A method for electropolishing a manufactured metallic article, the method comprising: contacting the metallic article with an electropolishing electrolyte; and electropolishing the metallic article in the electropolishing electrolyte through the application of an applied current regime comprising: at least one electropolishing regime, each electropolishing regime comprising a current density of at least 2 A/cm.sup.2 and a voltage comprising a shaped waveform having a frequency from 2 Hz to 300 kHz, a minimum voltage of at least 0 V and a maximum voltage of between 0.5 to 500 V.

Methods and devices for treatment of metal surfaces by means of electrically active solid particles that include a step of contact of the solid particles with the electrode of an electric source, a step of shooting the particles towards the metal surface to be treated and a step of transmission of electric charge of the particles on the metal surface to be treated. The transmission of the electricity between the electric source and the metal surface during the step of shooting preferably is by net charge of the particles or by electric conductivity by contact or by electric conductivity by means of voltaic arches. The current applied to the electrode is preferably a DC or a current that contains positive sections and negative sections.

Superabrasive elements may be produced by method includes providing a superabrasive element including a polycrystalline diamond table that includes a metallic material disposed in interstitial spaces defined within the polycrystalline diamond table. The polycrystalline diamond table includes a superabrasive face and a superabrasive side surface extending around an outer periphery of the superabrasive face. The method also includes leaching the metallic material from at least a volume of the polycrystalline diamond table to produce a leached volume in the polycrystalline diamond table by (1) exposing at least a portion of the polycrystalline diamond table to a processing solution, (2) exposing an electrode to the processing solution, and (3) applying a charge to the electrode.

Superabrasive elements may be produced by method includes providing a superabrasive element including a polycrystalline diamond table that includes a metallic material disposed in interstitial spaces defined within the polycrystalline diamond table. The polycrystalline diamond table includes a superabrasive face and a superabrasive side surface extending around an outer periphery of the superabrasive face. The method also includes leaching the metallic material from at least a volume of the polycrystalline diamond table to produce a leached volume in the polycrystalline diamond table by (1) exposing at least a portion of the polycrystalline diamond table to a processing solution, (2) exposing an electrode to the processing solution, and (3) applying a charge to the electrode.

An additively manufactured intermediate part includes a body and at least one sacrificial electrode formed within or upon the body. The body includes a plurality of layers and at least one surface having a region to be smoothed in a near-finished state of the additively manufactured intermediate part. The at least one sacrificial electrode is adjacent to the body along the at least one surface, such that at least one of the plurality of layers is adjacent to the at least one sacrificial electrode in the region to be smoothed in the near-finished state of the additively manufactured intermediate part.

The embodiment relates to a hand-held cathode structure and an electrolytic polishing apparatus including the same. The hand-held cathode structure according to the embodiment has a cathode plate structure that is disposed adjacent to an electrolytic polishing target material for an electrolytic polishing, a cathode plate movable with respect to the electrolytic polishing target material, and an insulating fiber coating layer capable of absorbing the electrolyte disposed between the electrolytic polishing target material and the cathode plate.

The embodiment relates to a hand-held cathode structure and an electrolytic polishing apparatus including the same. The hand-held cathode structure according to the embodiment has a cathode plate structure that is disposed adjacent to an electrolytic polishing target material for an electrolytic polishing, a cathode plate movable with respect to the electrolytic polishing target material, and an insulating fiber coating layer capable of absorbing the electrolyte disposed between the electrolytic polishing target material and the cathode plate.

There is disclosed an electrode array device having an adsorbed porous reaction layer for improved synthesis quality. The array comprises a plurality of electrodes on a substrate, wherein the electrodes are electronically connected to a computer control system. The array has an adsorbed porous reaction layer on the plurality of electrodes, wherein the adsorbed porous reaction layer comprises a chemical species having at least one hydroxyl group. In the preferred embodiment, the reaction layer is sucrose. A method for preparing an electrode array for improved synthesis quality is disclosed. The method comprises a cleaning method and a method of attachment of a reaction layer. The cleaning method comprises a plasma cleaning method and a chemical cleaning method. The reaction layer is attached after cleaning by exposing the microarray to a solution containing the chemical species having at least one hydroxyl group.

There is disclosed an electrode array device having an adsorbed porous reaction layer for improved synthesis quality. The array comprises a plurality of electrodes on a substrate, wherein the electrodes are electronically connected to a computer control system. The array has an adsorbed porous reaction layer on the plurality of electrodes, wherein the adsorbed porous reaction layer comprises a chemical species having at least one hydroxyl group. In the preferred embodiment, the reaction layer is sucrose. A method for preparing an electrode array for improved synthesis quality is disclosed. The method comprises a cleaning method and a method of attachment of a reaction layer. The cleaning method comprises a plasma cleaning method and a chemical cleaning method. The reaction layer is attached after cleaning by exposing the microarray to a solution containing the chemical species having at least one hydroxyl group.

Disclosed herein is an electrolytic brush assembly comprising a handle assembly; a shroud extending from the handle assembly, the shroud having an aperture at a distal end thereof; a brush connecting assembly for releasably connecting a brush to the handle assembly whereby the brush extends through the aperture of the shroud and a fluid delivery assembly. The handle assembly comprises an adjustment sub-assembly for selectively moving the brush connecting assembly and a brush connected thereto relative to the handle assembly and the aperture of the shroud. The fluid delivery assembly delivers electrolytic fluid to the proximity of the brush, optionally under closed loop control.