a mist generator that generates a mist of the treatment liquid; a treatment chamber that introduces the mist generated by the mist generator and causes the introduced mist to adhere to the treatment surface of the substrate; and a circulation path that circulates the mist discharged from the treatment chamber to the treatment chamber together with the mist generated by the mist generator.

Provided is a surface treatment device capable of performing surface treatment on a treatment surface of a substrate at low cost by reusing a mist of a treatment liquid introduced into a treatment chamber. The surface treatment device is a device for surface treatment of a substrate by causing a treatment liquid to adhere to the treatment surface of the substrate. The surface treatment device includes a mist generator that generates a mist of the treatment liquid; a treatment chamber that introduces the mist generated by the mist generator and causes the introduced mist to adhere to the treatment surface of the substrate; and a circulation path that circulates the mist discharged from the treatment chamber to the treatment chamber together with the mist generated by the mist generator.

A treatment device for single-stage treatment of a metal object to be treated by at least the steps of pickling and phosphating. The treatment device comprises at least the following: a treatment container for receiving the object to be treated and for receiving a flowable treatment substance; and a pump device for exchanging at least a fraction of the treatment substance. The treatment substance is flowable around at least one part of the object to be treated. The treatment substance comprises a phosphor- or phosphate-containing solution, in particular phosphoric acid. The phosphor- or phosphate-containing solution consists partly of water and partly of a reaction substance, and the reaction substance consists of phosphor or a phosphate and an additional treatment effect-improving substance. The proportion of the phosphor or phosphate in the reaction substance is at least 95%, and the reaction substance does not have a salt acid or sulfuric acid content.

Disclosed is an automatic descaling system for high-pressure reactor of laterite nickel ore, which comprises a high-pressure reactor, multiple mixing devices, multiple detection devices, and a scale removal assembly; within the reactor, multiple partition plates are arranged sequentially along the material flow direction, dividing the internal cavity of the reactor into multiple compartments. Multiple mixing devices are correspondingly installed within the multiple compartments, and multiple detection devices are correspondingly installed in the multiple compartments as well. The scale removal assembly comprises an acid storage tank, multiple first connecting pipes, and multiple first control valves. Multiple first control valves are correspondingly installed on the multiple first connecting pipes. This disclosure finely adjusts the amount of acid injected based on the thickness of the scale, not only achieving a better descaling effect but also correspondingly reducing the usage of acid, thereby lowering the production costs for enterprises.