C30B11/00

Polar nanoregions engineered relaxor-PbTiO.SUB.3 .ferroelectric crystals

A relaxor-PT based piezoelectric crystal is disclosed, comprising the general formula of (Pb.sub.1-1.5xM.sub.x){[(M.sub.I,M.sub.II).sub.1-z(M.sub.I′,M.sub.II′).sub.z].sub.1-yTi.sub.y}O.sub.3, wherein: M is a rare earth cation; M.sub.I is selected from the group consisting of Mg.sup.2+, Zn.sup.2+, Yb.sup.3+, Sc.sup.3+, and In.sup.3+; M.sub.II is Nb.sup.5+; M.sub.I′ is selected from the group consisting of Mg.sup.2+, Zn.sup.2+, Yb.sup.3+, Sc.sup.3+, In.sup.3+, and Zr.sup.4; M.sub.II′ is Nb.sup.5+ or Zr.sup.4+; 0<x≤0.05; 0.02<y<0.7; and 0≤z≤1, provided that if either M.sub.I′ or M.sub.II′ is Zr.sup.4+, both M.sub.I′ and M.sub.II′ are Zr.sup.4+. A method for forming the relaxor-PT based piezoelectric crystal is disclosed, comprising pre-synthesizing precursor materials by calcining mixed oxides, mixing the precursor materials with single oxides and calcining to form a feeding material, and growing the relaxor-PT based piezoelectric crystal having the general formula of (Pb.sub.1-1.5xM.sub.x){[(M.sub.I,M.sub.II).sub.1-z(M.sub.I′,M.sub.II′).sub.z].sub.1-yTi.sub.y}O.sub.3 from the feeding material by a Bridgman method.

Low etch pit density, low slip line density, and low strain indium phosphide

Methods and wafers for low etch pit density, low slip line density, and low strain indium phosphide are disclosed and may include an indium phosphide single crystal wafer having a diameter of 4 inches or greater, having a measured etch pit density of less than 500 cm.sup.−2, and having fewer than 5 dislocations or slip lines as measured by x-ray diffraction imaging. The wafer may have a measured etch pit density of 200 cm.sup.−2 or less, or 100 cm.sup.−2 or less, or 10 cm.sup.−2 or less. The wafer may have a diameter of 6 inches or greater. An area of the wafer with a measured etch pit density of zero may at least 80% of the total area of the surface. An area of the wafer with a measured etch pit density of zero may be at least 90% of the total area of the surface.

SINGLE CRYSTAL GROWTH APPARATUS

A single crystal growth apparatus to grow a single crystal of a gallium oxide-based semiconductor. The apparatus includes a crucible that includes a seed crystal section to accommodate a seed crystal, and a growing crystal section which is located on the upper side of the seed crystal section and in which the single crystal is grown by crystallizing a raw material melt accommodated therein, a tubular susceptor surrounding the seed crystal section and also supporting the crucible from below, and a molybdenum disilicide heating element to melt a raw material in the growing crystal section to obtain the raw material melt. The susceptor includes a thick portion at a portion in a height direction that is thicker and has a shorter horizontal distance from the seed crystal section than other portions. The thick portion surrounds at least a portion of the seed crystal section in the height direction.

Self-assembled directionally solidified eutectics for thermal neutron detection

Eutectic lithium chloride-cerium chloride (LiCl—CeCl.sub.3) compositions are described. An exemplary eutectic composition has about 75 mole % LiCl and about 25 mole % CeCl.sub.3. The eutectic compositions can have optical and/or scintillation properties. Also described are methods of preparing the eutectic compositions as well as methods of using radiation detectors including the eutectic compositions in the detection of radiation, including thermal neutrons.

Technique for controlling temperature uniformity in crystal growth apparatus

A method of producing a crystalline material is provided that may include providing a crystal growth apparatus comprising a chamber, a hot zone, and a muffle. The hot zone may be disposed within the chamber and include at least one heating system, at least one heat removal system, and a crucible containing feedstock. Additionally, the method may include providing a muffle that surrounds at least two sides of the crucible to ensure uniform temperature distribution through the feedstock during crystal growth to allow the crystalline material to be grown with a square or rectangular shaped cross section.

APPARATUS, METHOD, AND PROCESS FOR DIRECTIONAL SOLIDIFICATION BY LIQUID METAL SPRAYING ENHANCED COOLING (LMSC)

The present disclosure relates to the field of directional solidification, and in particular, to an apparatus, method, and process for directional solidification by liquid metal spraying enhanced cooling (LMSC). The process has the following beneficial effects: the apparatus of the present disclosure can regulate a solidification structure of a casting, refine a dendrite spacing, and reduce or avoid metallurgical defects, and can be used to prepare high-quality large-sized columnar/single crystal blades or other castings.

MAGNETOSTRICTIVE MEMBER AND METHOD FOR MANUFACTURING MAGNETOSTRICTIVE MEMBER

A magnetostrictive member is formed of a crystal of an iron-based alloy having magnetostrictive characteristics and is a plate-like body having a long-side direction and a short-side direction. At least one of a front face and a back face of the plate-like body has a plurality of grooves extending in the long-side direction.

Gallium arsenide single crystal and preparation method thereof

The present application discloses a gallium arsenide single crystal and preparation method thereof. The gallium arsenide single crystal has a carrier concentration of 1×10.sup.18-4×10.sup.18/cm.sup.3, and a migration rate of 1700-2600 cm.sup.2/v.Math.s; at a same carrier concentration, B atom density in the gallium arsenide single crystal obtained using Si.sub.xAs.sub.y compound as a dopant is at least 20% lower than that obtained using Si substance as a dopant; B content in the gallium arsenide single crystal is 5×10.sup.18/cm.sup.3 or lower. The preparation method for the gallium arsenide single crystal is that, before growth of the gallium arsenide single crystal, the Si.sub.xAs.sub.y compound is distributed into a gallium arsenide polycrystal.

Mn—Zn ferrite particles, resin molded body, soft magnetic mixed powder, and magnetic core

Mn—Zn ferrite particles according to the present invention contain 44-60% by mass of Fe, 10-16% by mass of Mn and 1-11% by mass of Zn. The ferrite particles are single crystal bodies having an average particle diameter of 1-2,000 nm, and have polyhedral particle shapes, while having an average sphericity of 0.85 or more but less than 0.95.

OXYGEN- AND FLUORINE-DOPED CESIUM AND RUBIDIUM LEAD PEROVSKITE COMPOUNDS FOR HARD RADIATION DETECTION
20230203372 · 2023-06-29 ·

Inorganic perovskites doped with oxygen atoms or fluorine atoms, methods for making the doped perovskites, and hard radiation detectors incorporating the doped perovskites as photoactive layers are provided. The doped perovskites utilize lead oxide, lead fluoride, or compounds that thermally decompose into lead oxide or lead fluoride as dopant atom sources. During the crystallization of a perovskite in the presence of the dopant atom sources, oxygen or fluoride atoms from the dopant source are incorporated into the perovskite crystal lattice.