In a method for manufacturing a radiation window there is produced a layered structure where an etch stop layer exists between a carrier and a solid layer. A blank containing at least a part of each of the carrier, the etch stop layer, and the solid layer is attached to a radiation window frame. At least a part of what of the carrier was contained in the blank is removed, thus leaving a foil attached to the radiation window frame, wherein the foil contains at least a part of each of the etch stop layer and the solid layer.

Provided are methods for etching films comprising transition metals which help to minimize higher etch rates at the grain boundaries of polycrystalline materials. Certain methods pertain to amorphization of the polycrystalline material, other pertain to plasma treatments, and yet other pertain to the use of small doses of halide transfer agents in the etch process.

An implantable object (1000) and a method (100) of fabricating an implantable object is disclosed. The method (100) comprises melting a powder (210) comprising at least nickel and titanium with an energy source (220) and iteratively forming a plurality of stacked metallic layers (330) from the melted powder using an additive manufacturing technique. The implantable object is biased to expand from a first configuration (501) to a second configuration (502) when at or above a transformation temperature.

An implantable object (1000) and a method (100) of fabricating an implantable object is disclosed. The method (100) comprises melting a powder (210) comprising at least nickel and titanium with an energy source (220) and iteratively forming a plurality of stacked metallic layers (330) from the melted powder using an additive manufacturing technique. The implantable object is biased to expand from a first configuration (501) to a second configuration (502) when at or above a transformation temperature.